MOLD FOR MANUFACTURING DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME
A method of manufacturing a display device which reduces errors in patterning an organic layer due to bubbles, comprises: providing a mother insulating substrate which comprises usage regions arranged in a matrix shape and a removal region formed between the usage regions; forming an organic layer on the mother insulating substrate; arranging a mold formed with a pattern part corresponding to the usage regions and a groove corresponding to at least a part of the removal region and formed in a grid shape, on the organic layer; moving a pressure means and sequentially pressing the mold to the organic layer; and separating the mold from the organic layer.
1 . A method of manufacturing a display device, comprising:
providing a mother insulating substrate which comprises usage regions arranged in a matrix shape, and a removal region formed between the usage regions;
forming an organic layer on the mother insulating substrate;
arranging a mold formed with a pattern part corresponding to the usage regions and a groove corresponding to at least a part of the removal region and formed in a grid shape, on the organic layer;
moving a pressure means and sequentially pressing the mold to the organic layer; and
separating the mold from the organic layer.
2 . The method according to claim 1 , wherein a moving direction of the pressure means maintains a predetermined angle with respect to an extension direction of the groove.
3 . The method according to claim 2 , wherein the moving direction of the pressure means is perpendicular to the extension direction of the groove.
4 . The method according to claim 3 , wherein the pressure means comprises a roller.
5 . The method according to claim 1 , wherein the organic layer comprises a photosensitive material.
6 . The method according to claim 5 , wherein the mold comprises a mold main body which comprises light transmissive polymer and a light blocking layer which is formed on the mold main body to correspond to the removal region.
7 . The method according to claim 6 , wherein the light blocking layer is provided within the groove.
8 . The method according to claim 6 , wherein the mold main body comprises polydimethylsiloxane (PDMS) or polycarbonate (PC).
9 . The method according to claim 6 , further comprising: exposing the organic layer to light by using the mold pressed to the organic layer, as a mask.
10 . The method according to claim 1 , wherein a depth of the groove is 100 percent to 500 percent of a thickness of the organic layer.
11 . The method according to claim 1 , wherein the mold is pressed to the organic layer at a normal pressure.
12 . The method according to claim 1 , further comprising:
forming a thin film transistor having a drain electrode, on the mother insulating substrate, wherein the organic layer is formed on the thin film transistor.
13 . The method according to claim 12 , wherein the pattern part is formed with a concave embossing pattern and a protruding part corresponding to the drain electrode.
14 . The method according to claim 13 , wherein an end part of the protruding part contacts the drain electrode while the mold is pressed to the organic layer.
15 . A mold for manufacturing a display device which comprises a mold main body, comprising: a pattern part being formed on a surface of the mold main body in a matrix shape and a groove being formed between the pattern parts wherein the groove is formed in a grid shape.
16 . The mold according to claim 15 , further comprising: a light blocking layer which is formed in the groove.
17 . The mold according to claim 15 , wherein the mold main body comprises polymer.
18 . The mold according to claim 15 , wherein the mold main body is light-transmissive.