Thermal mass transfer substrate films, donor elements, and methods of making and using same
View Patent ↗Substrate films, thermal mass transfer donor elements, and methods of making and using the same are provided. In some embodiments, such substrate films and donor elements include at least two dyads, wherein each dyad includes an absorbing first layer and an essentially non-absorbing second layer. Also provided are methods of making a donor element that includes an essentially non-absorbing substrate, an absorbing first layer, and a non-absorbing second layer, wherein the composition of the essentially non-absorbing substrate is essentially the same as the composition of the essentially non-absorbing second layer.
1. A substrate film for a thermal transfer donor element comprising a stack of layers comprising at least two dyads, wherein each dyad comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the fraction absorbing material for each dyad is essentially the same, and wherein the total thickness of each dyad is selected such that the total power absorbed by each dyad is essentially the same.
2. The substrate film of claim 1 wherein the at least two dyads form a stack having alternating absorbing layers and essentially non-absorbing layers.
3. The substrate film of claim 1 further comprising a skin layer on at least one surface of the film.
4. The substrate film of claim 1 further comprising a skin layer on both surfaces of the film.
5. A thermal transfer donor element comprising: an essentially non-absorbing substrate; and
a light-to-heat conversion layer on at least a portion of the substrate, wherein the light-to-heat conversion layer comprises at least a first stack of layers comprising at least two dyads, wherein each of the at least two dyads of the first stack of layers comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the fraction absorbing material for each dyad is essentially the same, and wherein the total thickness of each dyad is selected such that the total power absorbed by each dyad is essentially the same.
6. The thermal transfer donor element of claim 5 further comprising an underlayer disposed between the substrate and the light-to-heat conversion layer.
7. The thermal transfer donor element of claim 5 further comprising an interlayer on at least a portion of the light-to-heat conversion layer.
8. The thermal transfer donor element of claim 5 wherein the at least two dyads of the first stack of layers form a stack of layers having alternating absorbing layers and essentially non-absorbing layers.
9. A thermal transfer donor element comprising:
an essentially non-absorbing substrate; and
a light-to-heat conversion layer on at least a portion of the substrate, wherein the light-to-heat conversion layer comprises at least a first stack of layers comprising at least two dyads, wherein each of the at least two dyads of the first stack of layers comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the total thickness of each dyad in the first stack of layers is essentially the same, and wherein the thickness of the first layer and the thickness of the second layer for each dyad are selected such that the total power absorbed for each dyad in the first stack of layers is essentially the same.
10. A thermal transfer donor element comprising:
an essentially non-absorbing substrate; and
a light-to-heat conversion layer on at least a portion of the substrate, wherein the light-to-heat conversion layer comprises:
a first stack of layers comprising at least two dyads, wherein each of the at least two dyads of the first stack of layers comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the fraction of absorbing material is essentially the same for each dyad in the first stack of layers, and wherein the total thickness of each dyad in the first stack of layers is essentially the same; and
a second stack of layers comprising at least two dyads; wherein each of the at least two dyads of the second stack of layers comprises:
an absorbing first layer; and
an essentially non-absorbing second layer;
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the fraction of absorbing material is essentially the same for each dyad in the second stack of layers, wherein the total thickness of each dyad in the second stack of layers is essentially the same, and wherein the total thickness of each dyad in the first stack of layers and the total thickness of each dyad in the second stack of layers are selected such that the peak power absorbed is minimized.
11. A method of preparing a substrate film for a thermal transfer donor element according to claim 1 , the method comprising:
forming a stack of layers comprising at least two dyads, wherein each dyad comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the fraction absorbing material for each dyad is essentially the same, and wherein the total thickness of each dyad is selected such that the total power absorbed by each dyad is essentially the same.
12. The method of claim 11 wherein forming the stack of layers comprises coextruding the at least two dyads and a base layer.
13. A method of preparing a thermal transfer donor element according to claim 5 , the method comprising:
providing an essentially non-absorbing substrate; and
forming a stack of layers comprising at least two dyads on at least a portion of the substrate, wherein each of the at least two dyads comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the fraction absorbing material for each dyad is essentially the same, and wherein the total thickness of each dyad is selected such that the total power absorbed by each dyad is essentially the same.
14. The method of claim 13 wherein forming comprises extruding the first layer and the second layer of at least one dyad.
15. The method of claim 14 wherein extruding comprises coextruding the first layer and the second layer of the at least one dyad.
16. The method of claim 13 wherein forming comprises coextruding each layer of the at least two dyads onto the substrate.
17. A method of preparing a thermal transfer donor element, the method comprising:
providing an essentially non-absorbing substrate;
forming an absorbing first layer on at least a portion of the substrate; and
forming an essentially non-absorbing second layer on at least a portion of the absorbing first layer, and
forming a thermal transfer layer on at least a portion of the second layer,
wherein the composition of the essentially non-absorbing substrate is essentially the same as the composition of the essentially non-absorbing second layer, and wherein forming the first and second layers comprises sequentially coating the layers.
18. A substrate film for a thermal transfer donor element comprising a stack of layers comprising at least two dyads, wherein each dyad comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the total thickness of each dyad in the first stack of layers is essentially the same, and wherein the thickness of the first layer and the thickness of the second layer for each dyad are selected such that the total power absorbed for each dyad in the first stack of layers is essentially the same.
19. A method of preparing a substrate film for a thermal transfer donor element according to claim 18 , the method comprising:
forming a stack of layers comprising at least two dyads, wherein each dyad comprises:
an absorbing first layer; and
an essentially non-absorbing second layer,
wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the total thickness of each dyad in the first stack of layers is essentially the same, and wherein the thickness of the first layer and the thickness of the second layer for each dyad are selected such that the total power absorbed for each dyad in the first stack of layers is essentially the same.
20. A method of preparing a thermal transfer donor element according to claim 9 , the method comprising:
providing an essentially non-absorbing substrate; and
forming a stack of layers comprising at least two dyads on at least a portion of the substrate, wherein each of the at least two dyads comprises:
an absorbing first layer; and
an essentially non-absorbing second layer, wherein each absorbing first layer of the at least two dyads has essentially the same optical absorption rate, wherein the total thickness of each dyad in the first stack of layers is essentially the same, and wherein the thickness of the first layer and the thickness of the second layer for each dyad are selected such that the total power absorbed for each dyad in the first stack of layers is essentially the same.