SPINE DISTRACTION IMPLANT AND METHOD
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion.
1 . An apparatus, comprising:
a first implant member configured to contact a first spinous process; and
a second implant member movably coupled to the first implant member, the second implant member configured to contact a second spinous process, the second implant member configured to move relative to the first implant member to maintain a distraction between the first spinous process and the second spinous process.
2 . The apparatus of claim 1 , wherein:
the first implant member includes a first surface configured to contact an inferior surface of the first spinous process and a second surface configured to contact a side surface of the first spinous process; and
the second implant member includes a first surface configured to contact a superior surface of the second spinous process and a second surface configured to contact a side surface of the second spinous process.
3 . The apparatus of claim 1 , wherein the second implant member is configured to translate relative to the first implant member.
4 . The apparatus of claim 1 , wherein the second implant member is configured to translate relative to the first implant member when the first implant member is in contact with the first spinous process and the second implant member is in contact with the second spinous process.
5 . The apparatus of claim 1 , wherein a portion of the second implant member is slidably disposed within the first implant member.
6 . The apparatus of claim 1 , wherein a portion of the second implant member is configured to rotate relative to the first implant member.
7 . The apparatus of claim 1 , wherein the distraction between the first spinous process and the second spinous process is at least 5 mm.
8 . The apparatus of claim 1 , wherein the distraction between the first spinous process and the second spinous process is at least 22 mm.
9 . The apparatus of claim 1 , wherein the second implant member is further configured to move relative to the first implant member to increase the distraction between the first spinous process and the second spinous process.
10 . The apparatus of claim 1 , wherein the first implant member has an actuation portion defining an opening therethrough, the opening configured to receive an actuator to move the first implant member relative to the second implant member.
11 . An apparatus, comprising:
a first implant member configured to contact a first spinous process; and
a second implant member movably coupled to the first implant member, the second implant member configured to contact a second spinous process, the second implant member configured to move relative to the first implant member to distract the first spinous process and the second spinous process.
12 . The apparatus of claim 11 , wherein:
the first implant member includes a curved surface configured to contact an inferior surface of the first spinous process; and
the second implant member includes a curved surface configured to contact a superior surface of the second spinous process.
13 . The apparatus of claim 11 , wherein:
the first implant member includes a retention surface configured to contact a side surface of the first spinous process; and
the second implant member includes a retention surface configured to contact a side surface of the first spinous process,
the retention surface of the first implant member and the retention surface of the second implant member configured to collectively limit lateral movement of the implant relative to the first spinous process and the second spinous process.
14 . The apparatus of claim 11 , wherein the second implant member is configured to translate relative to the first implant member.
15 . The apparatus of claim 11 , wherein a portion of the second implant member is slidably disposed within the first implant member.
16 . The apparatus of claim 11 , wherein the second implant member includes a first portion and a second portion rotatably coupled to the first portion.
17 . The apparatus of claim 11 , wherein the first implant member has an actuation portion defining an opening therethrough, the opening configured to receive an actuator to move the first implant member relative to the second implant member.
18 . An apparatus, comprising:
a first implant member having a first portion and a second portion, the first portion of the first implant member configured to contact a first spinous process, the second portion of the first implant member defining an opening; and
a second implant member having a first portion and a second portion, the first portion of the second implant member configured to contact a second spinous process, the second portion of the second implant member being slidably disposed within the opening of the second portion of the first implant member.
19 . The apparatus of claim 18 , wherein the first portion of the second implant member is configured to translate relative to the first portion of the first implant member to increase a space between the first spinous process and the second spinous process.
20 . The apparatus of claim 18 , wherein the first portion of the first implant member and the first portion of the second implant member are collectively configured to limit extension of a spinal column including the first spinous process and the second spinous process, and are collectively configured to allow flexion of the spinal column.
21 . The apparatus of claim 18 , wherein the first portion of the first implant member is configured to rotate relative to the second portion of the first implant member.
22 . The apparatus of claim 18 , wherein:
the first portion of the first implant member includes a curved surface configured to contact an inferior surface of the first spinous process; and
the first portion of the second implant member includes a curved surface configured to contact a superior surface of the second spinous process.
23 . The apparatus of claim 18 , wherein:
the opening defined by the second portion of the first implant member is a first opening; and
the second portion of the first implant member defines a second opening configured to receive an actuator to move the first implant member relative to the second implant member.
24 . A method, comprising:
inserting an implant having a first support member and a second support member such that at least a portion of the first support member and at least a portion of the second support member are disposed within a space between a first spinous process and a second spinous process; and
moving the second support member relative to the first support member to maintain a distance between the first spinous process and the second spinous process.
25 . The method of claim 24 , wherein the moving includes translating the second support member relative to the first support member.
26 . The method of claim 24 , wherein:
the inserting includes inserting the implant such that a first surface of the first support member contacts an inferior surface of the first spinous process and a second surface of the first support member contacts a side surface of the first spinous process; and
the inserting includes inserting the implant such that a first surface of the second support member contacts a superior surface of the second spinous process and a second surface of the second support member contacts a side surface of the second spinous process.
27 . The method of claim 24 , wherein the moving includes sliding a portion of the second support member within a portion of the first support member.
28 . The method of claim 24 , wherein the moving includes distracting the first spinous process and the second spinous process such that the distance between the first spinous process and the second spinous process is at least 5 mm.
29 . The method of claim 24 , further comprising:
distracting the first spinous process and the second spinous process before the inserting such that the distance between the first spinous process and the second spinous process is at least 5 mm.
30 . The method of claim 24 , further comprising:
distracting the first spinous process and the second spinous process before the inserting such that the distance between the first spinous process and the second spinous process is at least 22 mm.
31 . The method of claim 24 , wherein the moving includes:
inserting a portion of an actuator into an opening defined by the first support member; and
moving the first support member relative to the second support member via the actuator.
32 . A method, comprising:
inserting an implant having a first implant member and a second implant member such that a first portion of the first implant member and a first portion of the second implant member are disposed within a space between a first spinous process and a second spinous process; and
moving a second portion of the first implant member about a second portion of the second implant member such that the space between the first spinous process and the second spinous process is increased.
33 . The method of claim 32 , wherein:
the second portion of the first implant member defines an opening; and
at least a portion of the second portion of the second implant member is slidably disposed within the opening.
34 . The method of claim 32 , wherein:
the inserting includes inserting the implant such that the first portion of the first implant member contacts an inferior surface of the first spinous process and the first portion of the second implant member contacts a superior surface of the second spinous process.
35 . The method of claim 32 , wherein the moving includes translating the first portion of the first implant member relative to the first portion of the second implant member.
36 . The method of claim 32 , wherein
the moving includes inserting a portion of an actuator into an opening defined by the second portion of the first implant member; and
moving the first implant member relative to the second implant member via the actuator.
37 . The method of claim 32 , wherein:
the moving includes distracting the space between the first spinous process and the second spinous process a distance of at least 5 mm.
38 . The method of claim 32 , wherein the moving includes:
moving, at a first time, the second portion of the first implant member about the second portion of the second implant member such that the space between the first spinous process and the second spinous process is distracted by a first distance; and
moving, at a second time, the second portion of the first implant member about the second portion of the second implant member such that the space between the first spinous process and the second spinous process is distracted by a second distance greater than the first distance.