Mask and method for patterning a semiconductor wafer
View Patent ↗A method for generating a mask pattern is provided. A target lithographic pattern comprising a plurality of first geometric regions is provided, wherein the regions between the plurality of first geometric regions comprise first spaces. The target lithographic pattern is transformed, and the transformed pattern is decomposed into a first pattern and a second pattern.
1. A method for generating mask patterns, the method comprising:
transforming a target lithographic pattern into a transformed lithographic pattern, wherein the target lithographic pattern comprises a plurality of mask elements, regions between the plurality of mask elements comprise spaces, and transforming comprises
identifying critical spaces from the target lithographic pattern, wherein the critical spaces comprise spaces that comprise at least one dimension measuring a critical distance;
identifying intermediate critical spaces, wherein the intermediate critical spaces comprise critical spaces which are separated from an adjoining critical space by an intermediate dimension;
identifying intermediate mask elements, wherein the intermediate mask elements comprise mask elements immediately adjacent to at least one critical space; and
identifying odd and even intermediate mask elements, wherein odd intermediate mask elements comprise every other intermediate mask element along an axis, and wherein even intermediate mask elements comprise remaining intermediate mask elements not designated as odd intermediate mask elements; and
decomposing the transformed lithographic pattern into a first decomposed pattern and into a second decomposed pattern, wherein transforming and decomposing is performed by a computer having a non-transitory computer-readable storage medium with an executable program stored thereon.
2. The method of claim 1 , wherein decomposing the transformed lithographic pattern into a first decomposed pattern and into a second decomposed pattern further comprises:
forming a first mask pattern comprising, the forming comprising mapping
the even intermediate mask elements,
the odd intermediate mask elements,
intermediate critical spaces immediately to the right of the even intermediate mask elements,
mask elements not designated as critical mask elements,
critical spaces not designated as intermediate critical spaces into a first mask pattern; and
forming a second mask pattern, the forming comprising mapping
the even intermediate mask elements,
the odd intermediate mask elements,
intermediate critical spaces immediately to the right of the odd intermediate mask elements,
mask elements not designated as critical mask elements, and
critical spaces not designated as intermediate critical spaces into a second mask pattern.
3. The method of claim 1 , wherein the executable program comprises dedicated software written to perform the transforming and the decomposing.
4. The method of claim 1 , wherein the plurality of mask elements are transformed into opaque regions, and wherein the transformed lithographic pattern is printed onto a semiconductor wafer as a pattern in a positive photoresist.
5. The method of claim 1 , wherein the plurality of mask elements are transformed into transparent regions, and wherein the transformed lithographic pattern is printed onto a semiconductor wafer as a pattern in a negative photoresist.
6. The method of claim 1 , wherein the plurality of mask elements are transformed into transparent regions, and wherein the transformed lithographic pattern is printed onto a semiconductor wafer as a pattern in a negative photoresist.
7. A method for generating mask patterns, the method comprising:
transforming the target lithographic pattern into a transformed lithographic pattern, the target lithographic pattern comprising a plurality of mask elements, wherein regions between the plurality of mask elements comprise spaces;
decomposing the transformed lithographic pattern into a first decomposed pattern and into a second decomposed pattern, wherein transforming and decomposing is performed by a computer having a non-transitory computer-readable storage medium with an executable program stored thereon;
identifying critical spaces from the target lithographic pattern, wherein the critical spaces comprise spaces that comprise at least one dimension measuring a critical distance;
identifying intermediate critical spaces, wherein the intermediate critical spaces comprise critical spaces which are separated from an adjoining critical space by an intermediate dimension; and
identifying intermediate mask elements, wherein the intermediate mask elements comprise mask elements immediately adjacent to at least one critical space.
8. The method of claim 7 , further comprising:
mapping the intermediate mask elements into openings;
mapping the intermediate critical spaces into transformed mask elements; and
applying altPSM coloring to openings, wherein the openings are mapped into odd openings and even openings.
9. The method of claim 8 , wherein the decomposing comprises:
forming a first pattern, the forming comprising mapping odd openings, even openings, and transformed mask elements to the right of even openings, critical spaces not designated as intermediate critical spaces, and mask elements not designated as intermediate mask elements into a first mask; and
forming a second pattern, the forming comprising mapping odd openings, even openings, and transformed mask elements to the right of odd openings, critical spaces not designated as intermediate critical spaces, and mask elements not designated as intermediate mask elements into a second mask.
