Method for manufacturing semiconductor device
View Patent ↗To provide a method for manufacturing a semiconductor device using a method in which a desired position is rapidly subjected to laser irradiation while switching laser irradiation patterns. With respect to an organic memory element having a structure in which an organic compound layer is interposed between a pair of conductive layers, data is written to the organic memory element by laser irradiation using a laser irradiation apparatus. Further, a laser beam emitted from a laser oscillator is split by a diffractive optical element into a plurality of laser beams, thereby irradiating a plurality of portions on the organic compound layer with laser beams by single irradiation.
1. A method for manufacturing a semiconductor device comprising:
forming a first conductive layer over a substrate;
forming an organic compound layer over the first conductive layer;
forming a second conductive layer over the organic compound layer;
emitting a laser beam from a laser oscillator;
splitting the laser beam into a plurality of diffracted laser beams having substantially a same energy by making the laser beam go through a diffractive optical element made of a phase grating; and
irradiating discretely the organic compound layer with the plurality of diffracted laser beams from according to an arbitrary pattern;
wherein a plurality of regions of the organic compound layer are selectively irradiated with the plurality of diffracted laser beams according to the arbitrary pattern, thereby electrical resistance between the first conductive layer and the second conductive layer is partially changed so as to write data corresponding to the regions in a memory circuit comprising the organic compound layer.
2. A method for manufacturing a semiconductor device according to claim 1 ,
wherein the organic compound layer is formed by spin coating, screen printing, or a droplet discharge method.
3. A method for manufacturing a semiconductor device according to claim 1 ,
wherein the diffractive optical element is a transmissive diffractive optical element or a reflective diffractive optical element.
4. A method for manufacturing a semiconductor device comprising:
forming a first conductive layer over a substrate provided with a transistor, wherein the first conductive layer is connected to the transistor;
forming an organic compound layer over the first conductive layer;
forming a second conductive layer over the organic compound layer;
emitting a laser beam from a laser oscillator;
splitting the laser beam into a plurality of diffracted laser beams having substantially a same energy by making the laser beam go through a diffractive optical element made of a phase grating; and
irradiating discretely the organic compound layer with the plurality of diffracted laser beams according to an arbitrary pattern;
wherein a plurality of regions of the organic compound layer are selectively irradiated with the plurality of diffracted laser beams according to the arbitrary pattern, thereby electrical resistance between the first conductive layer and the second conductive layer is partially changed so as to write data corresponding to the regions in a memory circuit comprising the organic compound layer.
5. A method for manufacturing a semiconductor device according to claim 4 ,
wherein the organic compound layer is formed by spin coating, screen printing, or a droplet discharge method.
6. A method for manufacturing a semiconductor device according to claim 4 ,
wherein the diffractive optical element is a transmissive diffractive optical element or a reflective diffractive optical element.
7. A method for manufacturing a semiconductor device comprising:
forming a first conductive layer over a substrate;
forming an organic compound layer over the first conductive layer; forming a second conductive layer over the organic compound layer;
introducing a laser beam emitted from a laser oscillator into a deflector;
splitting the laser beam into a plurality of diffracted laser beams having substantially a same energy by making the laser beam coming out of the deflector go through a diffractive optical element made of a phase grating; and
irradiating discretely the organic compound layer with the plurality of diffracted laser beams according to an arbitrary pattern;
wherein a plurality of regions of the organic compound layer are selectively irradiated with the plurality of diffracted laser beams according to the arbitrary pattern, thereby electrical resistance between the first conductive layer and the second conductive layer is partially changed so as to write data corresponding to the regions in a memory circuit comprising the organic compound layer.
8. A method for manufacturing a semiconductor device according to claim 7 ,
wherein the organic compound layer is formed by spin coating, screen printing, or a droplet discharge method.
9. A method for manufacturing a semiconductor device according to claim 7 ,
wherein the diffractive optical element is a transmissive diffractive optical element or a reflective diffractive optical element.
