OLED DISPLAY ENCAPSULATION WITH THE OPTICAL PROPERTY

1 . A process of making an optical film or optical array comprising:

a) simultaneously directing a series of gas flows along elongated substantially parallel channels to form a first thin film on a substrate;

wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material;

wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material to form the first thin film;

b) repeating step a) a plurality of times to produce a first thickness of a first film layer with a first optical property;

wherein the process is carried out at or above atmospheric pressure;

c) repeating steps a) and b) to produce a second film layer; and

wherein the process is carried out substantially at or above atmospheric pressure.

2 . The process as in claim 1 wherein the temperature of the substrate during deposition is under 250° C.

3 . The process as in claim 1 wherein said second film layer has a second thickness.

4 . The process as in claim 1 wherein a third reactive gas and a fourth reactive gas are used to form said second film layer.

5 . The process as in claim 1 wherein said second film layer has a second optical property.

6 . The process as in claim 1 wherein said first and second film layer encapsulates the substrate.

7 . The process as in claim 1 wherein said substrate comprises an OLED device.

8 . The process as in claim 1 wherein said substrate comprises a photovoltaic device.

9 . The process as in claim 1 wherein said substrate comprises a sensor or a sensor array.

10 . The process as in claim 1 wherein said first reactive gas comprises a mixture of gases.

11 . The process of claim 1 wherein said first film layer is an interference filter.

12 . The process of claim 1 wherein first film layer selectively reflects ambient ultraviolet light.

13 . A process of making an optical film or optical array comprising:

a) simultaneously directing a series of gas flows along elongated, substantially parallel channels to form a first thin film on a substrate;

wherein the series of gas flows comprises, in order, at least a first reactive gaseous mixture, an inert purge gas, and a second reactive gaseous mixture;

wherein the first reactive gaseous mixture is capable of reacting with a substrate surface treated with the second reactive gaseous mixture to form the first thin film;

b) repeating step a) with a third reactive gaseous mixture;

c) repeating steps a) and b) a plurality of times to produce a first thickness of a first film layer with a first optical property; and

wherein the process is carried out at or above atmospheric pressure.

14 . The process of claim 13 comprising:

d) repeating steps a), b), and c) to produce a second film layer.

15 . The process of claim 14 wherein a fourth reactive gaseous mixture is substituted for said third reactive gaseous mixture prior to step d).

16 . The process of claim 15 wherein a fifth reactive gaseous mixture is substituted for said second reactive gaseous mixture prior to step d).

17 . The process of claim 13 wherein said first gaseous mixture is comprised of first materials at a first concentration and said third gaseous mixture is comprised of said first materials at a second concentration.

18 . The process of claim 13 wherein said first film layer is a gradient layer.

19 . The process of 18 wherein said first film layer is a Rugate filter.

20 . The process of claim 13 wherein the first or second gaseous mixture is selected from a group comprising dialectic oxides.