Pattern correction apparatus, pattern optimization apparatus, and integrated circuit design apparatus

1. A pattern correction apparatus which makes a correction to a pattern of an integrated circuit, comprising:

a trace movement section for moving, among traces forming the pattern of the integrated circuit, a trace which is not present on trace grids to a position on the trace grids;

a pattern correction section for making a correction to the pattern; and

a trace pitch optimization section for optimizing a trace pitch between traces forming a pattern corrected by the pattern correction section,

wherein the pattern correction section:

creates graphics information about the corrected pattern,

selects one trace from traces constituting the corrected pattern,

determines whether the selected trace and traces adjacent to the selected trace have been changed as a result of correction of the pattern, and

specifies, as a trace to be subjected to optimization of a trace pitch, the trace which has been determined to have been changed.

2. The pattern correction apparatus according to claim 1 , wherein the trace pitch optimization section:

selects one trace from the corrected pattern,

determines whether or not the pattern correction section has designated the selected trace as a trace to be subjected to optimization of a trace pitch, and

optimizes a trace pitch of the trace designated as a trace to be subjected to optimization of a trace pitch.