Interspinous process implants and methods of use
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
1 . An apparatus, comprising:
a first implant member configured to be inserted into a location of a body including a space between adjacent spinous processes, the first implant member defining a saddle associated with a first spinous process from the adjacent spinous processes; and
a second implant member configured to be inserted into the body and slidably moved along the first implant member until a central portion of the second implant member is substantially aligned with a central portion of the first implant member, the second implant member defining a saddle associated with a second spinous process from the adjacent spinous processes.
2 . The apparatus of claim 1 , wherein:
the central portion of the first implant member and the central portion of the second implant member are collectively configured to limit extension of a spine including the adjacent spinous processes when the central portion of the second implant member is substantially aligned with the central portion of the first implant member;
a distal end portion of the first implant member and a distal end portion of the second implant member are collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a first direction when the central portion of the second implant member is substantially aligned with the central portion of the first implant member; and
a proximal end portion of the first implant member and a proximal end portion of the second implant member are collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a second direction opposite the first direction when the central portion of the second implant member is substantially aligned with the central portion of the first implant member.
3 . The apparatus of claim 1 , wherein:
a size of a distal end portion of the first implant member along a dimension is greater than a size of a distal end portion of the second implant member along the dimension; and
a size of a proximal end portion of the first implant member along the dimension is less than a size of a proximal end portion of the second implant member along the dimension.
4 . The apparatus of claim 1 , wherein:
a size of a distal end portion of the first implant member along a dimension is greater than a size of a distal end portion of the second implant member along the dimension;
a size of a proximal end portion of the first implant member along the dimension is less than a size of a proximal end portion of the second implant member along the dimension; and
the size of the distal end portion of the first implant member plus the size of the distal end portion of the second implant member substantially corresponding to the size of the proximal end portion of the first implant member plus the size of the proximal end portion of the second implant member.
5 . The apparatus of claim 1 , wherein:
a size of a distal end portion of the first implant member along a dimension is greater than a size of a distal end portion of the second implant member along the dimension;
a size of a proximal end portion of the first implant member along the dimension is less than a size of a proximal end portion of the second implant member along the dimension;
the size of the distal end portion of the first implant member plus the size of the distal end portion of the second implant member is greater than a size of the central portion of the first implant member along the dimension plus a size of the central portion of the second implant member along the dimension; and
the size of the proximal end portion of the first implant member plus the size of the proximal end portion of the second implant member is greater than the size of the central portion of the first implant member plus the size of the central portion of the second implant member.
6 . The apparatus of claim 1 , wherein the first implant member has an interface surface including a locking portion configured to complimentarily fit with a locking portion of an interface surface of the second implant member.
7 . The apparatus of claim 1 , wherein the first implant member has an interface surface including a slot portion configured to mate with a rail portion of an interface surface of the second implant member.
8 . An apparatus, comprising:
a first implant member configured to be inserted into a location of a body including a space between adjacent spinous processes along a path in a direction, the first implant member having a distal end portion larger than a proximal end portion along a dimension substantially perpendicular to a longitudinal axis of the first implant member; and
a second implant member configured to be inserted along the path and moved in the direction along the first implant member until substantially aligned with the first implant member, the second implant member having a distal end portion smaller than a proximal end portion along the dimension.
9 . The apparatus of claim 8 , wherein the second implant member is configured to be slidably moved along the first implant member until substantially aligned with the first implant member.
10 . The apparatus of claim 8 , wherein:
the first implant member is elongate having a length between a distal end of the distal end portion of the first implant member and a proximal end of the proximal end portion of the second implant member;
the second implant member is elongate having a length between a distal end of the distal end portion of the second implant member and a proximal end of the proximal end portion of the second implant member; and
the length of the first implant member is less than the length of the second implant member.
11 . The apparatus of claim 8 , wherein:
the distal end portion of the first implant member and the distal end portion of second implant member collectively having a size along a dimension substantially corresponding to a size of the proximal end portion of the first implant member and the proximal end portion of the second implant member collectively along the dimension.
12 . The apparatus of claim 8 , wherein:
the distal end portion of the first implant member and the distal end portion of second implant member collectively having a size along a dimension greater than a size of a central portion of the first implant member and a central portion of the second implant member collectively; and
the proximal end portion of the first implant member and the proximal end portion of the second implant member collectively having a size along the dimension greater than the size of the central portion of the first implant member and the central portion of the second implant member collectively.
13 . The apparatus of claim 8 , wherein:
a central portion of the first implant member and a central portion of the second implant collectively configured to limit extension of a spine including the adjacent spinous processes;
the distal end portion of the first implant member and the distal end portion of the second implant member collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a first direction; and
the proximal end portion of the first implant member and the proximal end portion of the second implant member collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a second direction opposite the first direction.
14 . The apparatus of claim 8 , wherein the first implant member has an interface surface including a locking portion configured to complimentarily fit with a locking portion of an interface surface of the second implant member.
