Flat panel display and method of fabricating the same
View Patent ↗A light-emitting display device the same includes an insulating substrate having a thin film transistor formed thereon. The thin film transistor includes a source electrode and/or a drain electrode. A passivation layer is formed on the insulating substrate over at least a portion of the thin film transistor, and has a via hole formed therein, which electrically contacts either the source electrode or the drain electrode. A pixel electrode is formed in the via hole. A light-blocking layer is formed over an entire upper surface of the passivation layer except for an area corresponding to the pixel electrode. A planarization layer is formed on an upper surface of the light-blocking layer except for an area corresponding to the pixel electrode.
1. A method for fabricating a flat panel display, comprising:
forming a passivation layer over an entire surface of a substrate;
forming a light-blocking layer on an entire surface of the passivation layer;
forming a mask layer on the light-blocking layer, the mask layer having one or more regions corresponding to a first via hole and to a light-blocking shield recess; and
etching the light-blocking layer and the passivation layer to form therein the first via hole and the light-blocking shield recess, wherein both the first via hole and the light-blocking shield recess expose the light-blocking layer.
2. The method of claim 1 , further comprising:
forming a second insulating layer on an entire surface of the light-blocking layer including the first via hole and the light-blocking shield recess;
forming a second mask layer on the second insulating layer, the second mask layer including a region corresponding to the first via hole; and
etching a region of the second insulating layer corresponding to the first via hole.
3. The method of claim 2 , further comprising forming a pixel electrode in the first via hole, connecting to a first electrode through the first via hole.