IP Library › Patent Application 11760855
Patent Application
App. No. 11/760,855

Imprint Lithography Template Having a Feature Size Under 250 nm

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Quick Facts
Patent No.
US None
App. No.
11/760,855
Abstract

The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.

Claims (9)

1 . An imprint lithography template comprising:

a body having first and second opposed sides; and

an imprint lithography mold, positioned upon said second side of said body, having a plurality of protrusions and a plurality of recessions, defining an imprint lithography patterning surface spaced-apart from said second side a height, with a distance between a zenith of any of said plurality of protrusions and a nadir of any of said plurality of recessions being less than 250 nm.

2 . The template as recited in claim 1 wherein said plurality of recessions comprises a first set of recessions having a first depth and a second set of recessions having a second depth.

3 . The template as recited in claim 2 wherein said first depth may be less than 250 nm.

4 . The template as recited in claim 2 wherein said second depth is greater than said first depth.

5 . The template as recited in claim 1 wherein said template comprises silicon, silicon dioxide, silicon germanium carbon, gallium nitride, silicon germanium, sapphire, gallium arsinide, epitaxial silicon, polysilicon, gate oxide, quartz, or a combination thereof.

6 . The template as recited in claim 1 wherein said imprint lithography patterning surface is operable for imprinting into an imprinting material a pattern defined by said plurality of protrusions and said plurality of recessions.

7 . An imprint lithography mold having a plurality of protrusions and a plurality of recessions, defining an imprint lithography patterning surface, with a distance between a zenith of any said plurality of protrusions and a nadir of any of said plurality of recessions being less than 250 nm.