INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
1 . An apparatus, comprising:
a first implant member having a central portion and a distal end portion, at least a portion of the central portion configured to be disposed between a first spinous process and a second spinous process, the distal end portion having a first configuration and a second configuration; and
a second implant member configured to move the distal end portion of the first implant member from the first configuration to the second configuration when the central portion of the first implant member is disposed between the first spinous process and the second spinous process,
the distal end portion of the first implant member configured to limit lateral movement of the first implant member relative to the first spinous process and the second spinous process when in the second configuration.
2 . The apparatus of claim 1 , wherein the distal end portion of the first implant member is configured to dilate a bodily tissue when in the first configuration.
3 . The apparatus of claim 1 , wherein:
the second implant member has a distal end portion configured to be disposed within the first implant member, the distal end portion of the second implant member configured to move the distal end portion of the first implant member from the first configuration to the second configuration when the distal end portion of the second implant member is disposed within the first implant member.
4 . The apparatus of claim 1 , wherein:
the second implant member has a distal end portion and a proximal end portion, the distal end portion of the second implant member configured to move the distal end portion of the first implant member from the first configuration to the second configuration when the central portion of the first implant member is disposed between the first spinous process and the second spinous process,
the proximal end portion of the second implant member configured to limit lateral movement of the second implant member relative to the first spinous process and the second spinous process when the distal end portion of the second implant member is disposed within the first implant member.
5 . The apparatus of claim 1 , wherein:
the second implant member has a distal end portion and a proximal end portion, the distal end portion of the second implant member configured to be slidably disposed within the first implant member, the distal end portion of the second implant member configured to move the distal end portion of the first implant member from the first configuration to the second configuration when the distal end portion of the second implant member is disposed within the first implant member,
the proximal end portion of the second implant member having a protrusion configured to be matingly received within an opening defined by an outer surface of the first implant member, the first spinous process disposed between the distal end portion of the first implant member and the protrusion of the proximal end portion of the second implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process.
6 . The apparatus of claim 1 , wherein:
the distal end portion of the first implant member includes a movable member movably coupled to the central portion of the first implant member, the movable member configured to dilate a bodily tissue when the distal end portion of the first implant member is in the first configuration, the movable member configured to contact at least one of the first spinous process or the second spinous process when the distal end portion of the first implant member is in the second configuration.
7 . The apparatus of claim 1 , wherein:
the distal end portion of the first implant member includes a movable member movably coupled to the central portion of the first implant member; and
the second implant member has a distal end portion, the distal end portion of the second implant member having a tapered surface configured to engage the movable member to move the movable member relative to the central portion of the first implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process.
8 . The apparatus of claim 1 , wherein:
the distal end portion of the first implant member includes a first movable member rotatably coupled to the central portion of the first implant member and a second movable member rotatably coupled to the central portion of the first implant member; and
the second implant member has a distal end portion configured to be disposed within a cavity defined by the first movable member and the second movable member, the distal end portion of the second implant member configured to move the first movable member and the second movable member when the distal end portion of the second implant member is disposed within the cavity.
9 . The apparatus of claim 1 , wherein:
the distal end portion of the first implant member includes a first movable member and a second movable member, the first movable member rotatably coupled to the central portion of the first implant member and having an inner surface, the second movable member rotatably coupled to the central portion of the first implant member and having an inner surface; and
the second implant member has a distal end portion configured to engage the inner surface of the first movable member and the inner surface of the second movable member to move the distal end portion of the first implant member from the first configuration to the second configuration.
10 . The apparatus of claim 1 , wherein the second implant member is configured to move at least a portion of the distal portion of the first implant member distally to move the distal end portion of the first implant member from the first configuration to the second configuration.
11 . An apparatus, comprising:
a first implant member having a central portion and a distal end portion, the central portion configured to be disposed between a first spinous process and a second spinous process; and
a second implant member having a distal end portion and a proximal end portion, the distal end portion of the second implant member configured to move the distal end portion of the first implant member relative to the central portion of the first implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process,
the first spinous process being disposed between the distal end portion of the first implant member and the proximal end portion of the second implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process and when distal end portion of the second implant member has moved the distal end portion of the first implant member.
12 . The apparatus of claim 11 , wherein the distal end portion of the second implant member is configured to be disposed within the first implant member to move the distal end portion of the first implant member relative to the central portion of the first implant member.
13 . The apparatus of claim 11 , wherein the distal end portion of the first implant member and the proximal end portion of the second implant member collectively limit lateral movement of the apparatus relative to the first spinous process and the second spinous process when the central portion of the first implant member is disposed between the first spinous process and the second spinous process and when distal end portion of the second implant member has moved the distal end portion of the first implant member.
14 . The apparatus of claim 11 , wherein at least one of the distal end portion of the first implant member or the proximal end portion of the second implant member are configured to contact the first spinous process when the central portion of the first implant member is disposed between the first spinous process and the second spinous process and when distal end portion of the second implant member has moved the distal end portion of the first implant member.
15 . The apparatus of claim 11 , wherein:
the distal end portion of the second implant member is configured to move the distal end portion of the first implant member relative to the central portion of the first implant member between a first position and a second position,
the distal end portion of the first implant member configured to distract a space between the first spinous process and the second spinous process when in the first position,
the distal end portion of the first implant member configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when in the second position.
16 . The apparatus of claim 11 , wherein:
the distal end portion of the second implant member is configured to be disposed within the first implant member to move the distal end portion of the first implant member relative to the central portion of the first implant member; and
the proximal end portion of the second implant member has a protrusion configured to be matingly received within an opening defined by an outer surface of the first implant member when the distal end portion of the second implant member is disposed within the first implant member.
