Method for fabricating thin film pattern, liquid crystal display panel and method for fabricating thereof using the same
View Patent ↗A method of fabricating a thin film pattern according to an embodiment of the present invention comprises forming an organic material pattern on a substrate, forming a metal material of liquid phase on a substrate provided with the organic material pattern, hardening the metal material of liquid phase, and removing the metal material located on the organic material pattern, allowing some metal material to be left at an area non-overlapped with the organic material pattern.
1. A method of fabricating a thin film pattern, the method comprising:
forming an organic material pattern on a substrate;
forming a metal material of liquid phase on the substrate provided with the organic material pattern;
hardening the metal material of liquid phase; and
removing the metal material located on the organic material pattern, and allowing some metal material to be left at an area non-overlapped with the organic material pattern.
2. The method of fabricating the thin film pattern as claimed in claim 1 , wherein the metal material of liquid phase is formed by any one of a spray method and a spin coating method.
3. The method of fabricating the thin film pattern as claimed in claim 1 , wherein the reducing agent is sodium borohydride.
4. The method of fabricating the thin film pattern as claimed in claim 1 , wherein the material for protecting metal particles is a polyacrylic ammonuim salt.
5. The method of fabricating the thin film pattern as claimed in claim 1 , wherein water is used as the solvent.
6. The method of fabricating the thin film pattern as claimed in claim 1 , further comprising forming an organic insulating film on the substrate provided with the organic material pattern and the metal material at the area non-overlapped with the organic material pattern by a spin coating method.