Si surface cleaning for semiconductor circuits
View Patent ↗A method is disclosed for the cleaning of a Si surface at low temperatures. Oxide on the Si surface is brought into contact with Ge, which then sublimates off the surface. The Ge contamination remaining after the oxide removal is cleared away by an exposure to an alkali halide. The disclosed cleaning method may by used in semiconductor circuit fabrication for preparing surfaces ahead of epitaxial growth.
1. A method for cleaning a Si surface, the method comprising:
providing the Si surface, wherein the Si surface is at least partially covered by an oxide;
supplying Ge to contact the oxide at a first temperature of between about 450° C. and about 750° C. in such manner that Ge build-up takes place on the Si surface; and
exposing the Si surface to a halide together with a carrier gas at a second temperature of between about 450° C. and 650° C., wherein at least a portion of the exposing is carried out without concomitantly supplying Ge.
2. The method of claim 1 , wherein the supplying of Ge is followed by a thermal annealing at a third temperature of between about 450° C. and about 750° C.
3. The method of claim 1 , wherein the exposing to the halide is carried out by supplying hydrogen chloride (HCl) gas together with hydrogen (H 2 ) for the carrier gas, and selecting a HCl to H 2 flow ratio of between about 10 −2 and about 1.
4. The method of claim 3 , wherein the exposing to the HCl has a duration of between about 5 seconds and about 60 seconds.
5. The method of claim 1 , wherein the method further comprises repeating the supplying of Ge and the exposing to the halide steps until the Si surface reaches a predetermined state of cleanness.
6. The method of claim 1 , wherein the providing the Si surface comprises wet etching the Si surface with a solution comprising hydrogen fluoride (HF).
7. The method of claim 1 , wherein the providing the Si surface comprises growing an oxide on the Si surface, and selecting the oxide thickness to be less than about 1 nm.
8. The method of claim 1 , wherein the supplying of Ge is carried out by supplying germane (GeH 4 ) gas together with hydrogen (H 2 ) 4 and selecting a GeH 4 to H 2 flow ratio of between about 10 −3 and about 10 −4 .
9. The method of claim 1 , wherein supplying of Ge is carried out by supplying germane (GeH 4 ) gas together with nitrogen (N 2 ).
10. The method of claim 1 , wherein the supplying of Ge is carried out by supplying Ge 2 H 6 gas.
11. The method of claim 1 , wherein the supplying of Ge is carried out by supplying (GeH 3 )CH 3 gas.
12. The method of claim 1 , wherein the supplying of Ge is carried out by supplying elemental Ge.
13. A method for fabricating a semiconductor circuit, the method comprising:
defining at least one region of the semiconductor circuit for an epitaxial deposition onto a Si surface;
ensuring that coverage over the Si surface consists essentially of an oxide;
supplying Ge to contact the oxide at a first temperature of between about 450° C. and about 750° C. in such manner that Ge build-up takes place on the Si surface;
exposing the Si surface to a halide together with a carrier gas at a second temperature of between about 450° C. and 650° C., wherein at least a portion of the exposing is carried out without concomitantly supplying Ge; and
performing the epitaxial deposition onto the least one region.
14. The method of claim 13 , wherein the semiconductor circuit is characterized as being a CMOS circuit comprising FET devices, and the method further comprises processing the FET devices up to a predetermined state of completion before carrying out the step of defining the at least one region of the semiconductor circuit for the epitaxial deposition onto the Si surface.
15. The method of claim 14 , wherein the predetermined state of completion includes silicide formation for the FET devices.
16. The method of claim 13 , wherein the exposing to the halide is carried out by supplying hydrogen chloride (HCl) gas together with hydrogen (H 2 ) for the carrier gas, and selecting a HCl to H 2 flow ratio of between about 10 −2 and about 1.
17. The method of claim 13 , wherein the method further comprises repeating the supplying of Ge and the exposing to the halide steps until the Si surface is sufficiently clean to receive the epitaxial deposition.
18. The method of claim 13 , wherein in performing the epitaxial deposition Si 1-x Ge x is selected for deposition, with “x” having a range of 0≦x≦1.
19. The method of claim 13 , wherein performing the ensuring step comprises wet etching the Si surface with a solution comprising hydrogen fluoride (HF).
20. The method of claim 13 , wherein performing the ensuring step comprises growing an oxide on the Si surface, and selecting the oxide thickness to be less than about 1 nm.
21. The method of claim 13 , wherein the supplying of Ge is carried out by supplying germane (GeH 4 ) gas together with hydrogen (H 2 ), and selecting a GeH 4 to H 2 flow ratio of between about 10 −3 and about 10 −1 .