Evaporation device and transport system thereof
A transport system for an evaporation device comprises a robot holding a substrate and a mask disposed on the robot. When the substrate is transported by the robot, the mask covers the substrate to prevent contamination. The robot has a fork holding the substrate, and the mask is disposed thereon. The mask is disposed under the substrate, specifically between the substrate and the fork.
1 . A transport system for transporting a substrate during an evaporation process, comprising:
a robot holding the substrate; and
a mask disposed on the robot, wherein when the substrate is transported by the robot, the mask covers the substrate.
2 . The transport system as claimed in claim 1 , wherein the robot has a fork holding the substrate, and the mask is disposed on the fork.
3 . The transport system as claimed in claim 2 , wherein the mask is disposed under the substrate.
4 . The transport system as claimed in claim 3 , wherein the mask is positioned between the substrate and the fork, and the substrate is disposed on the mask.
5 . The transport system as claimed in claim 4 , wherein the mask has a recess in which the substrate is received.
6 . An evaporation device for a substrate, comprising:
a chamber;
an emission source disposed in the chamber;
a robot holding the substrate into the chamber;
a mask disposed on the robot and positioned between the substrate and the emission source, wherein when the substrate is transported by the robot, the mask covers the substrate.
7 . The evaporation device as claimed in claim 6 , wherein the robot has a fork holding the substrate, and the mask is disposed on the fork.
8 . The evaporation device as claimed in claim 7 , wherein the emission source is disposed on the bottom of the chamber, and the mask is under the substrate.
9 . The evaporation device as claimed in claim 8 , wherein the mask is disposed between the substrate and the fork, and the substrate is disposed in the mask.
10 . The evaporation device as claimed in claim 9 , wherein the mask has a recess in which the substrate is received.