Electroless plating production of nickel and cobalt structures
View Patent ↗A method comprising forming a structural element 115 on a surface 620 of a layer 510 via an electroless plating of nickel or cobalt 130 onto the surface, the layer being rigidly fixed to an underlying substrate 110 . The method also comprises etching away a portion of the layer such that a part of the structural element is able to move with respect to the substrate.
1. An apparatus, comprising:
a substrate having a surface; and
a MEMS device including a structural element having a first part that is rigidly fixed to said surface, and a second part that is movable with respect to said substrate, wherein
said structural element is a separately moveable monolayer of nickel or cobalt alloyed with phosphorus or boron and having a substantially amorphous structure, and said first part and said second part are different portions of a single continuous piece of said monolayer.
2. The apparatus of claim 1 , wherein said nickel or cobalt alloy has a yield point that is within about 55 percent of said nickel or cobalt alloy's ultimate tensile strength.
3. The apparatus of claim 1 , wherein a surface of said structural element further comprises a metal seed layer thereon, wherein said seed layer is free of phosphorus or boron.
4. The apparatus of claim 1 , wherein said structural element consists essentially of said nickel or said cobalt alloyed with said phosphorus or said boron.
5. The apparatus of claim 1 , wherein said structural element is composed of at least about 99 wt % said nickel or said cobalt alloyed with said phosphorus or said boron.
6. The apparatus of claim 1 , wherein said second part is configured to reversibly deform when an actuating current is applied through said structural element.
7. The apparatus of claim 1 , wherein said second part includes a first beam and a second beam, wherein said first beam is parallel to said second beam and said second beam is configured to thermally expand to a greater extent than said first beam when an actuating current is applied through said structural element.
8. The apparatus of claim 7 , wherein a width of said first beam is about two times or greater than a width said second beam.
9. The apparatus of claim 1 , wherein said second part of said structural element includes a flexible beam.
10. The apparatus of claim 1 , wherein said second part of said structural element includes a first flexible beam and a second flexible beam.
11. The apparatus of claim 1 , wherein said structural element forms one contact of an electrical switch.
12. An apparatus comprising:
a substrate having a surface; and
a MEMS device including a structural element having a first part that is rigidly fixed to said surface, and a second part that is movable with respect to said substrate, wherein
said first part and said second part are different portions of a single continuous piece formed of nickel or cobalt alloyed with phosphorus or boron and having a substantially amorphous structure, and further including:
a voltage source electrically coupled to said structural element;
a transmitter and a receiver electrically coupled to a second structural element, wherein said transmitter is configured to transmit a signal to said receiver through one or both of said structural element and said second structural element when one or both of said structural element and said second structural element are actuated to contact each other, and wherein
said MEMS device is configured as a microelectromechanical thermal relay and further includes said second structural element on said substrate and adjacent to, but electrically isolated from, said structural element when said MEMS device is not actuated.