Device performance improvement using flowfill as material for isolation structures
View Patent ↗A trench is formed in the surface of a provided semiconductor body. An oxide is deposited in the trench and a cap is deposited on the oxide, wherein the combination of the cap and the oxide impart a mechanical stress on the semiconductor body.
1. A semiconductor device comprising:
a semiconductor body;
a trench disposed in the surface of the semiconductor body;
a flowable oxide layer under a first level of tensile stress disposed in a lower portion of the trench; and
a cap disposed in the trench above the oxide layer, said cap under less tensile stress than said first level, and wherein the combination of the oxide layer and the cap provides a mechanical force on sidewalls of the trench.
2. The device of claim 1 , wherein the cap comprises HARP™.
3. The device of claim 1 , further comprising a liner disposed between a bottom and the sidewalls of the trench and the oxide layer.
4. The device of claim 3 , further comprising an electronic component disposed adjacent to the trench.
5. The device of claim 4 , wherein the electronic component is a MOS transistor.
6. The device of claim 5 , wherein the MOS transistor comprises a gate and source/drain regions.
7. The device of claim 6 , wherein the source/drain regions are n-type and wherein the MOS transistor comprises an NMOS device.
8. The device of claim 1 , wherein the cap comprises an HDP deposited oxide.
9. The device of claim 1 , wherein said flowable oxide layer is an annealed flowable oxide layer.
10. The device of claim 9 , wherein said cap is annealed.
11. The device of claim 1 , wherein said cap is annealed.