Precursors for formation of copper selenide, indium selenide, copper indium diselenide, and/or copper indium gallium diselenide films
View Patent ↗Liquid-based precursors for formation of Copper Selenide, Indium Selenide, Copper Indium Diselenide, and/or copper Indium Galium Diselenide include copper-organoselenides, particulate copper selenide suspensions, copper selenide ethylene diamine in liquid solvent, nanoparticulate indium selenide suspensions, and indium selenide ethylene diamine coordination compounds in solvent. These liquid-based precursors can be deposited in liquid form onto substrates and treated by rapid thermal processing to form crystalline copper selenide and indium selenide films.
1. A method of forming a crystalline Cu 2 Se film, comprising:
dissolving a Cu 2 Se x -diamine coordination compound in a liquid solvent to form a liquid Cu 2 Se x -diamine solution;
depositing the Cu 2 Se x -diamine solution on a substrate, where 1≦x≦12; and
heating the Cu 2 Se x -diamine solution on the substrate to vaporize the solvent and to decompose the Cu 2 Se x -diamine coordination compound so that the crystalline Cu 2 Se film forms on the substrate.
2. The method of claim 1 , including synthesizing the Cu 2 Se x -diamine coordination compound by reacting Cu 2 Se and Se with ethylene diamine.
3. The method of claim 1 , including synthesizing the Cu 2 Se x -diamine coordination compound by reacting Cu 2 Se and Se with 1,3-diaminopropane.
4. The method of claim 1 , including synthesizing the Cu 2 Se x -diamine coordination compound by reacting Cu 2 Se and Se with 1,2-diaminobenzene.
5. The method of claim 1 , including dissolving the Cu 2 Se x -diamine coordination compound in DMSO.
6. The method of claim 1 , including dissolving the Cu 2 Se x -diamine coordination compound in ethylene diamine.
7. The method of claim 1 , including heating the Cu 2 Se x -diamine solution on the substrate to a temperature in a range of 150 to 650° C. to also vaporize ligands decomposed from the Cu 2 Se x and volatile products including Se and/or H 2 Se so that the crystalline Cu 2 Se film forms on the substrate and to anneal the crystalline C 2 Se on the substrate.
8. The method of claim 7 , including heating the C 2 S x -diamine solution on the substrate to a temperature in a range of 350 to 500° C. to vaporize the ligands and volatile products and to anneal the crystalline Cu 2 Se on the substrate.
9. A method of synthesizing a soluble Cu—Se precursor for CIS and/or CIGS film, comprising reacting Cu 2 Se and Se with a di-functional diamine to produce soluble Cu 2 Se x -diamine coordination compound.
10. The method of claim 9 , wherein the di-functional diamine comprises ethylene diamine to produce soluble Cu 2 Se x (en) y .
11. The method of claim 9 , wherein the di-functional diamine comprises 1,3-diaminopropane.
12. The method of claim 9 , wherein the di-functional diamine comprises 1,2-diaminobenzene.
13. A method of forming a crystalline In—Se film, comprising:
dissolving In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x in a liquid solvent to form a liquid In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x solution, where 0≦x≦2, y≧1, and z≧0;
depositing the liquid In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x solution on a substrate; and
heating the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x on the substrate to vaporize the solvent and to decompose the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x and vaporize the ligands and volatile products including Se and/or H 2 Se so that the crystalline In—Se film forms on the substrate.
14. The method of claim 13 , including dissolving the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x in a mixture of DMSO and ethanol amine.
15. The method of claim 13 , including dissolving the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x in a mixture of hydrazine and ethylene diamine.
16. The method of claim 13 , including heating the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x to a temperature in a range of 300 to 650° C. to vaporize the ligands and volatile products and to anneal the In—Se on the substrate to produce crystalline In—Se film.
17. The method of claim 13 , including healing the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x to a temperature in a range of 300 to 400° C. for a time in a range of two to fifteen minutes to vaporize the ligands and volatile products and to anneal the In—Se on the substrate to produce crystalline In—Se film.
18. The method of claim 13 , including heating the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x to a temperature in a range of 300 to 400° C. for more than fifteen minutes to vaporize the ligands and volatile products and to anneal the In—Se on the substrate to produce crystalline In—Se film.
19. The method of claim 13 , including heating the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x to a temperature in a range of 400 to 550° C. for a time in a range of two to fifteen minutes to vaporize the ligands and volatile products and to anneal the In—Se on the substrate to produce γ-In 2 Se 3 film.
20. A precursor for CIS and/or CIGS film comprising soluble In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x where 0≦x≦2, y≧1, and z≧0.
21. A method of forming a crystalline Cu 2 Se film, comprising:
synthesizing a copper-organoselenide precursor;
depositing the precursor on a substrate; and
heating the precursor to decompose the precursor and so that crystalline Cu 2 Se film forms on the substrate.
22. The method of claim 21 , wherein the copper-organoselenide precursor includes a copper alkyl selenide.
23. The method of claim 21 , wherein the copper-organoselenide precursor includes a copper aryl selenide.
24. The method of claim 21 , wherein the copper-organoselenide includes copper n-butyl selenide.
25. The method of claim 24 , including synthesizing the copper n-butyl selenide by reacting n-butyl selenide with a copper(I) salt.
