Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate
A donor substrate for laser induced thermal imaging (LITI) and a method of fabricating an organic light emitting display (OLED) using the donor substrate are provided. A conductive frame is disposed on and connected to an anti-static layer of the donor substrate and frames the periphery of the donor substrate. The conductive frame is connected to a grounded stage. An organic layer is formed using LITI, and the generation of static electricity is controlled.
1. A donor substrate for laser induced thermal imaging comprising:
a base layer;
a light-to-heat conversion layer on the base layer;
an anti-static layer on the light-to-heat conversion layer;
a transfer layer on the anti-static layer; and
a conductive frame connected to the anti-static layer and framing a periphery of the donor substrate.
2. The donor substrate according to claim 1 , wherein the conductive frame comprises a material selected from the group consisting of organic materials, inorganic materials and combinations thereof.
3. The donor substrate according to claim 2 , wherein the organic material is selected from the group consisting of polyaniline, polypyrrole, polythiophene and poly(3,4-ethylenedioxythiophene).
4. The donor substrate according to claim 2 , wherein the inorganic material is selected from the group consisting of antimony tin oxide (ATO), indium tin oxide (ITO), indium zinc oxide (IZO), Nb 2 O 3 , ZnO and TiN.
5. The donor substrate according to claim 2 , wherein the conductive frame comprises a material selected from the group consisting of ATO sols, ITO sols, Ag—Pd and Ag—Ru.
6. The donor substrate according to claim 1 , wherein the anti-static layer comprises a conductive material.
7. The donor substrate according to claim 6 , wherein the conductive material is selected from the group consisting of polyaniline, polypyrrole, polythiophene, poly(3,4-ethylenedioxythiophene), ATO, ITO, IZO, Nb 2 O 3 , ZnO, TiN, ATO sols, ITO sols,Ag—Pd and Ag—Ru.
8. The donor substrate according to claim 1 , wherein the light-to-heat conversion layer comprises a material selected from the group consisting of organic layers, metal, metal oxides, metal sulfides and metal alloys.
9. The donor substrate according to claim 1 , wherein the base layer comprises a material selected from the group consisting of glass substrates and transparent polymers, wherein the transparent polymer is selected from the group consisting of polyester, polyacryl, polyepoxy, polyethylene and polystyrene.
10. The donor substrate according to claim 1 , further comprising an intermediate layer between the anti-static layer and the transfer layer.
11. The donor substrate according to claim 10 , wherein the intermediate layer comprises a layer selected from the group consisting of gas generation layers, buffer layers, thin metal layers and combinations thereof.
12. The donor substrate according to claim 1 , wherein the transfer layer comprises a layer selected from the group consisting of organic emission layers, organic hole injection layers, organic hole transport layers, organic hole blocking layers, organic electron injection layers, organic electron transport layers and laminated layers thereof.
13. A method of fabricating a donor substrate for laser induced thermal imaging, comprising:
providing a base layer;
forming a light-to-heat conversion layer on the base layer;
forming an anti-static layer on the light-to-heat conversion layer;
forming a transfer layer on the anti-static layer; and
forming a conductive frame on the periphery of the donor substrate,
wherein the anti-static layer is connected to the conductive frame.
14. The method according to claim 13 , wherein the transfer layer is formed by a process selected from the group consisting of deposition processes and wet processes.
15. The method according to claim 13 ,
wherein when the light-to-heat conversion layer is a metal layer, the light-to-heat conversion layer is formed by a method selected from the group consisting of vacuum deposition, electron-beam deposition and sputtering, and
wherein when the light-to-heat conversion layer is an organic layer, the light-to-heat conversion layer is formed by a method selected from the group consisting of roll coating, photogravure, extrusion, spin coating and knife coating.
16. The method according to claim 13 , further comprising forming an intermediate layer between the anti-static layer and the transfer layer,
wherein the intermediate layer comprises a layer selected from the group consisting of gas generation layers, buffer layers, thin metal layers and combinations thereof.
17. The method according to claim 13 , wherein the transfer layer is formed by a process selected from the group consisting of extrusion, spin coating, knife coating, vacuum deposition, and chemical vapor deposition (CVD).
18. A method of fabricating an organic light emitting display, comprising:
patterning a first electrode on a substrate;
fixedly adsorbing the substrate to a stage that is transferable and grounded;
disposing the donor substrate of claim 1 opposite a pixel region of the substrate;
transferring an organic layer including at least an emission layer to the donor substrate by selectively irradiating laser beams on the donor substrate;
detaching the donor substrate from the substrate; and
forming a second electrode on the substrate.
19. The method according to claim 18 , wherein the first electrode is selected from the group consisting of anodes and cathodes.
20. The method according to claim 18 , wherein the frame of the donor substrate is connected to the grounded stage.
21. The method according to claim 18 , wherein the organic layer further comprises a layer selected from the group consisting of organic hole injection layers, organic hole transport layers, organic hole blocking layers, organic electron injection layers, organic electron transport layers and combinations thereof.