INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
1 . An apparatus, comprising:
an implant having a distal end portion and a central portion configured to be disposed between a first spinous process and a second spinous process,
the distal end portion of the implant having a first configuration and a second configuration, the distal end portion of the implant configured to dilate a bodily tissue when in the first configuration, the distal end portion of the implant configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when in the second configuration.
2 . The apparatus of claim 1 , wherein the distal end portion of the implant includes a tapered member movably coupled to the central portion of the implant, a surface of the tapered member configured to dilate the bodily tissue when the implant is in the first configuration, the surface of the tapered member configured to contact at least one of the first spinous process or the second spinous process when the implant is in the second configuration.
3 . The apparatus of claim 1 , wherein the distal end portion of the implant includes:
a first member rotatably coupled to the central portion of the implant; and
a second member rotatably coupled to the central portion of the implant.
4 . The apparatus of claim 1 , wherein the distal end portion of the implant includes:
a first member rotatably coupled to the central portion of the implant, the first member configured to rotate in a first direction; and
a second member rotatably coupled to the central portion of the implant, the second member configured to rotate in a second direction opposite the first direction.
5 . The apparatus of claim 1 , wherein the distal end portion of the implant includes:
a first member rotatably coupled to the central portion of the implant, the first member having a side surface; and
a second member rotatably coupled to the central portion of the implant, the second member having a side surface,
the side surface of the first member in contact with the side surface of the second member when the distal end portion of the implant is in the first configuration, the side surface of the first member spaced apart from the side surface of the second member when the distal end portion of the implant is in the second configuration.
6 . The apparatus of claim 1 , wherein the distal end portion of the implant includes:
a first member rotatably coupled to the central portion of the implant, the first member having a side surface; and
a second member rotatably coupled to the central portion of the implant, the second member having a side surface,
the side surface of the first member and the side surface of the second member collectively define a tapered dilator when the distal end portion of the implant is in the first configuration, the side surface of the first member configured to contact the first spinous process when the distal end portion of the implant is in the second configuration.
7 . The apparatus of claim 1 , further comprising an insert configured to be slidably disposed within the implant when the central portion of the implant is disposed between the first spinous process and the second spinous process, the insert configured to move the distal end portion of the implant from the first configuration to the second configuration when the insert is disposed within the implant.
8 . The apparatus of claim 1 , further comprising an insert configured to be slidably disposed within the implant when the central portion of the implant is disposed between the first spinous process and the second spinous process, the insert including an actuation portion and a retention portion, the actuation portion configured to move the distal end portion of the implant from the first configuration to the second configuration when the insert is disposed within the implant, the retention portion configured to limit movement of the implant along the longitudinal axis and relative to the first spinous process and the second spinous process when the insert is disposed within the implant.
9 . An apparatus, comprising:
an implant including a distal end portion having a tapered outer surface configured to distract a space between the first spinous process and the second spinous process, the tapered outer surface configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process.
10 . The apparatus of claim 9 , wherein the implant further including a central portion configured to be disposed between the first spinous process and the second spinous process.
11 . The apparatus of claim 9 , wherein the tapered outer surface has a first configuration and a second configuration, the tapered outer surface configured to distract the space between the first spinous process and the second spinous process when in the first configuration, the tapered outer surface configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when in the second configuration.
12 . The apparatus of claim 9 , wherein:
the tapered outer surface is rotatably coupled to the distal end portion of the implant such that the tapered outer surface has a first position and a second position relative to the distal end portion of the implant,
the tapered outer surface configured to distract the space between the first spinous process and the second spinous process when in the first position, the tapered outer surface configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when in the second position.
13 . The apparatus of claim 9 , wherein:
the tapered outer surface is a first tapered outer surface; and
the distal end portion of the implant having a second tapered outer surface, the first tapered outer surface and the second tapered outer surface configured to cooperatively distract the space between the first spinous process and the second spinous process, the first tapered outer surface and the second tapered outer surface configured to cooperatively limit lateral movement of the implant relative to the first spinous process and the second spinous process.
