Method for manufacturing a thin film transistor array panel for a liquid crystal display and a photolithography method for fabricating thin films

1. A thin film transistor (TFT) array panel, comprising:

a substrate;

a gate wire formed on the substrate and including a gate line, a gate electrode and a gate pad;

a gate insulating layer pattern formed on the gate wire and having a contact hole exposing the gate pad;

a semiconductor layer pattern formed on the gate insulating layer pattern;

an ohmic contact layer pattern formed on the semiconductor layer pattern;

a data wire formed on the ohmic contact layer pattern, including a data line, a source electrode, a drain electrode and a data pad;

a passivation layer pattern formed on the data wire, having contact holes exposing the gate pad, the data pad and the drain electrode; and

a pixel electrode electrically connected to the exposed portion of the drain electrode,

wherein the ohmic contact layer pattern includes a portion disposed under the data pad and having a planar shape substantially the same as that of the data pad due to simultaneous etching and wherein the contact hole of the passivation layer, exposing the gate pad coincide with the contact hole of the gate insulating layer due to simultaneous etching.

2. The TFT array panel of 1 , further comprising a storage electrode formed over the gate line, wherein the semiconductor layer pattern and the ohmic contact layer pattern have a portion interposed between the storage electrode and the gate line, and the storage electrode is connected to the pixel electrode.

3. The TFT array panel of 1 , further comprising a redundant gate pad and a redundant data pad covering the gate pad and the data pad, respectively.