Method of fabricating inkjet printhead having planar nozzle plate
View Patent ↗A method of fabricating an inkjet printhead is provided. The method comprises the steps of: (a) providing a partially-fabricated printhead having a first nozzle plate comprised of a first material spanning a plurality of nozzles, the first nozzle plate having a plurality of cavities; (b) filling the cavities with a filler, such that an upper surface of the first nozzle plate and an upper surface of the filler together define a contiguous planar surface; and (c) depositing a second material onto the planar surface to form a second nozzle plate having a planar exterior surface.
1. A method of fabricating an inkjet printhead having a planar nozzle plate, said method comprising the steps of:
(a) providing a partially-fabricated printhead having a first nozzle plate comprised of a first material spanning a plurality of nozzles, said first nozzle plate having a plurality of cavities which are not nozzles;
(b) filling completely each of said cavities with a filler, such that an upper surface of said first nozzle plate and an upper surface of said filler together define a contiguous planar surface; and
(c) depositing a second material onto said planar surface to form a second nozzle plate having a planar exterior surface.
2. The method of claim 1 , wherein said second material is deposited by PECVD.
3. The method of claim 1 , wherein said first material is deposited by PECVD onto a non-planar sacrificial scaffold to form said first nozzle plate.
4. The method of claim 1 , wherein said first and second materials are the same or different from each other.
5. The method of claim 1 , wherein said first and second materials are independently selected from the group comprising: silicon nitride, silicon oxide and silicon oxynitride.
6. The method of claim 1 , wherein said filler is photoresist.
7. The method of claim 6 , wherein step (b) is performed by the sub-steps of:
(b)(i) depositing a layer of photoresist onto said first nozzle plate so as to fill said cavities; and
(b)(ii) removing a portion of said photoresist such that an upper surface of said first nozzle plate and an upper surface of said photoresist filling said cavities together define a contiguous planar surface.
8. The method of claim 7 , further comprising the step of:
thermally reflowing said photoresist to facilitate complete filling of said cavities.
9. The method of claim 7 , wherein step (b)(ii) is performed by chemical mechanical planarization or by photoresist etching.
10. The method of claim 1 , further comprising the step of:
(d) defining nozzle apertures through said first and second nozzle plates.
11. The method of claim 1 , wherein each nozzle comprises a nozzle chamber formed on a substrate, said nozzle chamber comprising a roof spaced apart from said substrate and sidewalls extending between said roof and said substrate, wherein said first nozzle plate and said sidewalls are comprised of the same material.