IP Library Granted Patent US 7,800,167
Granted Patent B2
US 7,800,167 · App. 11/802,917 · Granted Sep 21, 2010

Semiconductor device, battery protection circuit and battery pack

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Quick Facts
Patent No.
US 7,800,167
App. No.
11/802,917
Granted
Sep 21, 2010
Kind
B2
Abstract

A bidirectional Trench Lateral Power MOSFET (TLPM) can achieve a high breakdown voltage and a low on-resistance. A plurality of straight-shaped islands having circular portions at both ends are surrounded by a trench arrangement. The islands provide first n source regions and a second n source region is formed on the outside of the islands. With such a pattern, the breakdown voltage in the case where the first n source regions are at a high potential can be higher than the breakdown voltage in the case where the second n source region is at a high potential. Alternatively, in the case of not changing the breakdown voltage, the on-resistance can be reduced.

Claims (48)

1. A semiconductor device, comprising:

a semiconductor member having a trench that extends to a common drain region at a bottom of the trench, the trench having first and second sidewalls, the member having first and second base regions of a first conductivity type adjacent the bottom of the trench and disposed at the first and second sidewalls of the trench respectively, the member additionally having first and second source regions of a second conductivity type, the first and second source regions being disposed at the first and second sidewalls of the trench respectively and on the first and second base regions respectively, the first and second source regions having first and second contact regions respectively;

a first gate insulating film portion on the first sidewall of the trench;

a first gate electrode on the first gate insulating film portion;

a first source electrode connected to the first contact region;

a second gate insulating film portion on the second sidewall of the trench;

a second gate electrode on the second gate insulating film portion; and

a second source electrode connected to the second contact region,

wherein a first transistor that is controlled by the first gate electrode has a breakdown voltage that is different from a breakdown voltage of a second transistor that is controlled by the second gate electrode, and

wherein the trench follows a closed path that has first and second straight portions with ends, and first and second curved portions that join the ends of the first and second straight portions.

2. A semiconductor device according to claim 1 , wherein the first conductivity type is p, the second conductivity type is n, and the trench extends around an island, the first base region and the first source region being located in the island.

3. A semiconductor device according to claim 2 , wherein the second source electrode of the semiconductor device is connected to a minus terminal of a battery.

4. A semiconductor device, comprising:

a semiconductor member having a trench that extends to a common source region at a bottom of the trench, the trench having first and second sidewalls, the member having first and second base regions of a first conductivity type adjacent the bottom of the trench and disposed at the first and second sidewalls of the trench respectively, the member additionally having first and second drain regions of a second conductivity type, the first and second source regions being disposed at the first and second sidewalls of the trench respectively and on the first and second base regions respectively, the first and second drain regions having first and second contact regions respectively;

a first gate insulating film portion on the first sidewall of the trench;

a first gate electrode on the first gate insulating film portion;

a first drain electrode connected to the first contact region;

a second gate insulating film portion on the second sidewall of the trench;

a second gate electrode on the second gate insulating film portion; and

a second drain electrode connected to the second contact region,

wherein a first transistor that is controlled by the first gate electrode has a breakdown voltage that is different from a breakdown voltage of a second transistor that is controlled by the second gate electrode,

wherein the trench follows a closed path that has first and second straight portions with ends, and first and second curved portions that join the ends of the first and second straight portions, and

wherein the first conductivity type is p, the second conductivity type is n, and the trench extends around an island, the second base region and the second source region being located in the island.

5. A semiconductor device according to claim 4 , wherein the second drain electrode of the semiconductor device is connected to a minus terminal of a battery.

6. A battery pack comprising the semiconductor device according to claim 1 , and further comprising:

a control circuit connected to the semiconductor device; and

a battery having a minus terminal that is connected to the second source electrode of the semiconductor device,

wherein the battery pack has a minus terminal that is connected to the first source electrode of the semiconductor device.

7. A semiconductor device, comprising:

a semiconductor member having a trench that extends to a common source region of a first conductivity type at a bottom of the trench, the trench having first and second sidewalls, the member having first and second base regions of a second conductivity type adjacent the bottom of the trench and disposed at the first and second sidewalls of the trench respectively, the member additionally having first and second drain regions of a second conductivity type, the first and second drain regions being disposed at the first and second sidewalls of the trench respectively and on the first and second base regions respectively, the member further having a base contact region;

a first gate insulating film portion on the first sidewall of the trench;

a first gate electrode on the first gate insulating film portion;

a first principle electrode connected to the first drain region;

a second gate insulating film portion on the second sidewall of the trench;

a second gate electrode on the second gate insulating film portion;

a second principle electrode connected to the second drain region; and

a conductive film connected to the common source and the base contact region,

wherein a first transistor that is controlled by the first gate electrode has a breakdown voltage that is different from a breakdown voltage of a second transistor that is controlled by the second gate electrode, and

wherein the trench follows a closed path that has first and second straight portions with ends, and first and second curved portions that join the ends of the first and second curved portions.

8. A semiconductor device according to claim 7 , wherein the first conductivity type is n, the second conductivity type is p, and the trench extends around an island, the second base region and the second drain region being located in the island.

9. A semiconductor device according to claim 8 , wherein the second principle electrode of the semiconductor device is connected to a minus terminal of a battery.

10. A semiconductor device according to claim 7 , wherein the first conductivity type is n, the second conductivity type is p, and the trench extends around an island, the first base region and the first drain region being located in the island.

11. A semiconductor device according to claim 7 , wherein the second principle electrode of the semiconductor device is connected to a minus terminal of a battery.

12. A battery pack comprising the semiconductor device according to claim 4 , and further comprising:

a control circuit connected to the semiconductor device; and

a battery having a minus terminal that is connected to the second drain electrode of the semiconductor device,

wherein the battery pack has a minus terminal that is connected to the first drain electrode of the semiconductor device.

13. A semiconductor device according to claim 1 , wherein the substrate has the first conductivity type and is provided with a well region of the second conductivity type, and wherein the common drain region is disposed in the well region and has the second conductivity type.

Assignments (3)
MERGER AND CHANGE OF NAME Recorded Aug 26, 2011
From: FUJI ELECTRIC SYSTEMS CO., LTD. (FES); FUJI TECHNOSURVEY CO., LTD. (MERGER BY ABSORPTION)
To: FUJI ELECTRIC CO., LTD.
Reel/Frame 026970/0872 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 20, 2010
From: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.
To: FUJI ELECTRIC SYSTEMS CO., LTD.
Reel/Frame 024252/0438 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2007
From: KITAMURA, MUTSUMI; SUGI, AKIO; FUJISHIMA, NAOTO; MATSUNAGA, SHINICHIRO
To: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD
Reel/Frame 019596/0763 →