IP Library Granted Patent US 7,326,286
Granted Patent B2
US 7,326,286 · App. 11/783,320 · Granted Feb 5, 2008

Exhaust gas treating tower

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Quick Facts
Patent No.
US 7,326,286
App. No.
11/783,320
Granted
Feb 5, 2008
Kind
B2
Abstract

Provided is an exhaust gas treating tower in which exhaust gas flow velocity is increased more than a prior art case so that exhaust gas treating efficiency can be enhanced or the exhaust gas treating tower can be made compact if equivalent performance is to be maintained. Also, an exhaust gas treating tower ensuring a liquid recovery is provided. In an exhaust gas treating tower 10 A, liquid columns C are generated and also a liquid drop generating member 20 is provided to thereby generate liquid drops M therearound to be floated. Also, liquid is spouted from spray nozzles to thereby generate liquid films F in area different from the liquid columns C. In an exhaust gas treating tower 110 , a liquid drop eliminator 120 is provided upstream of a mist eliminator 118 . Interval P 1 of collecting plates 121 of the liquid drop eliminator 120 is made larger than interval P 2 of collecting plates 119 of the mist eliminator 118 . Thereby, liquid drops having larger particle diameter contained in the exhaust gas are collected by the liquid drop eliminator 120.

Claims (9)

1. An exhaust gas treating tower comprising a tower body in which exhaust gas introduced from below is discharged outside from above, wherein said exhaust gas treating tower comprises

a first substance removing means for generating liquid columns in said tower body by spouting liquid upward from below in a column shape so that, by said exhaust gas making contact with said liquid columns, a substance contained in said exhaust gas is removed and

a second substance removing means, provided in an area different from said liquid columns generated in said first substance removing means, said second substance removing means including a plurality of nozzles that generate liquid films by spouting the liquid in an umbrella shape, wherein said nozzles are disposed such that said liquid films generated by said nozzles lap on said liquid films generated by adjacent ones of said nozzles so that no gap is generated therebetween.

2. An exhaust gas treating tower as claimed in claim 1 , wherein an inlet port of said exhaust gas is provided in a side wall of said tower body below both of said first and second substance removing portions.

3. An exhaust gas treating tower as claimed in claim 1 , wherein said nozzles are provided in a piping that supplies the liquid for generating said liquid columns in said first substance removing portion.

4. An exhaust gas treating tower as claimed in claim 1 , wherein there is further provided a pump for pressurizing the liquid to be spouted from said nozzles.

5. An exhaust gas treating tower as claimed in claim 1 , wherein a collision member with which the liquid falling down from said liquid columns generated in said first substance removing portion or said liquid films generated by said nozzles collides so that liquid drops are generated is provided as said second substance removing portion.

6. An exhaust gas treating tower as claimed in claim 5 , wherein said collision member comprises a wall surface extending in an upward and downward direction of said tower body so that the liquid drops generated by said collision member are retained in the vicinity of said wall surface by friction force with said wall surface.

7. The exhaust gas treating tower of claim 1 , wherein said second substance removing means is located below said first substance removing means.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 26, 2015
From: MITSUBISHI HEAVY INDUSTRIES, LTD.
To: MITSUBISHI HITACHI POWER SYSTEMS, LTD.
Reel/Frame 035101/0029 →