INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
1 . An apparatus comprising:
an implant having a central portion and a distal end portion, at least a portion of the central portion configured to be disposed between a pair of adjacent spinous processes; and
a retention member rotatably coupled to the distal end portion of the implant, the distal end portion of the implant configured to dilate a bodily tissue when the retention member is in a first position, the retention member configured to limit lateral movement of the implant relative to the adjacent spinous processes when the retention member is in a second position,
the retention member configured to contact a guide portion of the distal end portion of the implant when the retention member is moved between the first position and the second position.
2 . The apparatus of claim 1 , wherein at least a portion of the retention member is moved towards the guide portion of the distal end portion of the implant when the retention member is moved from the first position to the second position.
3 . The apparatus of claim 1 , further comprising:
a translatable member movably coupled to the distal end portion of the implant, the retention member is rotatably coupled to the translatable member such that the retention member is moved from the first position to the second position when the translatable member is moved towards the guide portion.
4 . The apparatus of claim 1 , wherein the retention member includes a curved surface configured to slidably move along the guide portion of the distal end portion such that the retention member translates and rotates when the retention member is moved between the first position and the second position.
5 . The apparatus of claim 1 , wherein the retention member is configured to pivotally move about the guide portion when the retention member is moved between the first position and the second position.
6 . The apparatus of claim 1 , wherein the guide portion is a pin disposed within the distal end portion.
7 . The apparatus of claim 1 , further comprising:
an actuator coupled to the distal end portion of the implant and configured to move the retention member between the first position and the second position.
8 . The apparatus of claim 1 , wherein the implant has a proximal end portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.
9 . The apparatus of claim 1 , farther comprising:
a rotatable member coupled to the distal end portion of the implant and configured to matingly receive a tool inserted in a posterior-anterior direction, the rotatable member configured to rotate and move the retention member between the first position and the second position when activated by the tool.
10 . The apparatus of claim 1 , further comprising:
an actuator having a rotatable member, at least a portion of the rotatable member disposed within the implant, the actuator configured to slidably move the retention member along the guide portion when the portion of the central portion of the implant is disposed between the pair of adjacent spinous processes
11 . An apparatus comprising:
an implant having a central portion and a distal end portion, at least a portion of the central portion configured to be disposed between a pair of adjacent spinous processes;
a translatable member movably coupled to the distal end portion of the implant; and
a retention member rotatably coupled to the translatable member, the retention member configured to slidably move along a contact portion of the distal end portion of the implant when the translatable member is moved towards the contact portion of the distal end portion of the implant.
12 . The apparatus of claim 11 , wherein the translatable member is configured to translate in a direction non-parallel to an axis substantially lateral to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.
13 . The apparatus of claim 11 , further comprising:
an actuator including the translatable member threadedly coupled to a rotatable member, the rotatable member configured to move the translatable member within the implant member such that the retention member is slidably moved along the contact portion of the distal end portion of the implant.
14 . The apparatus of claim 11 , wherein the translatable member is configured to translate within the implant member along an axis non-parallel to a lateral axis defined by the pair of adjacent spinous processes.
15 . The apparatus of claim 11 , wherein the retention member is moved from a first position to a second position when the translatable member is moved towards the contact portion of the distal end portion of the implant, the distal end portion of the implant is configured to dilate a bodily tissue when the retention member is in the first position, the retention member is configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when in the second position.
16 . The apparatus of claim 11 , wherein the contact portion is a pin disposed within the distal end portion.
17 . The apparatus of claim 11 , wherein the retention member has a curved surface configured to slidably move along the contact portion of the distal end portion such that the retention member rotates when the translatable member is moved towards the contact portion of the distal end portion of the implant.
18 . The apparatus of claim 11 , wherein the retention member and the translatable member are configured to move within a plane non-parallel to an axis substantially lateral relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.
19 . The apparatus of claim 11 , wherein the retention member is configured to slidably move along the contact portion of the distal end portion of the implant when the translatable member is moved away from the contact portion of the distal end portion of the implant.
20 . The apparatus of claim 11 , wherein the implant has a proximal end portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.
21 . A method, comprising:
inserting into a patient's body an implant having a central portion and a distal end portion, the distal end portion including a contact portion and being coupled to a retention member;
disposing at least a portion of the central portion between a pair of adjacent spinous processes when the retention member is in a first position; and
sliding the retention member along the contact portion of the distal end portion of the implant such that the retention member moves between the first position and a second position, the retention member configured to limit lateral movement of the central portion relative to the pair of adjacent spinous processes when the retention member is in the second position.
22 . The method of claim 21 , wherein the sliding includes sliding at least a portion of the retention member towards the contact portion of the distal end portion of the implant when retention member is moved from the first position to the second position.
23 . The method of claim 21 , further comprising:
rotating the retention member about a first axis non-parallel to a second axis substantially lateral to the pair of adjacent spinous processes when the central portion is disposed between the pair of adjacent spinous processes and in response to the sliding.
24 . The method of claim 21 , wherein the retention member is rotatably coupled to the distal end portion of the implant.
25 . The method of claim 21 , wherein the retention member is configured to rotate about a first axis,
the method further comprising:
rotating an actuator about a second axis substantially normal to the first axis such that the retention member is rotated about the first axis in response to the rotating the actuator.
26 . The method of claim 21 , further comprising:
rotating an actuator about a first axis non-parallel to a second axis substantially lateral to the pair of adjacent spinous processes when the central portion is disposed between the pair of adjacent spinous processes, the sliding being in response to the rotating the actuator.
27 . The method of claim 21 , wherein the retention member is rotatably coupled to a translating member movably coupled to the distal end portion of the implant, the sliding includes sliding the retention member via the translating member.
28 . The method of claim 21 , further comprising:
moving a translatable member movably coupled to the distal end portion of the implant in a direction non-parallel to an axis substantially lateral to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes, the retention member being rotatably coupled to the translating member such that the sliding the retention member being in response to the moving the translatable member.
29 . The method of claim 21 , wherein the contact portion is a pin disposed within the distal end portion of the implant.
30 . The method of claim 21 , further comprising:
dilating a bodily tissue when the retention member is in the first position.
31 . The method of claim 21 , wherein the sliding includes sliding a curved surface of the retention member against the contact portion of the distal end portion such that the retention member rotates between the first position and the second position.
32 . The method of claim 21 , wherein the implant has a proximal end portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.