Liquid crystal display device and method of manufacturing the same

1. A liquid crystal display device comprising:

a first substrate;

a second substrate facing the first substrate; and

a liquid crystal layer interposed between the first substrate and the second substrate,

wherein a reflective region and a transmissive region are provided to a pixel, the pixel having a pixel electrode consisting of a reflective electrode of the reflective region and a transmissive electrode of the transmissive region, which are provided on the first substrate, the reflective electrode being formed on an uneven layer made of an organic film and the transmissive region including a protrusion formed of the same organic film material as the uneven layer to cause alignment of liquid crystal molecules in the liquid crystal layer to be spatially divided into multiple domains; wherein thickness of the liquid crystal layer in the reflective region and thickness thereof in the transmissive region are different from each other,

wherein the uneven layer of the reflective region is also used as a liquid-crystal layer-thickness adjusting layer to cause the thickness of the liquid crystal layer in the reflective region and the thickness thereof in the transmissive region to be different from each other.

2. The liquid crystal display device according to claim 1 , wherein the liquid crystal layer is formed of liquid crystals with negative dielectric anisotropy.

3. The liquid crystal display device according to claim 1 , wherein the protrusion is disposed under the transmissive electrode.

4. The liquid crystal display device according to claim 1 , wherein the protrusion is disposed on the transmissive electrode.

5. The liquid crystal display device according to claim 1 , wherein height of the uneven layer and height of the protrusion are different from each other.

6. The liquid crystal display device according to claim 1 , wherein height of the uneven layer is higher than that of the protrusion.

7. The liquid crystal display device according to claim 1 , wherein the thickness of the liquid crystal layer of the reflective region is about half the thickness of the transmissive region.

8. The liquid crystal display device according to claim 1 , wherein the protrusion has one shape of a hemisphere and a square pyramid.

9. The liquid crystal display device according to claim 1 , wherein the organic film material is formed of a photosensitive organic film.

10. The liquid crystal display device according to claim 1 , wherein the transmissive electrode has a shape in which symmetric shapes are connected to each other.

11. A method of manufacturing the liquid crystal display device as claimed according to claim 1 , the method comprising:

forming the transmissive electrode made of a transmission conductive film on the first substrate;

forming a photosensitive organic film on the first substrate;

developing the photosensitive organic film after exposing by using a photomask, thereby concurrently forming an uneven layer and a protrusion formed of the photosensitive organic film respectively in an area of the reflective region and in an area of the transmissive region on the substrate; and

forming a reflective electrode made of a metallic film on the uneven layer.

12. The method of manufacturing the liquid crystal display device according to claim 11 , wherein the uneven layer and the protrusion are formed to have heights different from each other by exposing the uneven layer and the protrusion to different accumulated amounts of light, respectively.

13. The method of manufacturing the liquid crystal display device according to claim 11 , wherein a part of the photomask includes a semitransparent film.

14. The method of manufacturing the liquid crystal display device according to claim 11 , wherein light transmittance of a part of the semitransparent film of the photomask, which corresponds to the uneven layer are different from light transmittance of another part thereof, which corresponds to the protrusion.

15. The method of manufacturing the liquid crystal display device according to claim 11 , wherein a part of the photomask includes a mask pattern having pattern width less than a limit of resolution for exposure.

16. The method of manufacturing the liquid crystal display device according to claim 11 , wherein, while the metallic film is formed on the uneven layer, a metallic film of the same material as that of the metallic film on the uneven layer is concurrently formed on the protrusion.

17. A method of manufacturing the liquid crystal display device as claimed according to claim 1 , the method comprising:

forming a photosensitive organic film on the first substrate;

developing the photosensitive organic film after exposing by using a photomask, thereby concurrently forming an uneven layer and a protrusion formed of the photosensitive organic film respectively in an area of the reflective region and in an area of the transmissive region on the first substrate;

forming a transmissive electrode made of a transmission conductive film on the transmissive region; and

forming a reflective electrode made of a metallic film on the uneven layer.

18. The method of manufacturing the liquid crystal display device according to claim 17 , wherein the uneven layer and the protrusion are respectively formed to have heights different from each other by exposing the uneven layer and the protrusion respectively with estimated amounts of light exposure which are different from each other.

19. The method of manufacturing the liquid crystal display device according to claim 17 , wherein a part of the photomask includes a semitransparent film.

20. The method of manufacturing the liquid crystal display device according to claim 17 , wherein light transmittance of a part of the semitransparent film of the photomask, which corresponds to the uneven layer, and light transmittance of another part thereof, which corresponds to the protrusion, are different from each other.

21. The method of manufacturing the liquid crystal display device according to claim 17 , wherein a part of the photomask includes a mask pattern having pattern width less than a limit of resolution for exposure.