Carbon nanotubes for active direct and indirect cooling of electronics device
View Patent ↗A system for cooling a semiconductor device is disclosed. The system includes a lid encasing the semiconductor device, a first plurality of carbon nanotubes disposed within the lid, and a fluid system configured to pass a fluid through the lid. Furthermore, a second system for cooling a semiconductor device is disclosed. The second system includes a lid, a first plurality of carbon nanotubes disposed within the lid, and a fluid system configured to pass a fluid through the lid. The lid is configured to be mounted over and encase the semiconductor device. Additionally, a method for cooling a semiconductor device is disclosed. The method includes disposing a first plurality of carbon nanotubes within a lid, mounting the lid over the semiconductor device, and passing a fluid through the lid.
1. A system for cooling a semiconductor device, comprising:
a lid encasing the semiconductor device;
a first plurality of carbon nanotubes disposed within the lid; and
a fluid system configured to pass a fluid through the lid.
2. The system of claim 1 , wherein the first plurality of carbon nanotubes form a plurality of microchannels.
3. The system of claim 2 , wherein the fluid system is further configured to pass the fluid through the microchannels.
4. The system of claim 1 , wherein the first plurality of carbon nanotubes are disposed in a chamber between a top surface of the chamber and a bottom surface of the chamber.
5. The system of claim 4 , wherein first ends of the first plurality of carbon nanotubes contact the bottom surface of the chamber, and second ends of the first plurality of carbon nanotubes contact the top surface of the chamber.
6. The system of claim 4 , further comprising a thermal interface material layer disposed between an inner surface of the lid and a top surface of the semiconductor device.
7. The system of claim 4 , further comprising a second plurality of carbon nanotubes disposed between an inner surface of the lid and a top surface of the semiconductor device.
8. The system of claim 1 , wherein the first plurality of carbon nanotubes are disposed between an inner surface of the lid and a top surface of the semiconductor device.
9. The system of claim 8 , wherein first ends of the carbon nanotubes are in contact with the inner surface of the lid, and second ends of the carbon nanotubes are in contact with the top surface of the semiconductor device.
10. The system of claim 8 , further comprising a second plurality of carbon nanotubes disposed in a chamber between a top surface of the chamber and a bottom surface of the chamber.
11. The system of claim 1 , further comprising:
a heat sink; and
a heat sink thermal interface material layer disposed between the lid and the heat sink.
12. The system of claim 1 , wherein the fluid system comprises:
a first pipe connected to the lid; and
a second pipe connected to the lid,
wherein the fluid flows into the lid through the first pipe, and the fluid flows out of the lid through the second pipe.
13. The system of claim 1 , wherein the fluid system further comprises a pump, wherein the pump pumps fluid through the lid.
14. A system for cooling a semiconductor device, comprising:
a lid;
a first plurality of carbon nanotubes disposed within the lid; and
a fluid system configured to pass a fluid through the lid,
wherein the lid is configured to be mounted over and encase the semiconductor device.
15. The system of claim 14 , wherein the first plurality of carbon nanotubes form a plurality of microchannels.
16. The system of claim 15 , wherein the fluid system is further configured to pass the fluid through the microchannels.
17. The system of claim 14 , wherein first ends of the first plurality of carbon nanotubes contact an inner surface of the lid, and when the lid is mounted over the semiconductor device, second ends of the first plurality of carbon nanotubes contact the semiconductor device.
18. The system of claim 14 , further comprising a second plurality of carbon nanotubes disposed in a chamber between a top surface of the chamber and a bottom surface of the chamber.
19. A method for cooling a semiconductor device, comprising:
disposing a first plurality of carbon nanotubes within a lid;
mounting the lid, having the first plurality of carbon nanotubes disposed therein, over the semiconductor device; and
passing a fluid through the lid mounted over the semiconductor device.
20. The method of claim 19 , wherein the first plurality of carbon nanotubes form a plurality of microchannels, and wherein the fluid passes through the microchannels.
21. The method of claim 19 , wherein the first plurality of carbon nanotubes are disposed in a chamber between a top surface of the chamber and a bottom surface of the chamber.
22. The method of claim 19 , wherein the first plurality of carbon nanotubes are disposed between an inner surface of the lid and a top surface of the semiconductor device.
23. The method of claim 21 , further comprising disposing a second plurality of carbon nanotubes within the lid, wherein the second plurality of carbon nanotubes are disposed between an inner surface of the lid and a top surface of the semiconductor device.
24. The method of claim 22 , further comprising disposing a second plurality of carbon nanotubes within the lid, wherein the second plurality of carbon nanotubes are disposed in a chamber between a top surface of the chamber and the bottom surface of the chamber.