Method for forming metal line and method for manufacturing display substrate by using the same
View Patent ↗In a method for forming a metal line, a first metal layer and a second metal layer are deposited on a substrate. The first metal layer includes aluminum, and the second metal layer includes molybdenum. A photoresist pattern having a line-shape is formed on the second metal layer. The second metal layer is etched with a chlorine-containing etching gas using the photoresist pattern as a mask. The first metal layer is then etched with a mixture of a chlorine-containing gas and nitrogen gas and/or a mixture of a chlorine-containing gas and argon gas as an etching gas. Impurities such as chlorine ions are removed from the base substrate after etching the first metal layer with a fluorine-containing gas, hydrogen gas, or water vapor. A method for manufacturing a display substrate is disclosed using the method for forming a metal line to form source, drain, and gate electrodes and gate lines.
1. A method for forming a metal line, comprising:
forming a first metal layer on a base substrate, the first metal layer comprising aluminum and/or aluminum alloy;
forming a second metal layer on the first metal layer, the second metal layer comprising molybdenum and/or molybdenum alloy;
forming a photoresist pattern having a line-shape on the second metal layer;
etching the second metal layer with a first etching gas by using the photoresist pattern as a mask, the first etching gas comprising a mixture of a chlorine-containing gas and an oxygen gas; and
etching the first metal layer with a second etching gas different from the first etching gas by using the photoresist pattern as a mask, the second etching gas comprising at least one of a mixture of a chlorine-containing gas and a nitrogen gas, or a mixture of a chlorine-containing gas and an argon gas.
2. The method of claim 1 , wherein a volume ratio of the argon gas or the nitrogen gas to the chlorine-containing gas is about 0.5 to about 1.5.
3. The method of claim 2 , wherein etching the first metal layer is performed at a chamber pressure of about 10 mT to about 30 mT, a source power density of about 0.7 W/cm 2 to about 1.8 W/cm 2 , and a bias power density of about 0.7 W/cm 2 to about 1.8 W/cm 2 .
4. The method of claim 1 , further comprising:
removing impurities from the base substrate after etching the first metal layer.
5. The method of claim 4 , further comprising:
forming a third metal layer on the base substrate, the third metal layer comprising molybdenum and/or molybdenum alloy,
wherein the first metal layer is arranged between the second metal layer and the third metal layer.
6. The method of claim 5 , further comprising:
etching the third metal layer with the first etching gas before removing impurities.
7. The method of claim 4 , wherein the impurities are removed using at least one of a water vapor or a hydrogen gas.
8. The method of claim 4 , wherein the impurities are removed using a fluorine-containing gas.
9. A method for manufacturing a display substrate, comprising:
forming a gate pattern on a base substrate, the gate pattern comprising a gate line and a gate electrode of a switching element;
forming a gate insulation layer on the gate pattern;
forming a source metal layer comprising first, second, and third metal layers on the gate insulation layer, the first metal layer comprising aluminum and/or aluminum alloy;
etching the source metal layer to form a source electrode and a drain electrode of the switching element;
forming a protection insulation layer comprising a contact hole exposing a portion of the drain electrode; and
forming a pixel electrode contacting the drain electrode through the contact hole,
wherein etching the source metal layer comprises:
etching the second metal layer with a mixture of a chlorine-containing gas and an oxygen gas;
etching the first metal layer with an etching gas; and
etching the third metal layer with the mixture of the chlorine-containing gas and oxygen gas,
wherein the etching gas comprises at least one of a mixture of a chlorine-containing gas and a nitrogen gas, or a mixture of a chlorine-containing gas and an argon gas.
10. The method of claim 9 , wherein a volume ratio of the argon gas or the nitrogen gas to the chlorine-containing gas is about 0.50 to about 1.50.
11. The method of claim 10 , wherein etching the source metal layer is performed at a chamber pressure of about 10 mT to about 30 mT, a source power density of about 0.7 W/cm 2 to about 1.8 W/cm 2 , and a bias power density of about 0.7 W/cm 2 to about 1.8 W/cm 2 .
12. The method of claim 9 , wherein:
the second and third metal layers layer both comprise molybdenum and/or molybdenum alloy,
and the first metal layer is arranged between the second metal layer and the third metal layer.
13. The method of claim 12 , wherein etching the source metal layer further comprises
etching the source metal layer to form an electrode pattern and a source line crossing with the gate line.
14. The method of claim 13 , wherein the electrode pattern and the source line are etched using a wet-etching process.
15. The method of claim 9 , further comprising:
removing impurities after the source electrode and the drain electrode are formed.
16. The method of claim 15 , wherein the impurities are removed using at least one of water vapor or a hydrogen gas.
17. The method of claim 15 , wherein the impurities are removed using a fluorine-containing gas.