Reflection-transmission type liquid crystal display device and method for manufacturing the same

1. A method for manufacturing a liquid crystal display device, the method comprising the steps of:

forming a transparent conductive layer on a substrate having a display region and a pad region located in a periphery of the display region;

patterning the transparent conductive layer to form a transparent electrode on the display region and a pad electrode on the pad region;

forming a buffer metal layer directly on the transparent electrode;

forming a reflective layer on the buffer metal layer;

and

patterning the reflective layer to form a reflective electrode.

2. The method for manufacturing a liquid crystal display device as claimed in claim 1 , further comprising annealing the reflective layer.

3. The method for manufacturing a liquid crystal display device as claimed in claim 2 , wherein the step of annealing the reflective layer is performed at a temperature above about 100° C. for more than about 30 minutes.

4. The method for manufacturing a liquid crystal display device as claimed in claim 1 , wherein the transparent conductive layer is formed on an organic layer in the display region.

5. The method for manufacturing a liquid crystal display device as claimed in claim 4 , wherein an argon (Ar) plasma process is performed to enhance the adhesion between the transparent conductive layer and the organic layer.

6. The method for manufacturing a liquid crystal display device as claimed in claim 1 , wherein the buffer metal layer is patterned during patterning the reflective layer.

7. The method for manufacturing a liquid crystal display device as claimed in claim 6 , wherein the transparent conductive layer comprises indium-oxide, the barrier metal layer comprises molybdenum (Mo) and the reflective layer comprises aluminum (Al).

8. A method for manufacturing a liquid crystal display device, the method comprising the steps of:

forming a transparent conductive layer on a substrate having a display region and a pad region located in a periphery of the display region;

forming a reflective layer on the substrate having the transparent conductive layer;

patterning the reflective layer to form a reflective electrode; and

patterning the transparent conductive layer to form a transparent electrode on the display region and a pad electrode on the pad region simultaneously,

wherein the reflective electrode, the transparent electrode, and the pad electrode are formed using one mask.

9. The method for manufacturing a liquid crystal display device as claimed in claim 8 , wherein the mask is a half-tone mask or a slit mask.

10. The method for manufacturing a liquid crystal display device as claimed in claim 8 , further comprising annealing the reflective layer after forming the reflective layer.

11. The method for manufacturing a liquid crystal display device as claimed in claim 8 , wherein patterning the transparent conductive layer to form the reflective electrode is performed after patterning the transparent conductive layer.

12. The method for manufacturing a liquid crystal display device as claimed in claim 8 , further comprising forming a buffer metal layer on the transparent conductive layer.

13. The method for manufacturing a liquid crystal display device as claimed in claim 12 , wherein the buffer metal layer is patterned during patterning the reflective layer before patterning the transparent conductive layer.

14. The method for manufacturing a liquid crystal display device as claimed in claim 13 , wherein the transparent conductive layer comprises indium-oxide, the barrier metal layer comprises molybdenum (Mo) and the reflective layer comprises aluminum (Al).

15. A method for manufacturing a liquid crystal display device, the method comprising the steps of:

forming a transparent conductive layer on a substrate having a display region and a pad region located in a periphery of the display region;

depositing a barrier metal layer on the transparent conductive layer;

forming a reflective layer on the substrate having the transparent conductive layer and the barrier metal layer; and

patterning the reflective layer to form a reflective electrode.

16. The method for manufacturing a liquid crystal display device as claimed in claim 15 , wherein the barrier metal layer is simultaneously patterned to form a barrier metal layer pattern when the reflective layer is patterned to form the reflective electrode.

17. The method for manufacturing a liquid crystal display device as claimed in claim 15 , wherein the transparent conductive layer, the barrier metal layer, and the reflective layer are formed at a temperature of about 20° C. to about 150° C.

18. The method for manufacturing a liquid crystal display device as claimed in claim 15 , wherein the barrier metal layer is composed of material having an etching rate similar to an etching rate of the reflective layer.

19. The method for manufacturing a liquid crystal display device as claimed in claim 15 , wherein the transparent conductive layer comprises indium-oxide (ITO), the barrier metal layer comprises molybdenum (Mo), and the reflective layer comprises aluminum (Al).

20. The method for manufacturing a liquid crystal display device as claimed in claim 15 , further comprising annealing the reflective layer after forming the reflective layer.

21. The method for manufacturing a liquid crystal display device as claimed in claim 15 , wherein forming the transparent conductive layer comprises patterning the transparent conductive layer to simultaneously form the transparent electrode and the pad electrode.

22. The method for manufacturing a liquid crystal display device as claimed in claim 21 , wherein patterning the transparent conductive layer is performed after the step of forming the reflective electrode.