Photoresist composition and method of manufacturing a color filter substrate by using the same
View Patent ↗A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the color filter may be improved.
1. A photoresist composition, comprising:
a coloring agent including an anthraquinone-based dye and a pigment, wherein the anthraguinone-based dye includes a compound represented by the following Chemical Formula (1):
wherein R 1 and R 2 independently represent one selected from the group consisting of an amine group, a hydroxyl group and a halogen atom, and R 3 , R 4 , R 5 and R 6 independently represent an alkyl group having 1 to 4 carbon atoms, and n is a natural number;
a binder resin;
a cross-linker;
a photo-polymerization initiator; and
a solvent.
2. A photoresist composition, comprising: a coloring agent including an anthraquinone-based dye and a pigment, wherein the anthraquinone-based dye includes a compound represented by the following Chemical Formula (2):
a binder resin;
a cross-linker,
a photo-polymerization initiator; and
a solvent.
3. The photoresist composition of claim 1 , wherein the coloring agent is about 10% to about 60% by weight based on a total weight of the photoresist composition.
4. The photoresist composition of claim 3 , wherein the anthraquinone-based dye is about 5% to about 50% by weight based on a total weight of the coloring agent.
5. The photoresist composition of claim 4 , wherein the anthraquinone-based dye has a maximum ultraviolet (UV) ray absorbance in a range between about 525 nm and about 535 nm.
6. The photoresist composition of claim 1 , wherein the binder resin includes at least one selected from the group consisting of a phenol-based polymer and an acryl-based polymer.
7. The photoresist composition of claim 1 , wherein the pigment includes an organic pigment.
8. The photoresist composition of claim 1 , further comprising an additive that includes at least one selected from the group consisting of a pigment-dispersing agent, an adhesive and a surfactant.
9. The photoresist composition of claim 8 , wherein the additive is about 1% to about 3% by weight based on a total weight of the photoresist composition.
10. A method of manufacturing a color filter substrate, the method comprising:
coating a photoresist composition on a base substrate to form a photoresist film, the photoresist composition including a binder resin, a cross-linker, a photo-polymerization initiator, a solvent and a coloring agent having an anthraquinone-based dye and a pigment, wherein the anthraguinone-based dye includes a compound represented by the following Chemical Formula (1):
wherein R 1 and R 2 independently represent one selected from the group consisting of an amine group, a hydroxyl group and a halogen atom, and R 3 ,R 4 ,R 5 and R 6 independently represent an alkyl group having 1 to 4 carbon atoms, and n is a natural number;
selectively exposing the photoresist film to light; and
developing the photoresist film exposed to the light to form a color filter pattern.
11. The method of claim 10 , wherein the anthraquinone-based dye includes a compound represented by the following Chemical Formula (2):
12. The method of claim 10 , wherein the anthraquinone-based dye has a maximum ultraviolet (UV) ray absorbance in a range between about 525 nm and about 535 nm.
13. The method of claim 10 , further comprising forming a protecting layer covering the color filter pattern and the light-blocking layer.
14. The method of claim 13 , further comprising forming a common electrode layer on the protecting layer.