FERROELECTRIC INFORMATION STORAGE MEDIUM AND METHOD OF MANUFACTURING THE SAME
A ferroelectric information storage medium having ferroelectric nanodots and a method of manufacturing the ferroelectric information storage medium are provided. The ferroelectric information storage medium includes a substrate, an electrode formed on the substrate, and ferroelectric nanodots formed on the electrode, wherein the ferroelectric nanodots are separated from each other, and a plurality of the ferroelectric nanodots form a single bit region.
1 . A ferroelectric information storage medium comprising:
a substrate;
an electrode formed on the substrate; and
ferroelectric nanodots formed on the electrode,
wherein the ferroelectric nanodots are separated from each other, and a plurality of the ferroelectric nanodots form a single bit region.
2 . The ferroelectric information storage medium of claim 1 , wherein the ferroelectric nanodots have a diameter of 15 nm or less.
3 . The ferroelectric information storage medium of claim 1 , wherein the ferroelectric nanodots are formed in a monolayer on the electrode.
4 . The ferroelectric information storage medium of claim 1 , wherein the ferroelectric nanodots are formed of at least one selected from PbTiO 3 , KNbO 3 , and BiFeO 3 .
5 . The ferroelectric information storage medium of claim 1 , wherein the substrate is formed of at least one selected from silicon, glass and alumina.
6 . The ferroelectric information storage medium of claim 1 , further comprising a protective layer on the ferroelectric nanodots.
7 . The ferroelectric information storage medium of claim 6 , further comprising a lubricating layer on the protective layer.
8 . A method of manufacturing a ferroelectric information storage medium, comprising:
a) forming an electrode on a substrate;
b) forming a precursor nanodot layer that comprises a metal material for forming a ferroelectric material on the electrode;
c) supplying a reaction gas to the precursor nanodot layer to cause a reaction with precursor nanodots of the precursor nanodot layer to form ferroelectric nanodots; and
d) forming the ferroelectric nanodots by annealing the precursor nanodot layer.
9 . The method of claim 8 , wherein the forming of the precursor nanodot layer comprises coordinating an organic dispersion agent on a surface of each of the precursor nanodots of the precursor nanodot layer.
10 . The method of claim 8 , wherein the precursor nanodot layer is formed of a plurality of precursor nanodots separated from each other.
11 . The method of claim 8 , wherein the precursor nanodots have a diameter of 15 nm or less.
12 . The method of claim 9 , wherein the forming of the precursor nanodot layer comprises thin-filming a solution in which precursor nanodots are dispersed on the electrode.
13 . The method of claim 12 , wherein the thin-filming is performed using at least one selected from spin coating, dip coating, blade coating, screen printing, chemical self-assembling, Langmuir-Blodgett method, and spray coating.
14 . The method of claim 12 , wherein the solution comprises the precursor nanodots with a concentration of 0.05 to 1 wt %.
15 . The method of claim 12 , wherein a solvent of the solution is at least one organic solvent selected from chloroform, dichloromethane, hexane, toluene, ether, acetone, ethanol, pyridine, and tetrahydrofuran.
16 . The method of claim 8 , wherein the precursor nanodot layer is a monolayer of the precursor nanodots.
17 . The method of claim 9 , wherein the forming of the precursor nanodot layer further comprises removing the organic dispersion agent.
18 . The method of claim 17 , wherein the removing of the organic dispersion agent comprises annealing the precursor nanodot layer or O 2 plasma processing the precursor nanodot layer.
19 . The method of claim 9 , wherein the forming of the precursor nanodot layer comprises forming precursor nanodots comprising at least one selected from Ti, Nb, and Fe.
20 . The method of claim 9 , wherein the forming of the ferroelectric nanodots comprises annealing at a temperature of 400 to 900° C.
21 . The method of claim 9 , wherein the forming of the ferroelectric nanodots comprises forming the nanodot layer of at least one selected from PbTiO 3 , KNbO 3 , and BiFeO 3 .
22 . The method of claim 8 , wherein the ferroelectric nanodots have a diameter of 15 nm or less.