10. The method of claim 8 , wherein the decomposing comprises:
forming a first pattern, the forming comprising mapping odd openings, even openings, and a projection from a rightward boundary of an even opening across to a leftward boundary of an odd opening, critical spaces not designated as intermediate critical spaces, and mask elements not designated as intermediate mask elements into a first mask; and
forming a second pattern, the forming comprising mapping odd openings, even openings, and a projection from the rightward boundary of an odd opening across to the leftward boundary of a even opening, critical spaces not designated as intermediate critical spaces, and mask elements not designated as intermediate mask elements into a second mask.
11. The method of claim 10 , wherein the first pattern and the second pattern comprise mask elements.
12. The method of claim 8 , wherein the applying the altPSM coloring comprises running dedicated altPSM mapping software.
13. The method of claim 8 , further comprising performing an altPSM check after applying the altPSM coloring.
14. The method of claim 13 , wherein the performing the altPSM check comprises running dedicated altPSM checking software, the dedicated altPSM checking software comprising a set of rules.
15. The method of claim 14 , wherein a subset of the set of rules are disabled from checking.
16. The method of claim 15 , wherein a rule preventing regions of opposite phases from abutting is disabled.
17. The method of claim 16 , wherein the decomposing further comprises extending regions of opposite phases to create an overlap between the first mask and the second mask in regions where opposite phases abut.
18. The method of claim 17 , wherein the overlap between the two masks comprises an overlap between about 30 nm and about 70 nm.
19. The method of claim 15 , wherein a rule preventing regions of opposite phases from overlapping is disabled.
20. The method of claim 19 , wherein a region of overlapping phases is transformed into a region of a single phase by removing a conflicting region of opposite phase.
21. The method of claim 7 , further comprising optimizing the first decomposed pattern and the second decomposed pattern.
22. The method of claim 21 , further comprising building a mask set utilizing the first decomposed pattern and the second decomposed pattern.
23. The method of claim 22 , further comprising using the mask set to form a semiconductor device.
24. A method of generating a mask, the method comprising:
transforming a target lithographic pattern into a transformed lithographic pattern, wherein the target lithographic pattern comprises a plurality of mask elements, regions between the plurality of mask elements comprise spaces, and transforming comprises
identifying critical spaces from the target lithographic pattern, wherein the critical spaces comprises spaces that comprise at least one dimension measuring a critical distance;
identifying intermediate critical spaces, wherein the intermediate critical spaces comprise critical spaces which are separated from an adjoining critical space by an intermediate dimension;
identifying intermediate mask elements, wherein the intermediate mask elements comprise mask elements immediately adjacent to at least one critical space; and
identifying odd and even intermediate mask elements, wherein odd intermediate mask elements comprise every other intermediate mask element along an axis, and wherein even intermediate mask elements comprise remaining intermediate mask elements not designated as odd intermediate mask elements;
decomposing the transformed lithographic pattern into a first decomposed pattern and into a second decomposed pattern; and
fabricating at least one mask set based on the first decomposed pattern and the second decomposed pattern.
25. The method of claim 24 , wherein decomposing the transformed lithographic pattern into a first decomposed pattern and into a second decomposed pattern further comprises:
forming a first mask pattern comprising, the forming comprising mapping
the even intermediate mask elements,
the odd intermediate mask elements,
intermediate critical spaces immediately to the right of the even intermediate mask elements,
mask elements not designated as critical mask elements,
critical spaces not designated as intermediate critical spaces into a first mask pattern; and
forming a second mask pattern, the forming comprising mapping
the even intermediate mask elements,
the odd intermediate mask elements,
intermediate critical spaces immediately to the right of the odd intermediate mask elements,
mask elements not designated as critical mask elements, and
critical spaces not designated as intermediate critical spaces into a second mask pattern.
26. The method of claim 24 , wherein the plurality of mask elements are transformed into opaque regions, and wherein the transformed lithographic pattern is printed onto a semiconductor wafer as a pattern in a positive photoresist.