Electrodeposition of biaxially textured layers on a substrate
View Patent ↗Methods of producing one or more biaxially textured layer on a substrate, and articles produced by the methods, are disclosed. An exemplary method may comprise electrodepositing on the substrate a precursor material selected from the group consisting of rare earths, transition metals, actinide, lanthanides, and oxides thereof. An exemplary article ( 150 ) may comprise a biaxially textured base material ( 130 ), and at least one biaxially textured layer ( 110 ) selected from the group consisting of rare earths, transition metals, actinides, lanthanides, and oxides thereof. The at least one biaxially textured layer ( 110 ) is formed by electrodeposition on the biaxially textured base material ( 130 ).
1. A method of producing at least one biaxially textured layer on a biaxially textured substrate, comprising electrodepositing on the substrate a CeO 2 doped with a bromine based, precursor material to form a buffer layer wherein said buffer layer has a roughness of about 3 nm and an in-plane and out-of-plane alignment of less than seven degrees.
2. The method of claim 1 , wherein the substrate further comprises electrodeposited Y 2 O 3 .
3. The method of claim 1 , wherein electrodepositing is at a current density in the range of about 0.05 to 25 mA/cm 2 .
4. The method of claim 1 , wherein electrodepositing is during stirring of a bath containing the precursor material.
5. The method of claim 1 , wherein electrodepositing is in the range of about 20° C. to 100° C.
6. The method of claim 1 , wherein electrodepositing is at about room temperature.
7. The method of claim 1 , wherein electrodepositing is for about 1 to 30 minutes.
8. The method of claim 1 , further including annealing the biaxially textured layer at about 700 to 1200° C.
9. The method of claim 1 , further including annealing the biaxially textured layer in a gas mixture.
10. The method of claim 1 , further including annealing the biaxially textured layer.
11. The method of claim 1 wherein the bromine based precursor material further includes Sm, Gd or Zr.
12. A method of producing a superconducting material having at least one biaxially textured layer, comprising:
selecting a CeO 2 doped with a bromine based precursor material to form a buffer layer wherein said layer has a roughness of about 3 nm and an in-plane and out-of-plane alignment of less than seven degrees; and
electrodepositing the selected precursor material on a biaxially textured substrate.
13. The method of claim 12 , further comprising constantly stirring a bath with the precursor material during the step of electrodepositing.
14. The method of claim 12 , further comprising thermally annealing the electrodeposited precursor material.
15. The method of claim 12 , wherein the biaxially textured substrate is Ni-based.
16. The method of claim 12 wherein the bromine based precursor material further includes Sm, Gd or Zr.