Thermal control of optical filter with local silicon frame
View Patent ↗Briefly, in accordance with one or more embodiments, a thermally controlled optical filter comprises a frame coupled to an etalon where the frame includes a resistive thermal device disposed on the frame to obtain thermal measurements of the etalon during operation. The frame may be generally L-shaped or generally square-shaped. The frame may include a fillet that is generally planar, generally beveled or trapezoidal, or generally circular in shape. A heater may be additionally disposed on the frame. The etalon and frame subassembly may be bonded to a micro hot plate that is capable of heating the etalon to an operational temperature.
1. An apparatus, comprising:
an etalon capable of filtering laser light to select a desired wavelength of the laser light;
a frame coupled to said etalon, said frame including a fillet, wherein said fillet comprises at least one of a planar shape, a beveled shape, a right angular shape, or a circular shape, or combinations thereof; and
a resistive thermal device disposed on said frame, said resistive thermal device being capable of determining a temperature of said etalon to provide the temperature of said etalon as a feedback signal.
2. An apparatus as claimed in claim 1 , said frame comprising an L-shaped structure.
3. An apparatus as claimed in claim 1 , said frame having a square-shaped structure.
4. An apparatus as claimed in claim 1 , said frame having a circular opening through which the laser light may pass.
5. An apparatus as claimed in claim 1 , said frame comprising a thermally conductive material.
6. An apparatus as claimed in claim 1 , said frame comprising silicon, tungsten copper, or silicon carbide, or combinations thereof.
7. An apparatus as claimed in claim 1 , said frame being formed via a dry etch process or a wet etch process, or combinations thereof.
8. An apparatus as claimed in claim 1 , further comprising a heater disposed on said frame, said heater being capable of heating said etalon to an operational temperature to select a desired wavelength of the laser light.
9. An apparatus as claimed in claim 1 , further comprising a micro hot plate, said etalon or said frame, or combinations thereof, being disposed on said micro hot plate.
10. An apparatus, comprising:
an etalon having an area for passing light and being capable of filtering the light to select a desired wavelength of the light;
a frame coupled to the etalon, the frame comprising a three-dimensional structure bonded to the etalon and including an opening for passing the light, the opening being positioned around the area of the etalon for passing the light; and
a resistive thermal device disposed on the frame about the opening, the resistive thermal device being capable of determining a temperature of the etalon to provide the temperature of the etalon as a feedback signal.
11. The apparatus of claim 10 , wherein the frame comprises at least one of silicon, tungsten copper, or silicon carbide, or combinations thereof.