Dielectric waveguide and method of making the same
View Patent ↗In general, in one aspect, the invention features a method that includes exposing a surface to a first gas composition under conditions sufficient to deposit a layer of a first chalcogenide glass on the surface, and exposing the layer of the first chalcogenide glass to a second gas composition under conditions sufficient to deposit a layer of a second glass on the layer of the first chalcogenide glass, wherein the second glass is different from the first chalcogenide glass.
1. A method, comprising:
forming a layer of a chalcogenide glass on an inner surface of a hollow tube, the chalcogenide glass layer extending along a length of the hollow tube;
activating a plasma within a region of the hollow tube, the region extending along the hollow tube a distance shorter than the length of the hollow tube;
introducing a gas composition into the hollow tube, wherein components of the gas composition interact with the plasma to form an oxide glass; and
moving the plasma region relative to the hollow tube to form a layer of the oxide glass on the chalcogenide glass layer along the length of the hollow tube,
wherein the gas composition is substantially inert with respect to the chalcogenide glass in the absence of the plasma, the gas composition comprises nitrous oxide that interacts with the plasma to provide oxygen from which the oxide glass is formed.
2. The method of claim 1 , wherein the first gas composition further comprises a carrier gas and a halide compound.
3. The method of claim 1 , wherein the interaction between the gas composition, the plasma, and the chalcogenide glass does not substantially change physical properties of the chalcogenide glass layer.
4. The method of claim 1 , wherein the layer of the chalcogenide glass is formed using plasma-enhanced chemical vapor deposition.
5. The method of claim 1 , further comprising forming another layer of the chalcogenide glass or a layer of a different chalcogenide glass on the layer of the oxide glass.
6. The method of claim 1 , further comprising forming multiple additional alternating layers of chalcogenide glass and oxide glass.
7. The method of claim 1 , wherein activating a plasma within the region of the hollow tube comprises exposing gas in the hollow tube to electromagnetic radiation.
8. The method of claim 7 , wherein the electromagnetic radiation comprises microwave radiation or radio frequency radiation.
9. The method of claim 1 , wherein introducing the gas composition comprises heating the surface to a temperature between about 80° C. and 250° C.
10. The method of claim 1 , wherein the chalcogenide glass and oxide glass layers are layers of a preform and the method further comprises drawing the preform to form a photonic crystal fiber.
11. The method of claim 10 , wherein the photonic crystal fiber comprises a core and a confinement region surrounding core, where the chalcogenide glass layer and oxide glass layer correspond to layers in the confinement region.
12. The method of claim 11 , wherein the confinement region includes one or more polymer layers.
13. The method of claim 12 , wherein the layers in confinement region corresponding to the chalcogenide glass layer and the oxide glass layer are closer to the core than the one or more polymer layers.
14. The method of claim 1 , wherein the hollow tube comprises a polysulfone, a fluoropolymer, polyethylene or a derivative of a polysulfone, a fluoropolymer, or polyethylene.