14 . The apparatus of claim 9 , wherein:
the tapered outer surface is a first tapered outer surface, the first tapered outer surface being rotatably coupled to the distal end portion of the implant and having a first position and a second position relative to the distal end portion of the implant; and
the distal end portion of the implant having a second tapered outer surface rotatably coupled to the distal end portion of the implant and having a first position and a second position relative to the distal end portion of the implant,
the first tapered outer surface and the second tapered outer surface configured to cooperatively distract the space between the first spinous process and the second spinous process when in their respective first positions, the first tapered outer surface and the second tapered outer surface configured to cooperatively limit lateral movement of the implant relative to the first spinous process and the second spinous process when in their respective second positions.
15 . An apparatus, comprising:
a support member configured to be disposed within a body and including a space between a first spinous process and a second spinous process; and
a distal member rotatably coupled to the support member and having a first position and a second position relative to the support member, the distal member configured to dilate a bodily tissue when in the first position, the distal member configured to limit lateral movement of the support member relative to the first spinous process and the second spinous process when in the second position.
16 . The apparatus of claim 15 , wherein the distal member is configured to distract the first spinous process and the second spinous process when in the first position.
17 . The apparatus of claim 15 , wherein the distal member is configured to rotate about an axis substantially normal to a longitudinal axis of the support member.
18 . The apparatus of claim 15 , wherein the distal member is rotatably coupled to the distal end of the support member, an outer surface of the distal member configured to dilate the bodily tissue when the distal member is in the first position, the outer surface of the distal member configured to contact at least one of the first spinous process or the second spinous process when the distal member is in the second position.
19 . The apparatus of claim 15 , further comprising an insert configured to be slidably disposed within the support member, the insert configured to move the distal member from the first position to the second position when the support member is disposed between the first spinous process and the second spinous process.
20 . The apparatus of claim 15 , further comprising an insert configured to be slidably disposed within the support member, the insert having an actuation portion configured to engage a portion of the distal member such that the distal member is moved from the first position to the second position when the insert is disposed within the support member.
21 . The apparatus of claim 15 , further comprising an insert having an actuation portion and a retention portion, the actuation portion configured to be slidably disposed within the support member and to move the distal member from the first position to the second position, the retention portion configured to limit movement of the support member along a longitudinal axis of the insert and relative to the first spinous process and the second spinous process when the actuation portion is disposed within the support member.
22 . The apparatus of claim 15 , wherein the distal member is a first distal member, the apparatus further comprising:
a second distal member rotatably coupled to the support member between a first position and a second position, the second distal member configured to dilate the bodily tissue when in its first position, the second distal member configured to limit lateral movement of the support member relative to the first spinous process and the second spinous process when in its second position.
23 . The apparatus of claim 15 , wherein the distal member is a first distal member configured to rotate in a first direction about a first axis substantially normal to a longitudinal axis of the support member, the apparatus further comprising:
a second distal member rotatably coupled to the support member and having a first position and a second position relative to the support member, the second distal member configured to rotate in a second direction about a second axis substantially normal to the longitudinal axis of the support member, the second direction opposite the first direction,
the second distal member configured to dilate the bodily tissue when in its first position, the second distal member configured to limit lateral movement of the support member relative to the first spinous process and the second spinous process when in its second position.
24 . The apparatus of claim 15 , wherein the distal member is a first distal member having a side surface, the apparatus further comprising:
a second distal member rotatably coupled to the support member and having a first position and a second position relative to the support member, the second distal member having a side surface,
the second distal member configured to dilate the bodily tissue when in its first position, the second distal member configured to limit lateral movement of the support member relative to the first spinous process and the second spinous process when in its second position,
the side surface of the first distal member being in contact with the side surface of the second distal member when the first distal member and the second distal member are in their respective first positions, the side surface of the first distal member spaced apart from the side surface of the second distal member when the first distal member and the second distal member are in their respective second positions.
