Interspinous process implants and methods of use
View Patent ↗Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
1. An apparatus, comprising:
a central body having an elongate member and a retention member, a first portion of the retention member being anchored and rotationally fixed to the elongate member, at least a portion of the elongate member configured to be disposed between a pair of adjacent spinous processes;
a movable member anchored and rotationally fixed to a second portion of the retention member of the central body, the retention member being collapsed from a first configuration to a second configuration different than the first configuration when the movable member is moved proximally relative to the elongate member of the central body; and
the first and second portions of the retention member being anchored and rotationally fixed to the elongate member and the movable member respectively when the retention member is in both the first and second configurations.
2. The apparatus of claim 1 , wherein the second portion of the retention member of the central body is different than the first portion of the retention member of the central body.
3. The apparatus of claim 1 , wherein at least a portion of the movable member is configured to slidably move within an interior portion of the central body.
4. The apparatus of claim 1 , wherein the movable member has a distal portion and a proximal portion, the second portion of the retention member of the central body is anchored and rotationally fixed to the distal portion of the movable member.
5. The apparatus of claim 1 , wherein the elongate member has a distal portion and a proximal portion, the first portion of the retention member of the implant is anchored and rotationally fixed to the distal portion of the central body.
6. The apparatus of claim 1 , wherein a length of the retention member when the retention member is in the first configuration is different than a length of the retention member when the retention member is in the second configuration.
7. The apparatus of claim 1 , further comprising:
a spacer configured to be coupled to the central body so as to extend through a sagittal plane defined by the adjacent spinous processes after the elongate member of the central body is disposed between the pair of adjacent spinous processes.
8. The apparatus of claim 1 , further comprising:
a spacer configured to be coupled to the central body so as to extend through a sagittal plane defined by the adjacent spinous processes after the elongate member of the central body is disposed between the pair of adjacent spinous processes, a central portion of the spacer configured to define a minimal extension between the pair of adjacent spinous processes.
9. The apparatus of claim 1 , wherein the retention member is spiraled.
10. The apparatus of claim 1 , wherein the retention member is a spiraled member configured to move the elongate member of the central body relative to the pair of adjacent spinous processes when at least a portion of the spiraled member is rotated between the pair of adjacent spinous processes.
11. The apparatus of claim 1 , wherein the central body is a first central body having a proximal end portion configured to movably mate with a second central body.
12. The apparatus of claim 1 , wherein the retention member has a helical portion defining a gap when the retention member is in the first configuration, the helical portion being devoid of a gap when the retention member is in the second configuration.
13. The apparatus of claim 1 , wherein the retention member has a helical portion defining a gap, a size of the gap when the retention member is in the first configuration being greater than a width of a spinous process from the pair of adjacent spinous processes, a size of the gap when the retention member is in the second configuration being less than a width of the spinous process from the pair of adjacent spinous processes.
14. The apparatus of claim 1 , wherein a size of the retention member along an axis substantially normal to a longitudinal axis of the central body when the retention member is in the first configuration is substantially equal to a size of the retention member along the axis substantially normal to the longitudinal axis of the central body when the retention member is in the second configuration.
15. The apparatus of claim 1 , wherein the retention member is configured to be moved through a space between the pair of adjacent spinous processes when the retention member is in the first configuration, the retention member has a diameter greater than a size of the space between the pair of adjacent spinous processes when the retention member is in the first configuration.
16. The apparatus of claim 1 , wherein the first portion of the retention member is configured to contact a first spinous process from the pair of adjacent spinous processes when a portion of the elongate member is disposed between the pair of adjacent spinous processes and when the retention member is in the second configuration.
17. An apparatus, comprising:
an implant having a retention portion and a central portion, at least a portion of the central portion configured to be disposed between a pair of adjacent spinous processes; the implant further having a wing; wherein the central portion is disposed between the wing and the retention portion;
the retention portion configured to be inserted between the pair of adjacent spinous processes when in a first configuration, the retention portion configured to be collapsed from the first configuration to a second configuration, the retention portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when in the second configuration, a distance from a longitudinal axis of the implant to an edge of the retention member being substantially the same in the first configuration and the second configuration;
wherein the wing remains in the same position relative to the central portion as the retention member moves between the first and second configurations;
wherein a longitudinal length of the implant is different when the retention portion is in the first configuration than when the retention portion is in the second configuration.
18. The apparatus of claim 17 , wherein the distance is along an axis substantially parallel to a midline axis defined by the adjacent spinous processes when the central portion of the implant is disposed between the pair of adjacent spinous processes.
19. The apparatus of claim 17 , wherein the implant is a first implant,
the apparatus further comprising:
a second implant configured to be coupled to the first implant so as to extend through a sagittal plane defined by the adjacent spinous processes after the central portion of the first implant is disposed between the pair of adjacent spinous processes, a central portion of the second implant configured to define a minimal extension between the pair of adjacent spinous processes.
20. The apparatus of claim 17 , wherein the central portion of the implant is configured to be moved distally relative to the pair adjacent spinous processes along a lateral axis defined by the pair of adjacent spinous processes when the retention portion of the implant is disposed between the pair of adjacent spinous processes in the first configuration, and when the retention portion is rotated about the lateral axis defined by the pair of adjacent spinous processes.
21. The apparatus of claim 17 , wherein the retention portion is spiraled.
22. The apparatus of claim 17 , wherein the retention portion has a helical member defining a gap when the retention portion is in the first configuration, the helical member being devoid of a gap when the retention portion is in the second configuration.
23. The apparatus of claim 17 , when retention portion has a helical member, a first surface of the helical member spaced apart from a second surface of the helical member when the retention portion of the implant is in the first configuration, the first surface of the helical member in contact with the second surface of the helical member when the retention portion of the implant is in the second configuration.
24. The apparatus of claim 17 , wherein a first portion of the retention portion is configured to contact a first spinous process from the pair of adjacent spinous processes when a portion of the central portion is disposed between the pair of adjacent spinous processes and when the retention portion is in the second configuration.
25. An apparatus, comprising:
an implant having a retention portion and a central portion, at least a portion of the central portion configured to be disposed between a pair of adjacent spinous processes; the implant further having a wing: wherein the central portion is disposed between the wing and the retention portion;
the retention portion configured to be inserted between the pair of adjacent spinous processes when in a first configuration, the retention portion configured to be collapsed from the first configuration to a second configuration, the retention portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when in the second configuration, a distance from a longitudinal axis of the implant to an edge of the retention member being substantially the same in the first configuration and the second configuration;
wherein the wing remains in the same position relative to the central portion as the retention member moves between the first and second configurations;
wherein the implant is configured such that a distal end of the retention portion of the implant is moved proximally relative to a proximal end of the retention portion when the retention portion of the implant is collapsed from the first configuration to the second configuration.
26. An apparatus, comprising:
an implant having a retention portion and a central portion, at least a portion of the central portion configured to be disposed between a pair of adjacent spinous processes; the implant further having a wing; wherein the central portion is disposed between the wing and the retention portion;
the retention portion configured to be inserted between the pair of adjacent spinous processes when in a first configuration, the retention portion configured to be collapsed from the first configuration to a second configuration, the retention portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when in the second configuration, a distance from a longitudinal axis of the implant to an edge of the retention member being substantially the same in the first configuration and the second configuration;
wherein the wing remains in the same position relative to the central portion as the retention member moves between the first and second configurations;
a movable member having a first portion slidably disposed within the central portion of the implant and a second portion coupled to the retention portion of the implant;
wherein the implant is configured such that the retention portion of the implant is collapsed from the first configuration to the second configuration when the first portion of the movable member is moved proximally within the central portion of the implant.