17 . The apparatus of claim 11 , wherein the distal end portion of the first implant member includes a member rotatably coupled to the central portion of the first implant member.
18 . The apparatus of claim 11 , wherein:
the distal end portion of the first implant member includes a member rotatably coupled to the central portion of the first implant member; and
the distal end portion of the second implant member has a tapered surface configured to engage the member to rotate the member relative to the central portion of the first implant member when the central portion of the first implant member is disposed between the first spinous process and the second spinous process.
19 . The apparatus of claim 11 , wherein:
the distal end portion of the first implant member includes a first member rotatably coupled to the central portion of the first implant member and a second member rotatably coupled to the central portion of the first implant member; and
the distal end portion of the second implant member is configured to engage an inner surface of the first member and an inner surface of the second member to move the distal end portion of the first implant member relative to the central portion of the first implant member.
20 . An apparatus, comprising:
an insert including a distal end portion and a proximal end portion, the distal end portion configured to be slidably disposed within an implant when a portion of the implant is disposed between a first spinous process and a second spinous process to move a retention portion of the implant from a first position to a second position.
21 . The apparatus of claim 20 , wherein the proximal end portion of the insert is configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when the distal end portion of the insert is disposed within the implant.
22 . The apparatus of claim 20 , wherein the distal end portion of the insert is configured to be disposed within the implant via a lateral access passageway.
23 . The apparatus of claim 20 , wherein the proximal end portion of the insert is configured to contact at least one of the first spinous process or the second spinous process when the portion of the implant is disposed between the first spinous process and the second spinous process and when the distal end portion of the insert is disposed within the implant.
24 . The apparatus of claim 20 , wherein:
the proximal end portion of the insert is configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when the distal end portion of the insert is disposed within the implant; and
the proximal end portion of the insert has a protrusion configured to be matingly received within an opening defined by an outer surface of the implant when the distal end portion of the insert is disposed within the implant.
25 . The apparatus of claim 20 , wherein the distal end portion of the insert has a tapered surface configured to engage the retention portion of the implant to move the retention portion of the implant from the first position to the second position.
26 . The apparatus of claim 20 , wherein the distal end portion of the insert has a tapered surface defining a groove, the groove configured to receive an actuation portion of the retention portion of the implant such that the retention portion is moved from the first position to the second position when the distal end portion of the insert is moved within the implant.
27 . The apparatus of claim 20 , further comprising the implant, the retention portion of the implant configured to limit lateral movement of the implant relative to the first spinous process and the second spinous process when in the second position.
28 . An apparatus, comprising:
a first implant member having a distal end portion and a central portion defining a lumen, at least a portion of the central portion configured to be disposed between a first spinous process and a second spinous process; and
a second implant member configured to be slidably disposed within the lumen of the first implant member between a first longitudinal position and a second longitudinal position, a size of the distal end portion of the first implant member being less than a distance between the first spinous process and the second spinous process when the second implant member is in the first longitudinal position, a size of the distal end portion of the first implant member being greater than the distance between the first spinous process and the second spinous process when the second implant member is in the second longitudinal position.
29 . The apparatus of claim 28 , wherein a portion of the distal end portion of the first implant member is configured to distract a space between the first spinous process and the second spinous process when the second implant member is in the first longitudinal position.
30 . The apparatus of claim 28 , wherein a portion of the distal end portion of the first implant member is configured to limit lateral movement of the first implant member relative to the first spinous process and the second spinous process when the second implant member is in the second longitudinal position.
31 . The apparatus of claim 28 , wherein the second implant member has a distal end portion configured to engage a portion of the distal end portion of the first implant member when the second implant member is in the second longitudinal position.
32 . The apparatus of claim 28 , wherein the second implant member has a distal end portion configured to move the distal end portion of the first implant member from a first position to a second position relative to the central portion of the first implant member when the second implant member is moved from the first longitudinal position to the second longitudinal position.
33 . The apparatus of claim 28 , wherein the second implant member has a tapered portion configured to engage the distal end portion of the first implant member such that the distal end portion of the first implant member is moved from a first position to a second position relative to the central portion of the first implant member when the second implant member is moved from the first longitudinal position to the second longitudinal position.
34 . The apparatus of claim 28 , wherein:
the distal end portion of the first implant member includes a movable member rotatably coupled to the central portion of the first implant member; and
the second implant member has a distal end portion configured to move the movable member a first position to a second position relative to the central portion of the first implant member when the second implant member is moved from the first longitudinal position to the second longitudinal position.
35 . The apparatus of claim 28 , wherein the second implant member has a proximal end portion and a distal end portion, the distal end portion of the second implant member configured to move the distal end portion of the first implant member from a first position to a second position relative to the central portion of the first implant member when the second implant member is moved from the first longitudinal position to the second longitudinal position,
the proximal end portion of second implant member having a protrusion configured to be matingly received within an opening defined by an outer surface of the first implant member when the second implant member is in the second longitudinal position.
36 . The apparatus of claim 28 , wherein the second implant member has a proximal end portion and a distal end portion, the distal end portion of the second implant member configured to move the distal end portion of the first implant member from a first position to a second position relative to the central portion of the first implant member when the second implant member is moved from the first longitudinal position to the second longitudinal position,
the proximal end portion of second implant member configured to limit lateral movement of the second implant member relative to the first spinous process and the second spinous process when the second implant member is in the second longitudinal position.