25 . A method, comprising:
inserting into a body an implant having a support portion and a distal end portion, the distal end portion movable between a first configuration and second configuration;
disposing at least a portion of the support member between a first spinous process and a second spinous process when the distal end portion is in the first configuration; and
moving the distal end portion from the first configuration to the second configuration after the disposing such that lateral movement of the support member relative to the first spinous process and the second spinous process is limited in at least one direction.
26 . The method of claim 25 , wherein the inserting includes inserting the implant when the distal end portion is in the first configuration.
27 . The method of claim 25 , wherein the inserting includes inserting percutaneously the implant via a lateral incision.
28 . The method of claim 25 , wherein the disposing includes disposing the implant such that the distal end portion displaces a bodily tissue.
29 . The method of claim 25 , wherein the disposing includes disposing the implant such that the distal end portion dilates a bodily tissue.
30 . The method of claim 25 , wherein the disposing includes disposing the implant such that the distal end portion distracts a space between the first spinous process and the second spinous process.
31 . The method of claim 25 , wherein the moving includes:
rotating a first member of the distal end portion in a first direction about an axis substantially normal to a longitudinal axis of the support member; and
rotating a second member of the distal end portion in a second direction about the axis substantially normal to the longitudinal axis of the support member, the second direction opposite the first direction.
32 . The method of claim 25 , wherein the moving includes rotating a movable member of the distal end portion relative to the support member such that a side surface of the movable member is in contact with at least one of the first spinous process or the second spinous process.
33 . The method of claim 25 , wherein the moving includes disposing an actuator into an opening defined by the support member such that the actuator engages a portion of the distal end portion.
34 . The method of claim 25 , wherein the moving includes disposing an insert into an opening defined by the support member such an actuation portion of the insert engages a member of the distal end portion that is movable relative to the support member.
35 . A method, comprising:
inserting into a body an implant having a support member and a distal member, the distal member being rotatable relative to the support portion between a first position and a second position;
disposing at least a portion of the support member between a first spinous process and a second spinous process when the distal member is in the first position; and
moving the distal member from the first position to the second position after the disposing such that lateral movement of the support member relative to the first spinous process and the second spinous process is limited in at least one direction.
36 . The method of claim 35 , wherein the inserting includes inserting percutaneously the implant via a lateral incision when the distal member is in the first position.
37 . The method of claim 35 , wherein the disposing includes disposing the implant such that the distal member displaces a bodily tissue.
38 . The method of claim 35 , wherein the disposing includes disposing the implant such that the distal member dilates a bodily tissue.
39 . The method of claim 35 , wherein the disposing includes disposing the implant such that the distal member distracts a space between the first spinous process and the second spinous process.
40 . The method of claim 35 , wherein the moving includes rotating the distal member approximately ninety degrees about an axis substantially normal to a longitudinal axis of the support member.
41 . The method of claim 35 , wherein
the distal member is a first distal member, the implant including a second distal member rotatably coupled to the support member between a first position and a second position; and
the moving includes rotating the first distal member about a first axis substantially normal to a longitudinal axis of the support member and rotating the second distal member about a second axis substantially normal to the longitudinal axis of the support member.
42 . The method of claim 35 , wherein
the distal member is a first distal member, the implant including a second distal member rotatably coupled to the support member between a first position and a second position; and
the moving includes rotating the first distal member about a first axis substantially normal to a longitudinal axis of the support member and rotating the second distal member about a second axis substantially normal to the longitudinal axis of the support member such that at least one of a surface of the first distal member or a surface of the second distal member contacts at least one of the first spinous process or the second spinous process.
43 . The method of claim 35 , wherein the moving includes disposing an insert into an opening defined by the support member such that an actuation portion of the insert engages a portion of the distal member to move the distal member from the first position to the second position.