CMOS image sensor and method for manufacturing the same
View Patent ↗A CMOS image sensor and a method for manufacturing the same. In one example embodiment, a CMOS image sensor includes a field region and an active region, a second conductive bottom region, a first conductive well region, a second conductive top region, and a first conductive high concentration region. The field region and the active region are formed in a first conductive semiconductor substrate. The second conductive bottom region has a first depth in part of the active region. The first conductive well region is formed in the active region. The second conductive top region has a depth that is less than the first depth. The first conductive high concentration region has a depth that is less than the depth of the second conductive top region.
1. A CMOS image sensor comprising:
a field region and an active region both formed in a first conductive semiconductor substrate;
a second conductive bottom region having a first depth in part of the active region;
a first conductive well region formed in the active region and surrounding the second conductive bottom region;
a second conductive top region having a depth that is less than the first depth in the active region; and
a first conductive high concentration region having a depth that is less than the depth of the second conductive top region at a whole surface of the semiconductor substrate comprising the second conductive top region,
wherein the second conductive bottom region is formed by implanting second conductive impurity ions of a concentration higher than a concentration of impurities of the first conductive semiconductor substrate and lower than that of the first conductive well region.
2. The CMOS image sensor of claim 1 , wherein the second conductive top region is formed wider than the second conductive bottom region.
3. The CMOS sensor of claim 1 , wherein the second conductive bottom region is plurally formed narrower than the second conductive to region.
4. The CMOS image sensor of claim 1 , wherein the second conductive top region is formed by implanting second conductive impurity ions of a concentration higher than that of the first conductive well region.
5. A method for manufacturing a CMOS image sensor, the method comprising:
forming both a field region and an active region in a first conductive semiconductor substrate;
forming a second conductive bottom region having a first depth in part of the active region;
forming a first conductive well region to surround the second conductive bottom region in the active region;
forming a second conductive top region having a depth that is less than the first depth in the active region;
implanting first conductive high concentration impurity ions into a whole surface of the semiconductor substrate comprising the second conductive top region; and
forming a first conductive high concentration region having a depth that is less than the depth of the second conductive top region,
wherein the second conductive bottom region is formed by implanting second conductive impurity ions of a concentration higher than a concentration of impurities of the first conductive semiconductor substrate and lower than that of the first conductive well region.
6. The method of claim 5 , wherein the second conductive top region is formed wider than the second conductive bottom region.
7. The method of claim 5 , wherein the second conductive bottom region is formed at an inner and substantially central part of the active region.
8. The method of claim 5 , wherein the second conductive top region is formed by implanting second conductive impurity ions of a concentration higher than that of the first conductive well region.
9. The method of claim 5 , wherein a mask pattern for forming the first conductive well region is the same as a mask pattern for forming the second conductive bottom region but is opposite to the mask patter in polarity.
10. A CMOS image sensor comprising:
a field region and an active region both formed in a first conductive semiconductor substrate;
a second conductive bottom region having a first depth in part of the active region;
a first conductive well region formed in the active region and surrounding the second conductive bottom region;
a second conductive top region having a depth that is less than the first depth in the active region; and
a first conductive high concentration region having a depth that is less than the depth of the second conductive top region at a whole surface of the semiconductor substrate comprising the second conductive top region,
wherein the first and the second conductive region types are P and N type or N and P type, respectively, and
wherein the second conductive top region is sandwiched between the first conductive high concentration region and the first conductive well region.
11. A method for manufacturing a CMOS image sensor, the method comprising:
forming both a field region and an active region in the first conductive semiconductor substrate;
forming a second conductive bottom region having a first depth in part of the active region;
forming a first conductive well region to surround the second conductive bottom region in the active region;
forming a second conductive top region having a depth that is less than the first depth in the active region;
implanting first conductive high concentration impurity ions into a whole surface of the semiconductor substrate comprising the second conductive top region; and
forming a first conductive high concentration region having a depth that is less than the depth of the second conductive top region,
wherein the first and the second conductive region types are P and N type or N and P type, respectively, and
wherein the second conductive top region is sandwiched between the first conductive high concentration region and the first conductive well region.