SOLVENT-SOLUBLE STAMP FOR NANO-IMPRINT LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing a solvent-soluble stamp for nano-imprint lithography is provided. According to the method, a stamp is formed on a master substrate made of an ultraviolet-transparent material, using a material which is soluble in a solvent, and then a metal stamp or another stamp for a nano-imprint lithography is manufactured using the solvent-soluble stamp. Next, the stamp for nano-imprint lithography can be achieved by melting the soluble stamp. Therefore, it is possible to reuse the master several times. Further, it is possible to solve a problem in which a mold cannot be separated from the stamp. Furthermore, a uniform and clean stamp with a nano size can be obtained.
1 . A method of manufacturing a solvent-soluble stamp for nano-imprint lithography, the method comprising:
(a) forming a pattern on the upper surface of a substrate using a lithography process after a resist is coated on the upper surface of the substrate;
(b) etching the substrate using the patterned resist;
(c) vapor-depositing a polymer on the structure in step (b);
(d) physically separating the polymer on which the pattern of the substrate is lithographed from the substrate;
(e) vapor-depositing a metal layer for plating on the upper surface of the separated polymer pattern using a sputtering process;
(f) vapor-depositing a metal on the upper surface of the structure in step (e) by electroplating method; and
(g) solving the structure in step (f) in the solvent to remove the polymer, so as to obtain the stamp for nano-imprint lithography.
2 . A method of manufacturing a solvent-soluble stamp for nano-imprint lithography, the method comprising:
(a) forming a pattern on the upper surface of a substrate using a lithography process after a resist is coated on the upper surface of the substrate;
(b) etching the substrate using the patterned resist;
(c) vapor-depositing a polymer such as solvent-soluble resin on the structure in step (b); and
(d) physically separating the polymer on which the pattern of the substrate is lithographed from the substrate, so as to obtain the stamp for nano-imprint lithography.
3 . The method as claimed in claim 1 , wherein the substrate is made from an ultraviolet-permeable material selected from silicon Si, glass, quartz, sapphire, and diamond.
4 . The method as claimed in claim 2 , wherein the substrate is made from an ultraviolet-permeable material selected from silicon Si, glass, quartz, sapphire, and diamond.
5 . The method as claimed in claim 1 , wherein the metal deposited on the structure in step (f) includes nickel Ni and copper Cu.
6 . The method as claimed in claim 1 , wherein etching the substrate using the patterned resist includes using the patterned resist as an etching barrier.
7 . The method as claimed in claim 1 , wherein the polymer is a solvent soluble resin.
8 . The method as claimed in claim 2 , wherein etching the substrate using the patterned resist includes using the patterned resist as an etching barrier.
9 . The method as claimed in claim 2 , wherein the polymer is a solvent soluble resin.