Optical multilayer filter, method for manufacturing the same, and electronic apparatus
View Patent ↗An optical multilayer filter comprises a substrate, and an inorganic thin film that is composed of a plurality of layers and formed on the substrate. An uppermost surface layer of the inorganic thin film is a silicon oxide layer having a density of from 1.9 g/cm 3 to 2.2 g/cm 3 .
1. An optical multilayer filter, comprising:
a substrate; and
an inorganic thin film that is composed of a plurality of layers and formed on the substrate, an uppermost surface layer of the inorganic thin film being a silicon oxide layer having a density from 1.9 g/cm 3 to 2.04 g/cm 3 and others of the plurality of layers being silicon oxide layers having a density of 2.21 g/cm 3 or more.
2. The optical multilayer filter according to claim 1 , wherein a layer adjacent to the silicon oxide layer serving as the uppermost surface layer is a transparent conductive film.
3. The optical multilayer filter according to claim 1 , wherein the inorganic thin film is one of an ultraviolet infrared cut film and an infrared cut film.
4. The optical multilayer filter according to claim 1 , wherein the substrate is one of a glass substrate and a quartz substrate.
5. An electronic apparatus, comprising the optical multilayer filter according to claim 1 .
6. The electronic apparatus according to claim 5 , the uppermost surface layer of the inorganic thin film is grounded.
7. A method for manufacturing the optical multilayer filter according to claim 1 , comprising:
forming the inorganic thin film composed of the plurality of layers on the substrate, wherein a pressure in forming an uppermost surface layer of the inorganic thin film by vacuum deposition is from 5×10 −4 Pa to 5×10 −2 Pa.