IP Library Granted Patent US 7,477,352
Granted Patent B2
US 7,477,352 · App. 11/826,171 · Granted Jan 13, 2009

Liquid crystal display device including step-compensating pattern and fabricating method thereof

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Quick Facts
Patent No.
US 7,477,352
App. No.
11/826,171
Granted
Jan 13, 2009
Kind
B2
Abstract

A liquid crystal display device includes first substrate having an active region and a non-active region along a peripheral portion of the active region, a second substrate facing and spaced apart from the first substrate, and having an active region and a non-active region along a peripheral portion of the active region, a seal pattern between the first and second substrates disposed along a border of the active and non-active regions, a gate line on an interior surface of the first substrate and crossing the seal pattern, a data line crossing the gate line and the seal pattern, a thin film transistor connected to the gate line and the data line, a pixel electrode connected to the thin film transistor, a common electrode on an interior surface of the second surface, a first step-compensating pattern adjacent to the seal pattern and the gate line, a second step-compensating pattern adjacent to the seal pattern and the data line, and a liquid crystal material layer between the pixel electrode and the common electrode.

Claims (26)

1. A liquid crystal display device, comprising:

a first substrate having an active region and a non-active region along a peripheral portion of the active region;

a second substrate facing and spaced apart from the first substrate, and having an active region and a non-active region along a peripheral portion of the active region;

a seal pattern between the first and second substrates disposed along a border of the active and non-active regions;

a gate line on an interior surface of the first substrate and crossing the seal pattern;

a data line crossing the gate line and the seal pattern;

a thin film transistor connected to the gate line and the data line, the thin film transistor includes an active layer, and source and drain electrodes;

a pixel electrode connected to the thin film transistor;

a common electrode on an interior surface of the second surface;

a first step-compensating pattern adjacent to the seal pattern and the gate line;

a second step-compensating pattern adjacent to the seal pattern and the data line;

a semiconductor pattern between the first step-compensating pattern and the gate line;

a liquid crystal material layer between the pixel electrode and the common electrode;

a gate pad connected to the gate line and a data pad connected to the data line,

wherein the first step-compensating pattern is formed over the gate line at a first crossing of the gate line and the seal pattern, wherein the second step-compensating pattern is formed under the data line at a second crossing of the data line and the seal pattern.

2. A fabricating method of a liquid crystal display device, comprising:

forming a gate line and a first step-compensating pattern on a first substrate having an active region and a non-active region along a peripheral portion of the active region, the first step-compensating pattern being disposed along a border of the active and non-active regions;

forming a data line crossing the gate line and a second step-compensating pattern along the border of the active and non-active regions;

forming a thin film transistor connected to the gate line and the data line;

forming a pixel electrode connected to the thin film transistor;

forming a semiconductor pattern between the first step-compensating pattern and the gate line;

forming a common electrode on an interior surface of a second surface;

forming a seal pattern along the border of the active and non-active regions, the seal pattern crossing the gate line and the data line;

attaching the first and second substrates such that the pixel electrode faces the common electrode; and

forming a liquid crystal material layer between the pixel electrode and the common electrode,

wherein the first step-compensating pattern is formed under the data line at a first crossing of the data line and the seal pattern, wherein the second step-compensating pattern is formed over the gate line at a second crossing of the gate line and the seal pattern.

Assignments (2)
CHANGE OF NAME Recorded Oct 17, 2008
From: LG.PHILIPS LCD CO., LTD.
To: LG DISPLAY CO., LTD.
Reel/Frame 021763/0177 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 12, 2007
From: KIM, JIN-TAE; PARK, JAE-SEOK
To: LG.PHILIPS LCD CO., LTD.
Reel/Frame 019596/0612 →