Metal based coating composition and related coated substrates
View Patent ↗A coated substrate is disclosed. The coated substrate includes a substrate and a coating composition over the substrate comprising at least one metal based layer selected from tungsten, chromium, tantalum, molybdenum, aluminum, niobium, and mixtures and alloys thereof; and mixtures and alloys of cobalt and chromium; and at least one dielectric layer including Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer. The ΔE cmc (1.5:1) (T), ΔE cmc (1.5:1) (R1) and ΔE cmc (1.5:1) (R2) of a non-heat treated, coated substrate as compared to a heat treated, coated substrate according to the present invention are no greater than 8 units.
1. A coated substrate, comprising:
a. a glass substrate; and
b. a coating composition over the glass substrate, comprising:
i. at least one metal based layer selected from the group consisting of tungsten, chromium, tantalum, molybdenum, aluminum, an alloy of cobalt and chromium, and mixtures thereof, wherein the at least one metal based layer has a thickness of 3-20 nm ; and
ii. at least one dielectric layer comprising Si x N y , where x/y ranges from 0.75 to 1.5, over the metal based layer,
wherein the dielectric layer is a multiple film configuration comprising (i) a first dielectric film comprising Si x N y having an index of refraction; (ii) a second dielectric film comprising silicon dioxide over the first dielectric film having an index of refraction lower than the index of refraction of the first dielectric film; and (iii) a third dielectric film comprising Si x N y over the second film.
2. The coated substrate according to claim 1 , further comprising a protective overcoat as the last layer of the coating stack, the protective overcoat selected from the group consisting of silicon dioxide, zirconium dioxide, titanium dioxide, niobium dioxide, chromium dioxide and silicon oxynitride as well as mixtures thereof.
3. The coated substrate according to claim 1 , wherein a non-heat treated, coated substrate as compared to a heat treated, coated substrate has a ΔE cmc (1.5:1) (T), a ΔE cmc (1.5:1) (R1) and a ΔE cmc (1.5:1) (R2) no greater than 8 units.
4. A coated substrate comprising:
a. a glass substrate;
b. a first dielectric layer over the substrate, wherein the first dielectric layer is a multiple film configuration comprising (i) a first dielectric film comprising Si x N y having an index of refraction; (ii) a second dielectric film comprising silicon dioxide over the first dielectric film having an index of refraction lower than the index of refraction of the first dielectric film; and (iii) a third dielectric film comprising Si x N y over the second film;
c. a metal based layer selected from the group consisting of tungsten, chromium, tantalum, molybdenum, aluminum, an alloy of cobalt and chromium, and mixtures thereof over the first dielectric layer and in contact with the third dielectric film of the first dielectric layer, wherein the at least one metal based layer has a thickness of 3-20 nm; and
d. a second dielectric layer comprising a second Si x N y layer, where x/y ranges from 0.75 to 1.5, over the metal based layer.
5. The coated substrate according to claim 4 , wherein the second dielectric layer is a multiple film configuration further comprising a first dielectric film over the second Si x N y having an index of refraction lower than an index of refraction of the first and/or second Si x N y layer; and a second dielectric film comprising a third Si x N y layer over the first dielectric film.
6. The coated substrate according to claim 4 , wherein the metal based layer comprises an alloy of cobalt and chromium.
7. The coated substrate according to claim 4 , wherein the first and/or second Si x N y layer is Si 3 N 4 .
8. The coated substrate according to claim 4 , wherein a non-heat treated, coated substrate as compared to a heat treated, coated substrate has a ΔE cmc (1.5:1) (T), a ΔE cmc (1.5:1) (R1) and a ΔE cmc (1.5:1) (R2) no greater than or equal to 8 units.
9. A coated substrate comprising:
a. a first dielectric layer over a substrate, wherein the first dielectric layer is a multiple film configuration comprising (i) a first dielectric film comprising Si x N y having an index of refraction; (ii) a second dielectric film comprising silicon dioxide over the first dielectric film having an index of refraction lower than the index of refraction of the first dielectric film; and (iii) a third dielectric film comprising Si x N y over the second film;
b. a first metal based layer over the first dielectric layer, wherein the first metal based layer is selected from the group consisting of tungsten, chromium, tantalum, molybdenum, aluminum, mixtures thereof, alloys thereof, and alloys of cobalt and chromium, wherein the at least one metal based layer has a thickness of 3-20 nm;
c. an infrared reflective layer over the first metal based layer;
d. a second metal based layer selected from the group consisting of tungsten, chromium, tantalum, molybdenum, aluminum, an alloy of cobalt and chromium, and mixtures thereof over the infrared reflective layer, wherein the at least one metal layer has a thickness of 3-20 nm; and
e. a second dielectric layer comprising a second Si x N y layer, where x/y ranges from 0.75 to 1.5 over the second metal based layer,
wherein a non-heat treated, coated substrate as compared to a heat treated, coated substrate has a ΔE cmc (1.5:1) (T), a ΔE cmc (1.5:1) (R1) and a ΔE cmc (1.5:1) (R2) no greater than or equal to 8 units.
10. A coated substrate according to claim 9 , wherein the infrared reflective layer is selected from the group consisting of gold, copper and silver as well as mixtures and alloys thereof.
11. A coated substrate according to claim 10 , wherein the infrared reflective layer is silver.