IP Library Granted Patent US 7,916,241
Granted Patent B2
US 7,916,241 · App. 11/866,526 · Granted Mar 29, 2011

Method for manufacturing optical element

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,916,241
App. No.
11/866,526
Granted
Mar 29, 2011
Kind
B2
Abstract

An optical element manufacturing method according to the present invention includes: disposing a mask on a transparent photosensitive resin; patterning said transparent resin by applying an exposure light to said transparent photosensitive resin through said mask to form a transparent layer; forming a light absorbing layer by filling a gap in the transparent layer with a black curable resin; and illuminating a mask surface of the mask with the exposure light at an angle.

Claims (19)

1. An optical element manufacturing method comprising:

disposing a mask on a transparent photosensitive resin;

patterning said transparent resin by applying an exposure light to said transparent photosensitive resin through said mask to form a transparent layer;

forming a light absorbing layer by filling a gap in said transparent layer with a black curable resin; and

illuminating a mask surface of said mask with said exposure light at an angle that is inclined to the mask surface;

wherein said transparent layer and said light absorbing layer are arranged alternately in a plane and the range of light transmitted through said transparent layer in the direction of the emission of light is restricted by said light absorbing layer.

2. The optical element manufacturing method according to claim 1 , wherein said exposure light is scattering light.

3. The optical element manufacturing method according to claim 2 , wherein said exposure light is emitted from a point light source.

4. The optical element manufacturing method according to claim 1 , wherein said exposure light is collimated light; and

a lens is provided above the mask surface of said mask and said transparent layer is patterned by illuminating said transparent layer with said exposure light transmitted through said lens.

5. The optical element manufacturing method according to claim 4 , wherein one or more of said lenses is disposed above said mask surface.

6. The optical element manufacturing method according to claim 1 , wherein said exposure light is collimated light; and

said method further comprises, after applying said exposure light from one direction, applying said exposure light from a different direction.

7. An optical element manufacturing method comprising:

disposing a mask on a transparent photosensitive resin;

patterning said transparent resin by applying an exposure light to said transparent photosensitive resin through said mask to form a transparent layer;

forming a light absorbing layer by filling a gap in said transparent layer with a black curable resin; and

illuminating a mask surface of said mask with said exposure light at an angle that is substantially perpendicular to the surface of said transparent photosensitive resin layer at the center of said transparent photosensitive resin layer and that becomes small toward the edges of said transparent photosensitive resin layer;

wherein said transparent layer and said light absorbing layer are arranged alternately in a plane and the range of light transmitted through said transparent layer in the direction of the emission of light is restricted by said light absorbing layer.

Assignments (2)
CHANGE OF NAME Recorded Nov 8, 2011
From: NEC LCD TECHNOLOGIES, LTD.
To: NLT TECHNOLOGIES, LTD.
Reel/Frame 027189/0704 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 8, 2007
From: MIMURA, KOJI; SUMIYOSHI, KEN
To: NEC LCD TECHNOLOGIES, LTD.
Reel/Frame 019928/0821 →