15 . The apparatus of claim 8 , wherein the first implant member has an interface surface including a slot portion configured to mate with a rail portion of an interface surface of the second implant member.
16 . The apparatus of claim 8 , wherein:
an interface surface of the first implant member has a distal end proximate to a distal end of the first implant member, the interface surface of the first implant has a proximate end corresponding to a proximate end of the first implant member; and
an interface surface of the second implant member has a distal end corresponding to a distal end of the second implant member, the interface surface of the second implant has a proximate end corresponding to a proximate end of the second implant member.
17 . The apparatus of claim 8 , wherein:
the distal end portion of the first implant member is configured to distract the adjacent spinous processes when inserted into the location of the body along a first direction; and
the proximal end portion of the second implant member configured limit movement of the first implant member and the second implant member collectively along the first direction.
18 . An apparatus, comprising:
a first implant member having an interface surface, the first implant member configured to be inserted into a location of a body through a space between adjacent spinous processes from a first side of the adjacent spinous processes until at least a distal end of the first implant member exits the space from a second side of the adjacent spinous processes; and
a second implant member configured to be inserted into the body from the first side of the adjacent spinous processes after the first implant member is inserted, the second implant member having an interface surface configured to moveably mate with the interface surface of the first implant member to collectively form an interspinous process implant.
19 . The apparatus of claim 18 , wherein:
the first implant member has an outer surface opposite its interface surface, the outer surface of the first implant member defining a saddle associated with a first spinous process from the adjacent spinous processes; and
the second implant member has an outer surface opposite its interface surface, the outer surface of the second implant member defining a saddle associated with a second spinous process from the adjacent spinous processes
20 . The apparatus of claim 18 , wherein the interspinous process implant has a midline offset from a boundary defined by the interface surface of the first implant member and the interface surface of the second implant member
21 . The apparatus of claim 18 , wherein the interface surface of the first implant member includes a locking portion configured to complimentarily fit with a locking portion of the interface surface of the second implant member.
22 . The apparatus of claim 18 , wherein the interface surface of the first implant member includes a slot portion configured to mate with a rail portion of the interface surface of the second implant member.
23 . The apparatus of claim 18 , wherein:
the interface surface of the first implant member has a distal end proximate to the distal end of the first implant member, the interface surface of the first implant has a proximate end corresponding to a proximate end of the first implant member; and
the interface surface of the second implant member has a distal end corresponding to a distal end of the second implant member, the interface surface of the second implant has a proximate end corresponding to a proximate end of the second implant member.
24 . The apparatus of claim 18 , wherein:
a distal end portion of the first implant member is configured to distract the adjacent spinous processes when inserted into the location of the body along a first direction; and
a proximal end portion of the second implant member configured limit movement of the first implant member and the second implant member collectively along the first direction.
25 . The apparatus of claim 18 , wherein the second implant member is configured to slidably move with the first implant member until a central portion of the first implant member is substantially aligned with a central portion of the second implant member.
26 . The apparatus of claim 18 , wherein:
a central portion of the first implant member and a central portion of the second implant member are collectively configured to limit extension of a spine including the adjacent spinous processes when the central portion of the second implant member is substantially aligned with the central portion of the first implant member;
a distal end portion of the first implant member and a distal end portion of the second implant member are collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a first direction when the central portion of the second implant member is substantially aligned with the central portion of the first implant member; and
a proximal end portion of the first implant member and a proximal end portion of the second implant member are collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a second direction opposite the first direction when the central portion of the second implant member is substantially aligned with the central portion of the first implant member.
27 . The apparatus of claim 18 , wherein:
a size of a distal end portion of the first implant member along a dimension is greater than a size of a distal end portion of the second implant member along the dimension; and
a size of a proximal end portion of the first implant member along the dimension is less than a size of a proximal end portion of the second implant member along the dimension.
28 . The apparatus of claim 18 , wherein:
a size of a distal end portion of the first implant member along a dimension is greater than a size of a distal end portion of the second implant member along the dimension;
a size of a proximal end portion of the first implant member along the dimension is less than a size of a proximal end portion of the second implant member along the dimension; and
the size of the distal end portion of the first implant member plus the size of the distal end portion of the second implant member substantially corresponding to the size of the proximal end portion of the first implant member plus the size of the proximal end portion of the second implant member.
29 . The apparatus of claim 18 , wherein:
a size of a distal end portion of the first implant member along a dimension is greater than a size of a distal end portion of the second implant member along the dimension;
a size of a proximal end portion of the first implant member along the dimension is less than a size of a proximal end portion of the second implant member along the dimension;
the size of the distal end portion of the first implant member plus the size of the distal end portion of the second implant member is greater than a size of the central portion of the first implant member along the dimension plus a size of the central portion of the second implant member along the dimension; and
the size of the proximal end portion of the first implant member plus the size of the proximal end portion of the second implant member is greater than the size of the central portion of the first implant member plus the size of the central portion of the second implant member.