IP Library Patent Application 11781690
Patent Application
App. No. 11/781,690

ALIGNED POLYMERS FOR AN ORGANIC TFT

Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US None
App. No.
11/781,690
Abstract

A method for forming an electronic device having a semiconducting active layer comprising a polymer, the method comprising aligning the chains of the polymer parallel to each other by bringing the polymer into a liquid-crystalline phase.

Claims (9)

1 . A method for forming a transistor comprising the step of forming an active interface of the transistor between a semiconductive layer and a gate insulator layer by solution deposition of a second polymer layer on top of a solution-processed polymer layer that has not been converted into an insoluble form prior to the deposition of the second polymer layer.

2 . A method as claimed in claim 1 wherein the second layer forms the gate insulator of the transistor.

3 . A method as claimed in claim 1 , wherein the second layer comprises PVP.

4 . A method as claimed in claim 1 , wherein the said semiconductive layer is the said solution-processed polymer layer.

5 . A method as claimed in claim 1 , wherein the said solution-processed polymer layer is soluble in a non-polar organic solvent, but is insoluble in a polar solvent.

6 . A method as claimed in claim 57 wherein the second polymer layer is deposited from a polar organic solvent, in which the said solution-processed polymer layer is not soluble.

7 . A method as claimed in claim 1 , wherein the second polymer layer is deposited from an alcohol, a protic polar solvent such as water or an aprotic polar solvent such as DMF.

8 . A method as claimed in claim 1 , wherein a source-drain and/or gate electrode of the transistor is also formed from solution.

9 . A method according to claim 1 , wherein the second layer is the gate insulator layer, and the solution-processed polymer layer is a uniaxially aligned liquid crystal polymer film.

Assignments (2)
RELEASE OF SECURITY INTEREST Recorded May 12, 2011
From: STATE CORPORATION "RUSSIAN CORPORATION OF NANOTECHNOLOGIES"
To: PLASTIC LOGIC LIMITED
Reel/Frame 026271/0377 →
SECURITY AGREEMENT Recorded Aug 3, 2010
From: PLASTIC LOGIC LIMITED
To: STATE CORPORATION "RUSSIAN CORPORATION OF NANOTECHNOLOGIES"
Reel/Frame 024776/0357 →