10. A method for manufacturing a semiconductor device comprising: forming a first conductive layer over a substrate provided with a transistor, wherein the first conductive layer is connected to the transistor; forming an organic compound layer over the first conductive layer; forming a second conductive layer over the organic compound layer; introducing a laser beam emitted from a laser oscillator into a deflector; splitting the laser beam into a plurality of diffracted laser beams having substantially a same energy by making the laser beam coming out of the deflector go through a diffractive optical element made of a phase grating; and
irradiating discretely the organic compound layer with the plurality of diffracted laser beams according to an arbitrary pattern;
wherein a plurality of regions of the organic compound layer are selectively irradiated with the plurality of diffracted laser beams according to the arbitrary pattern, thereby electrical resistance between the first conductive layer and the second conductive layer is partially changed so as to write data corresponding to the regions in a memory circuit comprising the organic compound layer.
11. A method for manufacturing a semiconductor device according to claim 10 ,
wherein the organic compound layer is formed by spin coating, screen printing, or a droplet discharge method.
12. A method for manufacturing a semiconductor device according to claim 10 ,
wherein the diffractive optical element is a transmissive diffractive optical element or a reflective diffractive optical element.
13. A method for manufacturing a semiconductor device comprising:
forming a first conductive layer over a substrate;
forming an organic compound layer over the first conductive layer;
forming a second conductive layer over the organic compound layer;
emitting a laser beam from a laser oscillator;
splitting the laser beam into a plurality of diffracted laser beams having substantially a same energy by making the laser beam go through a diffractive optical element made of a phase grating;
introducing the plurality of diffracted laser beams transmitted through the diffractive optical element into a digital micromirror device having a plurality of micromirrors;
introducing the plurality of diffracted laser beams reflected by the plurality of micromirrors into a projection lens, and irradiating discretely the organic compound layer with the plurality of diffracted laser beams according to an arbitrary pattern;
wherein a plurality of regions of the organic compound layer are selectively irradiated with the plurality of diffracted laser beams according to the arbitrary pattern, thereby electrical resistance between the first conductive layer and the second conductive layer is partially changed so as to write data corresponding to the regions in a memory circuit comprising the organic compound layer.
14. A method for manufacturing a semiconductor device according to claim 13 ,
wherein the organic compound layer is formed by spin coating, screen printing, or a droplet discharge method.
15. A method for manufacturing a semiconductor device according to claim 13 ,
wherein the diffractive optical element is a transmissive diffractive optical element or a reflective diffractive optical element.
16. A method for manufacturing a semiconductor device comprising the steps of:
forming a first conductive layer over a substrate provided with a transistor, wherein the first conductive layer is connected to the transistor;
forming an organic compound layer over the first conductive layer;
forming a second conductive layer over the organic compound layer;
emitting a laser beam from a laser oscillator;
splitting the laser beam into a plurality of diffracted laser beams having substantially a same energy by making the laser beam go through a diffractive optical element made of a phase grating;
introducing the plurality of diffracted laser beams transmitted through the diffractive optical element into a digital micromirror device having a plurality of micromirrors;
introducing the plurality of diffracted laser beams reflected by the plurality of micromirrors into a projection lens, and irradiating discretely the organic compound layer with the plurality of diffracted laser beams according to an arbitrary pattern;
wherein a plurality of regions of the organic compound layer are selectively irradiated with the plurality of diffracted laser beams according to the arbitrary pattern, thereby electrical resistance between the first conductive layer and the second conductive layer is partially changed so as to write data corresponding to the regions in a memory circuit comprising the organic compound layer.
17. A method for manufacturing a semiconductor device according to claim 16 ,
wherein the organic compound layer is formed by spin coating, screen printing, or a droplet discharge method.
18. A method for manufacturing a semiconductor device according to claim 16 ,
wherein the diffractive optical element is a transmissive diffractive optical element or a reflective diffractive optical element.