Semiconductor device including triple-stacked structures having the same structure

1. A semiconductor device, comprising:

at least one capacitor;

at least one resistor;

a plurality of triple-stacked structures all having the same structure, each of said triple-stacked structures comprising one lower electrode layer, at least one upper electrode layer and one dielectric layer sandwiched by said lower electrode layer and said upper electrode layer;

a first via structure connected to an end of said at least one upper electrode layer;

a second via structure connected to an end of said one lower electrode layer;

a conductive pattern layer above the first via structure and the second via structure; and

a third via structure,

wherein a size of said lower electrode layer of each of said plurality of triple-stacked structures is the same with each other,

wherein said at least one capacitor includes one of said plurality of triple-stacked structures,

wherein said at least one resistor includes another one of said plurality of triple-stacked structures,

wherein the conductive pattern layer is adapted to connect the first via structure to the second via structure, and

wherein the conductive pattern layer is also adapted to connect the third via structure with the first via structure and the second via structure.

2. The semiconductor device as set forth in claim 1 , wherein said lower electrode layer of each of said triple-stacked structures is located on a first plane of said semiconductor device, and said upper electrode layer of each of said triple-stacked structures is located on a second plane of said semiconductor device.

3. The semiconductor device as set forth in claim 1 , wherein said dielectric layers of said triple-stacked structures comprise a single dielectric layer.

4. The semiconductor device as set forth in claim 1 , wherein said at least one capacitor includes connections connected to the lower electrode layer and upper electrode layer of said one of said plurality of triple-stacked structures.

5. The semiconductor device as set forth in claim 1 , wherein said at least one resistor includes connections connected to at least one of the lower electrode layer and upper electrode layer of said another one of said plurality of triple-stacked structures.

6. The semiconductor device as set forth in claim 1 , further comprising:

a plurality of conductive pattern layers connected to said first via structure and said second via structure so that said at least one capacitor is realized by connecting at least two of said conductive pattern layers to said lower electrode layer and said upper electrode layer, respectively, of said one of said plurality of triple-stacked structures, and said at least one resistor is realized by connecting at least two of said conductive pattern layers to at least one of said lower electrode layer and said upper electrode layer of said another one of said plurality of triple-stacked structures.

7. The semiconductor device as set forth in claim 6 , further comprising:

a common-use section including various kinds of semiconductor transistor circuits; and

a customized section formed on said common-use section, said customized section including said triple-stacked structures, said first and second via structures and said conductive pattern layers,

said common-use section and said customized section further including said third via structure connected to said semiconductor transistor circuits and to said conductive pattern layers.

8. The semiconductor device as set forth in claim 6 , further comprising:

a common-use section including various kinds of semiconductor transistor circuits, said common-use section further including said triple-stacked structures and said first and second via structures; and

a customized section formed on said common-use section, said customized section including said conductive pattern layers,

said common-use section and said customized section further including said third via structure connected to said semiconductor transistor circuits and to said conductive pattern layers.

9. The semiconductor device as set forth in claim 1 , wherein said lower electrode layer is outwardly protruded from said upper electrode layer.

10. The semiconductor device as set forth in claim 1 , wherein said lower electrode layer and said upper electrode layer are both elongated,

said semiconductor device further comprising:

a pair of first via structures each connected to one longitudinal side of said lower electrode layer; and

a pair of second via structures each connected to one longitudinal side of said upper electrode layer.

11. The semiconductor device as set forth in claim 1 , wherein said triple-stacked structures are elongated, and some of said triple-stacked structures are arranged in parallel with each other.

12. The semiconductor device as set forth in claim 1 , wherein said triple-stacked structures are arranged in rows, columns.

13. The semiconductor device as set forth in claim 1 , where a size of said upper electrode layer of each of said plurality of triple-stacked structures is the same with each other.

14. The semiconductor device as set forth in claim 1 , further comprising:

a fourth via structure; and

a second conductive pattern layer connecting said fourth via structure with said third via structure.

15. The semiconductor device as set forth in claim 1 , wherein the plurality of triple-stacked structures are arranged in parallel with each other.