Mask and method of manufacturing liquid crystal display device using the same

1. A method for fabricating a device, comprising:

providing a substrate;

forming a plurality of thin films on the substrate;

forming a photoresistable layer on the plurality of thin films;

irradiating light onto the photoresistable layer through a photo mask having a transmissive region, a half-transmissive region, a diffractive region and an interceptive region;

developing the photoresistable layer to form a photoresist pattern having at least three different thicknesses;

etching the plurality of thin films using the photoresist pattern;

first ashing the photoresist pattern and etching the plurality of thin films using the first ashed photoresist pattern; and

second ashing the first ashed photoresist pattern and etching at least one thin film of the plurality of thin films using the second ashed photoresist pattern;

wherein the interceptive region includes metal layer, the half-transmissive region includes an optical absorption layer, and the diffractive region includes the optical absorption layer and a plurality of slits of metal layer.

2. The method for fabricating a device according to claim 1 , wherein the photoresistable layer includes a photoresist, a photo acryl, or an organic material.

3. The method for fabricating a device according to claim 1 , further comprising etching at least another thin film of the plurality of thin films using the second ashed photoresist pattern.