26. The method of claim 25 , wherein the copper(I) salt includes copper(I) coordination complexes.
27. The method of claim 26 , wherein the copper(I) coordination complex includes [Cu(CH 3 CN) 4 ](PF 6 ).
28. The method of claim 25 , wherein the copper(I) salt includes a copper halide.
29. The method of claim 28 , wherein the copper halide includes copper iodide.
30. The method of claim 28 , wherein the copper halide includes copper bromide.
31. The method of claim 28 , wherein the copper halide includes copper chloride.
32. The method of claim 26 , wherein the copper(I) salt includes copper(I) methoxide.
33. The method of claim 24 , including synthesizing the n-butyl selenide by reacting elemental selenium with n-butyl lithium.
34. The method of claim 21 , including synthesizing the copper-organoselenide by reacting an organoselenide with a copper(I) salt.
35. The method of claim 21 , including synthesizing the copper-organoselenide by reacting an organometallic reagent with elemental selenium.
36. The method of claim 35 , wherein the organometallic reagent includes an organolithium reagent.
37. The method of claim 36 , wherein the organolithium reagent includes an alkylithium reagent.
38. The method of claim 37 , wherein the alkylithium reagent includes n-butyl lithium.
39. The method of claim 37 , wherein the alkylithium reagent includes t-butyl lithium.
40. The method of claim 37 , wherein the alkylithium reagent includes sec-butyl lithium.
41. The method of claim 37 , wherein the alkylithium reagent includes methyl lithium.
42. The method of claim 37 , wherein the alkylithium reagent includes phenyl lithium.
43. The method of claim 37 , wherein the alkylithium reagent includes tolyl lithium.
44. The method of claim 37 , wherein the alkylithium reagent includes xylyl lithium.
45. The method of claim 37 , wherein the alkylithium reagent includes 2,6-diisopropylphenyl lithium.
46. The method of claim 24 , including suspending the copper n-butyl selenide in a liquid for dispersing the copper n-butyl selenide on the substrate.
47. The method of claim 46 , wherein the liquid is a mixture that includes a solvent and a dispersant.
48. The method of claim 47 , wherein the solvent includes DMSO.
49. The method of claim 47 , wherein the solvent includes ethylene diamine.
50. The method of claim 48 , wherein the dispersant includes ethanolamine.
51. A precursor for producing Cu 2 Se comprising a copper-organoselenide in a liquid solution.
52. The precursor of claim 51 , wherein the copper-organoselenide includes a copper alkyl selenide.
53. The precursor of claim 52 , wherein the copper alkyl selenide includes copper n-butyl selenide.
54. The precursor of claim 51 , wherein the copper-organoselenide includes a copper aryl selenide.
55. A method of producing a crystalline In—Se film, comprising:
forming a slurry of In 2 Se 3 nanoparticles;
spreading the slurry of In 2 Se 3 nanoparticles on a substrate; and
heating the slurry of In 2 Se 3 nanoparticles to evaporate carrier components of the slurry and to form the crystalline In—Se film.
56. The method of claims 55 , including heating the slurry of In 2 Se 3 nanoparticles to a temperature in a range of 300 to 650° C. to anneal the In 2 Se 3 nanoparticles to produce the In—Se film.
57. The method of claims 55 , including heating the slurry of In 2 Se 3 nanoparticles to a temperature in a range of 300 to 400° C. to anneal the In 2 Se 3 nanoparticles to produce crystalline InSe.
58. The method of claims 55 , including heating the slurry of In 2 Se 3 nanoparticles to a temperature in a range of 300 to 400° C. to anneal the In 2 Se 3 nanoparticles to produce γ-In 2 Se 3 .
59. The method of claim 55 , including producing the In 2 Se 3 nanoparticles by reacting indium iodide with sodium selenide in methanol.
60. A method of forming a crystalline In—Se film, comprising:
reacting In 2 Se 3 , elemental Se, hydrazine, and ethylene diamine to form a liquid solution comprising In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x , where 0≦x≦2, y≧1, and z≧0;
depositing the liquid solution comprising the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x on a substrate; and
heating the solution comprising the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x on the substrate to vaporize the solvent and to decompose the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x and vaporize the ligands and volatile products including Se and/or H 2 Se so that the crystalline In—Se film forms on the substrate.
61. The method of claim 60 , including heating the solution comprising the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x on the substrate to a temperature in a range of 300 to 400° C. to vaporize the solvent and to decompose the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x and vaporize the ligands and volatile products including Se and/or H 2 Se so that crystalline In—Se film forms on the substrate.
62. The method of claim 60 , including heating the solution comprising the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x on the substrate to a temperature in a range of 400 to 650° C. to vaporize the solvent and to decompose the In 2 Se 4 (enH) x (N 2 H 5 ) 2-x (en) y (N 2 H 4 ) x and vaporize the ligands and volatile products including Se and/or H 2 Se so that crystalline γ-In 2 Se 3 film forms on the substrate.