Interferometric optical position encoder employing spatial filtering of diffraction orders for improved accuracy
View Patent ↗An optical position encoder employs spatial filtering of diffraction orders other than +/− 1st diffraction orders for greater accuracy. The encoder includes a light source, a scale including a diffractive scale pattern, an optical detector adjacent to the scale, and first and second spaced-apart diffraction gratings between the light source and the scale. The gratings and scale are configured to spatially separate +/− 1st diffraction orders from other diffraction orders and to direct the +/− 1st diffraction orders along respective optical paths. The optical paths diverge from the first grating to respective locations on the second grating that are separated by more than the beam width of the source light beam. The optical paths further converge from the locations on the second grating to an area of the scale adjacent to the detector, and then extend from the area of the scale to the detector to create an interference pattern as a function of the relative position between the scale and the light source. Preferably, higher diffraction orders are separated by total internal reflection at the first diffraction grating.
1. An optical position encoder, comprising:
a light source operative to generate a source light beam having a beam width;
a scale including a diffractive scale pattern extending in a direction of relative motion of the scale with respect to the light source;
an optical detector adjacent to the scale; and
first and second spaced-apart diffraction gratings between the light source and the scale, the first diffraction grating having a location at which the source light beam is incident;
wherein the diffraction gratings and scale are mutually configured and cooperative to spatially separate +/− 1st diffraction orders from other diffraction orders and to direct the +/− 1st diffraction orders as respective optical beams along respective optical paths, the optical paths (i) diverging from the location of the first diffraction grating to respective locations of the second diffraction grating, the respective locations being separated by more than the beam width, (ii) converging from the respective locations on the second diffraction grating to an area of the scale adjacent to the optical detector, and (iii) extending from the area of the scale to the optical detector to create an interference pattern at the optical detector as a function of the relative position between the scale and the light source.
2. An optical position encoder according to claim 1 , wherein the scale is reflective and the optical detector is disposed between the second diffraction grating and the scale.
3. An optical position encoder according to claim 2 , wherein the detector is configured to block substantially all of a 0 th order optical beam from the second diffraction grating thereby preventing the 0 th order optical beam from reaching the area of the scale.
4. An optical position encoder according to claim 1 , wherein the scale is transmissive and the optical detector is disposed on the opposite side of the scale from the second diffraction grating.
5. An optical position encoder according to claim 4 , further comprising an optical mask disposed between the second diffraction grating and the scale, the optical mask being configured to block substantially all of a 0 th order beam from the second diffraction grating thereby preventing the 0 th order optical beam from reaching the area of the scale.
6. An optical position encoder according to claim 1 , wherein the first and second diffraction gratings are formed on parallel opposite faces of a unitary, optically transmissive substrate.
7. An optical position encoder according to claim 6 , wherein the unitary, optically transmissive substrate is a glass substrate.
8. An optical position encoder according to claim 1 , wherein the first and second diffraction gratings are formed on separate optically transmissive substrates.
9. An optical position encoder according to claim 1 , further comprising an optical mask adjacent to the second diffraction grating, the optical mask having two optical apertures adjacent to the respective locations of the second diffraction grating and an opaque region between the two optical apertures, the optical apertures being operative to pass substantially all the light energy traveling along the optical paths and the opaque regions being operative to block substantially all the light energy of a 0 th order optical beam from the second diffraction grating.
10. An optical position encoder according to claim 9 , wherein the optical mask comprises an opaque coating over the second diffraction grating.
11. An optical position encoder according to claim 10 , wherein the opaque coating comprises a metal coating.
12. An optical position encoder according to claim 9 , wherein the optical mask comprises a printed circuit board.
13. An optical position encoder according to claim 12 , wherein the detector is mounted to the printed circuit board.
14. An optical position encoder according to claim 1 , wherein the first and second diffraction gratings are phase gratings.
15. An optical position encoder according to claim 1 , wherein the first and second diffraction gratings are amplitude gratings.
16. An optical position encoder according to claim 1 , wherein the first grating is configured to impart total internal reflection to all diffraction orders higher than the +/− 1st orders.
17. An optical position encoder according to claim 1 , wherein the optical detector and the first and second spaced-apart diffraction gratings are stationary with respect to the light source.
18. An optical position encoder according to claim 1 , wherein the scale is configured to move in a direction perpendicular to the direction of light emitted from the light source.