Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof
View Patent ↗A semiconductor device includes an oxide semiconductor thin film layer primarily including zinc oxide having at least one orientation other than (002) orientation. The zinc oxide may have a mixed orientation including (002) orientation and (101) orientation. Alternatively, the zinc oxide may have a mixed orientation including (100) orientation and (101) orientation.
1. A manufacturing method of a semiconductor device comprising:
forming an oxide semiconductor thin film layer primarily comprising zinc oxide on a substrate by sputtering by using an oxide target primarily comprising zinc oxide;
wherein forming the oxide semiconductor thin film layer comprises applying a first radio frequency electric power to the oxide target and applying a second radio frequency electric power, which is different from the first radio frequency electric power, to the substrate in order to control an orientation of zinc oxide that is a constituent of the oxide semiconductor thin film layer to have at least one orientation other than (002) orientation.
2. The manufacturing method of a semiconductor device of claim 1 , wherein applying the second radio frequency electric power to the substrate is performed via a substrate stage on which the substrate is mounted.
3. The manufacturing method of a semiconductor device of claim 1 , wherein a frequency of the first radio frequency electric power is equal to a frequency of the second radio frequency electric power.
4. The manufacturing method of a semiconductor device of claim 1 , wherein the sputtering is magnetron sputtering.
5. A manufacturing method of a semiconductor device comprising:
preparing a target used in forming an oxide semiconductor of the semiconductor device;
preparing a substrate; and
forming the oxide semiconductor on the substrate by sputtering using the target;
wherein forming the oxide semiconductor on the substrate comprises applying a first radio frequency electric power to the target and applying a second radio frequency electric power, which is in a range of 0.5% to 45% of the first radio frequency electric power, to the substrate.
6. The manufacturing method of a semiconductor device of claim 5 , wherein the target contains zinc oxide, and the second radio frequency electric power is applied such that zinc oxide contained in the oxide semiconductor formed on the substrate has at least one orientation other than (002) orientation.
7. The manufacturing method of a semiconductor device of claim 6 , wherein the second radio frequency electric power is applied such that the zinc oxide contained in the oxide semiconductor formed on the substrate has a mixed orientation including (002) orientation and (101) orientation.
8. The manufacturing method of a semiconductor device of claim 6 , wherein the second radio frequency electric power is applied such that the zinc oxide contained in the oxide semiconductor formed on the substrate has a mixed orientation including (100) orientation and (101) orientation.
9. The manufacturing method of a semiconductor device of claim 5 , wherein a frequency of the first radio frequency electric power is equal to a frequency of the second radio frequency electric power.
10. The manufacturing method of a semiconductor device of claim 5 , wherein the sputtering is magnetron sputtering.
11. A manufacturing method of a semiconductor device comprising:
preparing a target containing zinc oxide used in forming an oxide semiconductor of the semiconductor device;
preparing a substrate; and
forming the oxide semiconductor on the substrate by sputtering using the target;
wherein forming the oxide semiconductor on the substrate comprises applying a first radio frequency electric power to the target and applying a second radio frequency electric power, which is smaller than the first radio frequency electric power, to the substrate; and
wherein the second radio frequency electric power is applied such that zinc oxide contained in the oxide semiconductor formed on the substrate has a mixed orientation including (002) orientation and (001) orientation, and a ratio I(002)/I(101) between X-ray diffraction intensity I(002) indicating the (002) orientation of the zinc oxide contained in the oxide semiconductor formed on the substrate and X-ray diffraction intensity I(101) indicating the (101) orientation of the zinc oxide contained in the oxide semiconductor formed on the substrate is not more than 2.
12. A manufacturing method of a semiconductor device comprising:
preparing a target containing zinc oxide used in forming an oxide semiconductor of the semiconductor device;
preparing a substrate; and
forming the oxide semiconductor on the substrate by sputtering using the target;
wherein forming the oxide semiconductor on the substrate comprises applying a first radio frequency electric power to the target and applying a second radio frequency electric power, which is smaller than the first radio frequency electric power, to the substrate; and
wherein the second radio frequency electric power is applied such that zinc oxide contained in the oxide semiconductor formed on the substrate has a mixed orientation including (100) orientation and (101) orientation, and a ratio I(101)/I(100) between X-ray diffraction intensity I(101) indicating the (101) orientation of the zinc oxide contained in the oxide semiconductor formed on the substrate and X-ray diffraction intensity I(100) indicating the (100) orientation of the zinc oxide contained in the oxide semiconductor formed on the substrate is in a range of 0.5 to 5.