Beam direction control element and method of manufacturing same

1. A method of manufacturing a beam direction control element having transparent areas and light absorption areas alternately arranged on a surface of a substrate, wherein said light absorption areas function as a louver for controlling direction of a beam of light, said method comprising:

disposing an optically transparent material on a first transparent substrate to form transparent ridges which constitute the transparent areas;

filling curable and photo-absorptive fluid in gaps between said transparent ridges;

curing the fluid to form the light absorption areas; and

laminating a second translucent substrate in close contact with said transparent ridges on said transparent ridge,

wherein said second translucent substrate is one of a color filter and a polarizing film,

wherein the formation of transparent ridges comprises:

coating an optically transparent and photo-curing material on said first substrate in a thickness in accordance with said transparent ridges to form a transparent layer; and

patterning said transparent layer by a photolithography process using a photomask corresponding to said transparent ridges to form the transparent ridges made of the cured photo-curing material on said first substrate, and

wherein said filling of the fluid includes coating the fluid on said first substrate including said transparent ridges.

2. A method of manufacturing a beam direction control element having transparent areas and light absorption areas alternately arranged on a surface of a substrate, wherein said light absorption areas function as a louver for controlling direction of a beam of light, said method comprising:

disposing an optically transparent material on a first transparent substrate to form transparent ridges which constitute the transparent areas;

filling curable and photo-absorptive fluid in gaps between said transparent ridges;

spreading the curable fluid while bringing a second translucent substrate into close contact with said first substrate coated with the fluid, to adhere said second substrate to said first substrate; and

curing the curable fluid to form the light absorption areas between said first transparent substrate and said second translucent substrate,

wherein said second translucent substrate is one of a color filter and a polarizing film,

wherein the formation of transparent ridges comprises:

coating an optically transparent and photo-curing material on said first substrate in a thickness in accordance with said transparent ridges to form a transparent layer; and

patterning said transparent layer by a photolithography process using a photomask corresponding to said transparent ridges to form the transparent ridges made of the cured photo-curing material on said first substrate, and

wherein said filling of the fluid includes coating the fluid on said first substrate including said transparent ridges.

3. A method of manufacturing a beam direction control element having transparent areas and light absorption areas alternately arranged on a surface of a substrate, wherein said light absorption areas function as a louver for controlling direction of a beam of light, said method comprising:

disposing an optically transparent material on a first transparent substrate to form transparent ridges which constitute the transparent areas;

filling curable and photo-absorptive fluid in gaps between said transparent ridges;

curing the fluid to form the light absorption areas; and

placing a second translucent substrate on said first transparent substrate such that said second substrate comes into close contact with peak surfaces of salients of said transparent ridges,

wherein said second translucent substrate is one of a color filter and a polarizing film,

wherein the formation of transparent ridges comprises:

coating an optically transparent and photo-curing material on said first substrate in a thickness in accordance with said transparent ridges to form a transparent layer; and

patterning said transparent layer by a photolithography process using a photomask corresponding to said transparent ridges to form the transparent ridges made of the cured photo-curing material on said first substrate, and

wherein said filling of the fluid includes coating the fluid on said first substrate including said transparent ridges.

4. A method of manufacturing a beam direction control element having transparent areas and light absorption areas alternately arranged on a surface of a substrate, wherein said light absorption areas function as a louver for controlling direction of a beam of light, said method comprising:

disposing an optically transparent material on a first transparent substrate to form first transparent ridges which constitute the transparent areas;

disposing an optically transparent material on a second translucent substrate to form second transparent ridges which constitute the transparent areas;

placing said second substrate on said first substrate such that peak surfaces of salients of the first transparent ridges come into close contact with the surface of said second substrate, and such that peak surfaces of salients of the second transparent ridges come into close contact with the surface of said first substrate,

filling curable and photo-absorptive fluid in spaces surrounded by said first substrate, said second substrate, said first transparent ridges, and said second transparent ridges,

wherein said second translucent substrate is one of a color filter and a polarizing film.

5. The method according to claim 4 ,

wherein the formation of first transparent ridges comprises:

coating an optically transparent and photo-curing material on said first substrate in a thickness in accordance with said first transparent ridges to form a first transparent layer; and

patterning said first transparent layer by a photolithography process using a photomask corresponding to said first transparent ridges to form the first transparent ridges made of the cured photo-curing material on said first substrate, and

wherein the formation of second transparent ridges comprises:

coating an optically transparent and photo-curing material on said second substrate in a thickness in accordance with said second transparent ridges to form a second transparent layer; and

patterning said second transparent layer by a photolithography process using a photomask corresponding to said second transparent ridges to form the second transparent ridges made of the cured photo-curing material on said second substrate.