Edge-emitting semiconductor laser chip

1. An edge emitting semiconductor laser chip comprising:

a carrier substrate;

an epitaxially grown component structure having an active zone for generating radiation; and

a first interlayer being a first bonding layer and being in direct contact with the carrier substrate and the component structure to promote adhesion between the carrier substrate and the component structure;

a second interlayer forming a cladding layer and a second bonding layer and being in direct contact with the component structure and a contact layer;

wherein the first interlayer is an electrically insulating and continuous layer extending completely between the carrier substrate and the component structure such that the carrier substrate does not directly contact the component structure; and

wherein the active zone is located between the first interlayer and the second interlayer.

2. The edge emitting semiconductor laser chip as claimed in claim 1 , wherein at least one of the first and second interlayers comprises at least one of the following materials: a silicon oxide, a silicon nitride, an aluminum oxide, a tantalum oxide, and a hafnium oxide.

3. The edge emitting semiconductor laser chip as claimed in claim 1 ,

wherein the first bonding layer promotes adhesion between the carrier substrate and a useful layer,

wherein at least one part of the component structure is deposited epitaxially onto the useful layer.

4. The edge emitting semiconductor laser chip as claimed in claim 1 , further comprising a useful layer, which forms a part of at least one of a further cladding layer and a waveguide layer of the edge emitting semiconductor laser chip.

5. The edge emitting semiconductor laser chip as claimed in claim 1 , further comprising a useful layer, wherein a refractive index of a material forming the first interlayer is less than a refractive index of a material forming the useful layer.

6. The edge emitting semiconductor laser chip as claimed in claim 1 , further comprising a useful layer, wherein a material which at least one of is electrically insulating and has a smaller refractive index than that of the first interlayer is arranged at places between the first interlayer and the useful layer.

7. The edge emitting semiconductor laser chip as claimed in claim 1 , wherein the first interlayer forms a further cladding layer of the edge emitting semiconductor laser chip.

8. The edge emitting semiconductor laser chip as claimed in claim 1 , wherein at least one of the first and second interlayers consists of at least one of the following materials: a silicon oxide, a silicon nitride, an aluminum oxide, a tantalum oxide, and a hafnium oxide.