AlRu sputtering target and manufacturing method thereof
An AlRu sputtering target that is a sintered body composed of an AlRu intermetallic compound of 95 vol. % or more is provided. It is manufactured by a stable and low-cost method that provides it with an even texture, significantly reduces oxygen, prevents or suppresses the generation of particles, and improves the yield ratio of deposition goods.
1. A method of manufacturing an AlRu sputtering target, comprising the steps of:
performing high frequency induction melting with raw materials Al and Ru;
forming an ingot by casting a melt obtained by said high frequency induction melting;
preparing a first powder from said ingot, said first powder having as a principal component an Al 13 Ru 4 intermetallic compound, said step of preparing said first powder from said ingot is accomplished by pulverizing said ingot or by employing a gas atomization method on said ingot;
mixing Ru powder and said first powder to produce a mixture; and
sintering said mixture by hot pressing or hot isostatic pressing (HIP).
2. A method according to claim 1 , wherein said steps of performing high frequency induction melting and forming an ingot produce an ingot having an oxygen content of 100 wtppm or less.
3. A method according to claim 2 , wherein said step of sintering is performed at 1300 to 1500° C.
4. A method according to claim 3 , wherein said step of sintering is performed at a sintering pressure of 150 Kgf/cm 2 or more.
5. A method according to claim 4 , wherein said mixture to which said step of sintering is performed is made of particles having an average particle size of 50 to 100 μm.
6. A method according to claim 5 , wherein said step of sintering is performed in a vacuum.
7. A method according to claim 6 , wherein said step of sintering produces a sintered body having an oxygen content of 1500 wtppm or less.
8. A method according to claim 7 , wherein said step of sintering produces a sintered body composed of 95 vol. % or more of an AlRu intermetallic compound.
9. A method according to claim 8 , wherein said step of sintering produces a sintered body having a relative density of 90% or more.
10. A method according to claim 1 , wherein said step of sintering is performed at 1300 to 1500° C.
11. A method according to claim 1 , wherein said step of sintering is performed at a sintering pressure of 150 Kgf/cm 2 or more.
12. A method according to claim 1 , wherein said mixture to which said step of sintering is performed is made of particles having an average particle size of 50 to 100 μm.
13. A method according to claim 1 , wherein said step of sintering is performed in a vacuum.
14. A method according to claim 1 , wherein said step of sintering produces a sintered body having an oxygen content of 1500 wtppm or less.
15. A method according to claim 1 , wherein said step of sintering produces a sintered body composed of 95 vol. % or more of an AlRu intermetallic compound.
16. A method according to claim 1 , wherein said step of sintering produces a sintered body having a relative density of 90% or more.
17. A method of manufacturing an AlRu sputtering target, comprising the steps of:
high frequency melting raw materials in a vacuum to form a melt, the raw materials consisting of Al and Ru at a molar ratio of Al and Ru of 3 to 4:1;
casting an ingot from the melt such that the ingot has an oxygen content of 100 wtppm or less;
pulverizing or atomizing the ingot to form a first powder having an Al 13 Ru 4 intermetallic compound as a principal component;
mixing Ru powder and the first powder to produce a mixture, the Ru powder being in an amount necessary to obtain 95 vol. % or more of AlRu intermetallic compound; and
sintering the mixture in a vacuum by hot pressing or hot isostatic pressing (HIP) to produce a sintered body composed of 95 vol. % or more of AlRu intermetallic compound having an oxygen content of 1500 wtppm or less and a relative density of 90% or more.
18. A method according to claim 17 , wherein said step of sintering is performed at 1300 to 1500° C. and at a sintering pressure of 150 Kgf/cm 2 or more, and wherein the mixture to which said step of sintering is performed is made of particles having an average particle size of 50 to 100 μm.
19. A method according to claim 17 , wherein said pulverizing or atomizing step is a gas atomization process step that forms atomized powder.