Method of producing energy efficient printhead in-situ
View Patent ↗A method of producing a pagewidth inkjet printhead is disclosed. The method comprises forming a substrate having defined therein a nozzle chamber operable to receive and store a fluid, the chamber fed at one side by an inlet passage; forming a nozzle plate in-situ on the substrate to define a nozzle opening on an opposite side of the nozzle chamber to the inlet passage; and forming a heater element between the nozzle opening and the inlet passage, the heater element arranged to be suspended within the nozzle chamber and to be in direct contact with the fluid in the nozzle chamber at both major faces thereof the heater element being a cantilever supported at one end by the nozzle chamber. The heater element is formed to require between substantially 120 nanojoules and substantially 400 nanojoules of heating energy to form said gas bubbles. The nozzle plate is formed in-situ on the substrate with a thickness of substantially between 2 to 2.5 microns.
1. A method of producing a pagewidth inkjet printhead, the method comprising:
forming a substrate having defined therein a nozzle chamber operable to receive and store a fluid, the chamber fed at one side by an inlet passage;
forming a nozzle plate in-situ on the substrate to define a nozzle opening on an opposite side of the nozzle chamber to the inlet passage; and
forming a heater element between the nozzle opening and the inlet passage, the heater element arranged to be suspended within the nozzle chamber and to be in direct contact with the fluid in the nozzle chamber at both major faces thereof, the heater element being a cantilever supported at one end by the nozzle chamber,
wherein the heater element is formed to require between substantially 120 nanojoules and substantially 400 nanojoules of heating energy to form said gas bubbles,
the inlet passage, nozzle opening, and heater element are formed such that heat generated by the heater element is substantially dissipated by a flow of ink in through the inlet passage and out through the nozzle opening, and
the nozzle plate is formed in-situ on the substrate with a thickness of substantially between 2 to 2.5 microns.
2. The method of claim 1 wherein the nozzle plate is configured to support the bubble forming liquid adjacent each nozzle opening.
3. The method of claim 1 wherein the nozzle plate is formed by chemical vapor deposition.
4. The method of claim 3 wherein the chemical vapor deposition is of silicon nitride.
5. The method of claim 3 wherein the chemical vapor deposition is of silicon dioxide.
6. The method of claim 3 wherein the chemical vapor deposition is of oxi-nitride.
7. The method of claim 1 , wherein the substrate comprises a plurality of nozzle chambers each corresponding to a respective nozzle opening, and the method further comprises the steps of disposing a plurality of said heater elements within each chamber on different respective layers.
8. The method of claim 1 wherein each heater element is formed of solid material more than 90% of which, by atomic proportion, is constituted by at least one periodic element having an atomic number below 50.
9. The method of claim 1 , further comprising the step of substantially covering the heater element with a conformal protective coating, the coating of each heater element having been applied substantially to all sides of the heater element simultaneously such that the coating is seamless.