IP Library Granted Patent US 7,963,024
Granted Patent B2
US 7,963,024 · App. 11/870,371 · Granted Jun 21, 2011

Method of manufacturing a magnetic write head for perpendicular magnetic recording

Assignee: Hitachi Global Storage Technologies Netherlands B.V.
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Quick Facts
Patent No.
US 7,963,024
App. No.
11/870,371
Granted
Jun 21, 2011
Kind
B2
Abstract

A method for manufacturing a magnetic write head for perpendicular magnetic data recording. The method allows an upper write coil to be formed directly on a conformally deposited layer of non-magnetic material such as alumina which has been deposited over a magnetic shaping layer and write pole. The method allows the write coil to be constructed without the need for the deposition of a thick alumina fill layer and subsequent chemical mechanical polishing. This, therefore, avoids the necessity of such a chemical mechanical polishing step.

Claims (29)

1. A method of manufacturing a magnetic write head for perpendicular magnetic data recording, the method comprising:

forming a magnetic shaping layer;

forming a magnetic write pole over the shaping layer;

forming a magnetic trailing shield over an end of the magnetic write pole, the trailing shield being separated from the magnetic write pole by a non-magnetic trailing gap layer;

forming a magnetic back gap layer, magnetically connected with the magnetic shaping layer;

conformally depositing a layer of non-magnetic, electrically insulating material;

forming a mask structure, the mask structure having an opening over each of the trailing shield and the magnetic back gap layer;

performing a reactive ion milling to remove portions of the conformally deposited layer of non-magnetic, electrically insulating material; and

forming an electrically conductive write coil over the conformally deposited thin layer of non-magnetic, electrically insulating material without an intervening chemical mechanical polishing step.

2. A method as in claim 1 wherein the conformally depositing a layer of non-magnetic, electrically insulating material comprises depositing alumina by atomic layer deposition.

3. A method as in claim 1 wherein the conformally depositing a layer of non-magnetic, electrically insulating material comprises depositing alumina by chemical vapor deposition.

4. A method as in claim 1 wherein the conformally deposited layer of non-magnetic, electrically insulating material is deposited to at thickness of 50 to 300 nm.

5. A method for manufacturing a magnetic write head for perpendicular magnetic data recording, comprising:

forming a first magnetic return pole;

forming a first electrically conductive write coil over the first magnetic return pole, the first electrically conductive write coil being electrically isolated from the first magnetic return pole;

forming a magnetic shaping layer over the electrically conductive write coil and the first return pole, the magnetic shaping layer being electrically isolated from the first electrically conductive write coil;

forming a first electrically conductive center post that is electrically connected with a portion of the first electrically conductive write coil;

forming a magnetic write pole over and in contact with the magnetic shaping layer;

forming a trailing magnetic shield over a portion of the write pole;

forming a magnetic back gap layer over a portion of the shaping layer;

conformally depositing a layer of non-magnetic, electrically insulating material over the trailing shield, write pole back gap and center post;

forming a mask structure over the conformally deposited layer, the mask structure having an opening over each of the trailing shield, back gap, and center post;

performing a reactive ion milling to remove portions of the conformally deposited, non-magnetic, electrically insulating material;

removing the structure; and

forming a second write coil over the conformally deposited, non-magnetic, electrically insulating layer.

6. A method as in claim 5 wherein the second write coil is formed without an intervening chemical mechanical polishing process being performed between the conformal deposition of the non-magnetic, electrically insulating layer and the formation of the second write coil.

7. A method as in claim 5 wherein the conformally depositing a layer of non-magnetic, electrically insulating material over the trailing shield, write pole back gap and center post, further comprises depositing alumina by atomic layer deposition.

8. A method as in claim 5 wherein the conformally depositing a layer of non-magnetic, electrically insulating material over the trailing shield, write pole back gap and center post further comprises depositing alumina by chemical vapor deposition.

9. A method as in claim 5 wherein the conformally deposited layer of non-magnetic, electrically insulating material is deposited to a thickness of 50-300 nm.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2016
From: HGST NETHERLANDS B.V.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 040821/0550 →
CHANGE OF NAME Recorded Oct 25, 2012
From: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
To: HGST NETHERLANDS B.V.
Reel/Frame 029341/0777 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 11, 2008
From: NEUHAUS, AARON
To: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
Reel/Frame 020792/0015 →
Continuity (1)
Related Publication 20090097158A1 · Apr 16, 2009